JPS5732630A - Repair of defect on photomask - Google Patents

Repair of defect on photomask

Info

Publication number
JPS5732630A
JPS5732630A JP10853580A JP10853580A JPS5732630A JP S5732630 A JPS5732630 A JP S5732630A JP 10853580 A JP10853580 A JP 10853580A JP 10853580 A JP10853580 A JP 10853580A JP S5732630 A JPS5732630 A JP S5732630A
Authority
JP
Japan
Prior art keywords
pinhole
repairing
repair
defect
repairing material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10853580A
Other languages
Japanese (ja)
Inventor
Kazuhiro Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP10853580A priority Critical patent/JPS5732630A/en
Publication of JPS5732630A publication Critical patent/JPS5732630A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Abstract

PURPOSE:To repair pinhole by applying and sintering an unsoluble and nonlight transmitting material as repairing material on defect by heat. CONSTITUTION:A metal thin film 3 and a photoresist 7 are applied on a transparent glass substrate 1 and undergo exposure, development and etching to form a desired pattern with the result that pinholes 8 and black spots 9 are generated. The black spot 9 is evaporated away by irradiating a laser beam. Then, for example, a repairing material 10 made up of a powdered carbon dissolved in an albumin is applied on a substrate on which a metal thin film pattern is formed and a laser beam is irradiated on the pinhole 8 and sinters the repairing material on the pinhole by heat. Other part thereof is removed by development. This enables the accurate filling of small defects such as pinhole thereby enabling the repairing thereof.
JP10853580A 1980-08-04 1980-08-04 Repair of defect on photomask Pending JPS5732630A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10853580A JPS5732630A (en) 1980-08-04 1980-08-04 Repair of defect on photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10853580A JPS5732630A (en) 1980-08-04 1980-08-04 Repair of defect on photomask

Publications (1)

Publication Number Publication Date
JPS5732630A true JPS5732630A (en) 1982-02-22

Family

ID=14487266

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10853580A Pending JPS5732630A (en) 1980-08-04 1980-08-04 Repair of defect on photomask

Country Status (1)

Country Link
JP (1) JPS5732630A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6114640A (en) * 1984-06-20 1986-01-22 グールド・インコーポレイテツド Method and apparatus for correcting defect of photo mask
WO1986002581A1 (en) * 1984-10-26 1986-05-09 Ion Beam Systems, Inc. Focused substrate alteration
US4698236A (en) * 1984-10-26 1987-10-06 Ion Beam Systems, Inc. Augmented carbonaceous substrate alteration

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6114640A (en) * 1984-06-20 1986-01-22 グールド・インコーポレイテツド Method and apparatus for correcting defect of photo mask
WO1986002581A1 (en) * 1984-10-26 1986-05-09 Ion Beam Systems, Inc. Focused substrate alteration
US4698236A (en) * 1984-10-26 1987-10-06 Ion Beam Systems, Inc. Augmented carbonaceous substrate alteration

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