JPS5785228A - Defect correction of photo mask using laser - Google Patents

Defect correction of photo mask using laser

Info

Publication number
JPS5785228A
JPS5785228A JP16151880A JP16151880A JPS5785228A JP S5785228 A JPS5785228 A JP S5785228A JP 16151880 A JP16151880 A JP 16151880A JP 16151880 A JP16151880 A JP 16151880A JP S5785228 A JPS5785228 A JP S5785228A
Authority
JP
Japan
Prior art keywords
laser
evaporation
photomask
deposition
defective part
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16151880A
Other languages
Japanese (ja)
Other versions
JPS627691B2 (en
Inventor
Yoichi Yoshino
Ryuji Tatsumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP16151880A priority Critical patent/JPS5785228A/en
Publication of JPS5785228A publication Critical patent/JPS5785228A/en
Publication of JPS627691B2 publication Critical patent/JPS627691B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To deposit a metal film by evaporation to a necessary and sufficient extent by performing deposition through evaporation while irradiating a defective part of a photomask with guiding laser having a very little quantity of energy. CONSTITUTION:While applying guiding laser of a guiding laser device 1 to a defective part of a photomask 9 mounted on a sliding stand 13 facing a material 10 for deposition by evaporation, the laser of a laser device 3 for a thermal source is applied to the material 10 for deposition by evaporation. Thereby the evaporated vapor adheres tightly to the defective part of the photomask only by the suction force of the guiding laser 6 to become opaque.
JP16151880A 1980-11-17 1980-11-17 Defect correction of photo mask using laser Granted JPS5785228A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16151880A JPS5785228A (en) 1980-11-17 1980-11-17 Defect correction of photo mask using laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16151880A JPS5785228A (en) 1980-11-17 1980-11-17 Defect correction of photo mask using laser

Publications (2)

Publication Number Publication Date
JPS5785228A true JPS5785228A (en) 1982-05-27
JPS627691B2 JPS627691B2 (en) 1987-02-18

Family

ID=15736590

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16151880A Granted JPS5785228A (en) 1980-11-17 1980-11-17 Defect correction of photo mask using laser

Country Status (1)

Country Link
JP (1) JPS5785228A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60196942A (en) * 1984-03-21 1985-10-05 Hitachi Ltd Photomask defect correcting process
JPH02204746A (en) * 1989-02-02 1990-08-14 Nec Corp Method for correcting chipping defect of photomask
WO2003040427A1 (en) * 2001-10-16 2003-05-15 Data Storage Institute Thin film deposition by laser irradiation

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5235596A (en) * 1975-09-12 1977-03-18 Hitachi Ltd Burglar watch system

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5235596A (en) * 1975-09-12 1977-03-18 Hitachi Ltd Burglar watch system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60196942A (en) * 1984-03-21 1985-10-05 Hitachi Ltd Photomask defect correcting process
JPH02204746A (en) * 1989-02-02 1990-08-14 Nec Corp Method for correcting chipping defect of photomask
WO2003040427A1 (en) * 2001-10-16 2003-05-15 Data Storage Institute Thin film deposition by laser irradiation

Also Published As

Publication number Publication date
JPS627691B2 (en) 1987-02-18

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