JPS5688137A - X-ray transfer mask - Google Patents

X-ray transfer mask

Info

Publication number
JPS5688137A
JPS5688137A JP16563879A JP16563879A JPS5688137A JP S5688137 A JPS5688137 A JP S5688137A JP 16563879 A JP16563879 A JP 16563879A JP 16563879 A JP16563879 A JP 16563879A JP S5688137 A JPS5688137 A JP S5688137A
Authority
JP
Japan
Prior art keywords
film
ppq
inorg
resist
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16563879A
Other languages
Japanese (ja)
Inventor
Toshisuke Kitakoji
Shiro Takeda
Minoru Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16563879A priority Critical patent/JPS5688137A/en
Publication of JPS5688137A publication Critical patent/JPS5688137A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To obtain an X-ray transfer mask with superior mechanical strength and pattern accuracy by composing a mask substrate of a polyquinoxaline (PPQ) film and an inorg. thin film showing high X-ray absorption to attain higher adhesion of the PPQ film to the inorg. thin film. CONSTITUTION:A soln. of polyquinoxaline represented by the formula in m-cresol or the like is applied to a glass plate, heated to 100 deg.C in a nitrogen gas stream, and further heated to about 200 deg.C to obtain an about 4mu thick PPQ film. This film is peeled off, uniformly stretched on a holder, and perfectly hardened by heating at 350 deg.C for 3hr. An electron beam resist film is formed on the PPQ film, and patternwise electron beam exposure is carried out. After removing the exposed part by development, an inorg. substance such as Au is vapor deposited on the whole surface. The resist of the unexposed part is then dissolved in a solvent, and simultaneously the Au film on the resist is removed to obtain an X-ray transfer mask. The PPQ film has low heat shrinkage, high strength, high heat resistance and low water absorption, and the superior mask is easily obtd.
JP16563879A 1979-12-21 1979-12-21 X-ray transfer mask Pending JPS5688137A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16563879A JPS5688137A (en) 1979-12-21 1979-12-21 X-ray transfer mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16563879A JPS5688137A (en) 1979-12-21 1979-12-21 X-ray transfer mask

Publications (1)

Publication Number Publication Date
JPS5688137A true JPS5688137A (en) 1981-07-17

Family

ID=15816156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16563879A Pending JPS5688137A (en) 1979-12-21 1979-12-21 X-ray transfer mask

Country Status (1)

Country Link
JP (1) JPS5688137A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0323264A2 (en) * 1987-12-29 1989-07-05 Canon Kabushiki Kaisha X-ray exposure process using an electrically conductive x-ray mask

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057778A (en) * 1973-09-17 1975-05-20
JPS5312274A (en) * 1976-07-21 1978-02-03 Oki Electric Ind Co Ltd Production of mask for x-ray exposure
JPS5329574A (en) * 1976-08-31 1978-03-18 Oki Electric Ind Co Ltd Transmitting type photoelectric switch

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057778A (en) * 1973-09-17 1975-05-20
JPS5312274A (en) * 1976-07-21 1978-02-03 Oki Electric Ind Co Ltd Production of mask for x-ray exposure
JPS5329574A (en) * 1976-08-31 1978-03-18 Oki Electric Ind Co Ltd Transmitting type photoelectric switch

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0323264A2 (en) * 1987-12-29 1989-07-05 Canon Kabushiki Kaisha X-ray exposure process using an electrically conductive x-ray mask

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