JPS57106032A - Transferring device for fine pattern - Google Patents

Transferring device for fine pattern

Info

Publication number
JPS57106032A
JPS57106032A JP18234980A JP18234980A JPS57106032A JP S57106032 A JPS57106032 A JP S57106032A JP 18234980 A JP18234980 A JP 18234980A JP 18234980 A JP18234980 A JP 18234980A JP S57106032 A JPS57106032 A JP S57106032A
Authority
JP
Japan
Prior art keywords
ray
substrate
transfer
lens barrel
masking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18234980A
Other languages
Japanese (ja)
Inventor
Shinichiro Takasu
Toshiaki Shinozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP18234980A priority Critical patent/JPS57106032A/en
Publication of JPS57106032A publication Critical patent/JPS57106032A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To perform reduced transfer and enlarged transfer as well improve resolution and at the same time to make manufacture of a masking substrate easy by a method wherein fluorescent X-ray is utilized without using a thin film substrate. CONSTITUTION:A vacuum container 12 is connected to the bottom end of a vacuum lens barrel 11 of a fine pattern transfer device and a cover 13 is attached to the top end of the lens barrel 11. A block 14 is inserted through a through hole of the cover 13 into the vacuum lens barrel 11. A masking substrate 16 is fitted to the bottom surface of the block 14. The substrate 16 is composed of a plate 17 which does not generate fluorescent X-ray and a masking pattern 18 which generates fluorescent X-ray by irradiation of X-ray. To the upper part of the vacuum lens barrel 11 X-ray sources 19a, 19b are provided facing each other and X-ray through slits 22a, 22b is applied to the lower surface of the substrate 16. A specimen 25 such as an Si-substrate coated by X-ray resist 31 is mounted on a specimen table 23 on a transfer mechanism 24 of the containe 12, so that reduced transfer or enlanged transfer can be performed and the masking substrate for a fine pattern with high resolution can be manufactured easily.
JP18234980A 1980-12-23 1980-12-23 Transferring device for fine pattern Pending JPS57106032A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18234980A JPS57106032A (en) 1980-12-23 1980-12-23 Transferring device for fine pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18234980A JPS57106032A (en) 1980-12-23 1980-12-23 Transferring device for fine pattern

Publications (1)

Publication Number Publication Date
JPS57106032A true JPS57106032A (en) 1982-07-01

Family

ID=16116750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18234980A Pending JPS57106032A (en) 1980-12-23 1980-12-23 Transferring device for fine pattern

Country Status (1)

Country Link
JP (1) JPS57106032A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08334480A (en) * 1995-06-07 1996-12-17 Sony Corp X-ray fluorescence analytical device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08334480A (en) * 1995-06-07 1996-12-17 Sony Corp X-ray fluorescence analytical device

Similar Documents

Publication Publication Date Title
JPS57106032A (en) Transferring device for fine pattern
MY110289A (en) Process for the vapor deposition of polysilanes.
JPS5435180A (en) Preparation of boron film
JPS56125830A (en) Uniform exposure patterning method in electron beam patterning device
JPS51135664A (en) Method for producing a deflecting plate
JPS53110379A (en) Optical filter and its manufacture
JPS529366A (en) Sample equipment for electron microscopes, etc
JPS5785228A (en) Defect correction of photo mask using laser
JPS5388728A (en) Method of forming pattern
JPS51142277A (en) Device for electron-beam exposure
JPS53135260A (en) Sample stage of e lectron microscope or the like
JPS5785229A (en) Casette holding device for electron beam exposure
JPS5646230A (en) Exposing method
JPS53129263A (en) Production of chemical plating substrate
JPS54155235A (en) Adhesive coating device
JPS5218320A (en) Image forming method
JPS5553860A (en) Pattern signal generator
JPS5357763A (en) Diaphragm of electron beam exposure apparatus
JPS55163840A (en) Electron beam exposure device
JPS5424394A (en) Device for forming micro-groves
GB2019249A (en) Printing
JPS56160741A (en) Metal-back film forming method for cathode ray tube
JPS6430223A (en) Wetetching processor
JPS53130973A (en) Manufacture for silicon thin film
JPS56110232A (en) Pattern formation with soft x-ray