JPS6448417A - Resist applicator - Google Patents

Resist applicator

Info

Publication number
JPS6448417A
JPS6448417A JP20584287A JP20584287A JPS6448417A JP S6448417 A JPS6448417 A JP S6448417A JP 20584287 A JP20584287 A JP 20584287A JP 20584287 A JP20584287 A JP 20584287A JP S6448417 A JPS6448417 A JP S6448417A
Authority
JP
Japan
Prior art keywords
resist
nozzle
substrate
nonuniformity
wetting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20584287A
Other languages
Japanese (ja)
Inventor
Hiroyuki Shigemura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP20584287A priority Critical patent/JPS6448417A/en
Publication of JPS6448417A publication Critical patent/JPS6448417A/en
Pending legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To prevent the generation of the nonuniformity of application resulting from the drying of a radiation sensitive resist by wetting the nose section of a nozzle dropping the resist by the vapor of a solvent. CONSTITUTION:In a resist applicator in which a radiation sensitive resist 1 is dropped to a substrate from a nozzle, the substrate is turned at high speed and a coating film is formed onto the substrate, a mechanism wetting the nose of a nozzle 2 in the atmosphere of solvent vapor 6. Consequently, the resist is dropped completely, and the nose section of the resist supply nozzle 2 is made to stand by in the atmosphere of the organic solvent vapor 6. Accordingly, the nonuniformity of application is not generated even at the intervals of work of several days, thus acquiring uniform coating-film thickness.
JP20584287A 1987-08-19 1987-08-19 Resist applicator Pending JPS6448417A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20584287A JPS6448417A (en) 1987-08-19 1987-08-19 Resist applicator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20584287A JPS6448417A (en) 1987-08-19 1987-08-19 Resist applicator

Publications (1)

Publication Number Publication Date
JPS6448417A true JPS6448417A (en) 1989-02-22

Family

ID=16513617

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20584287A Pending JPS6448417A (en) 1987-08-19 1987-08-19 Resist applicator

Country Status (1)

Country Link
JP (1) JPS6448417A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02160074A (en) * 1988-12-12 1990-06-20 Tokyo Electron Ltd Coater
US5378511A (en) * 1993-03-22 1995-01-03 International Business Machines Corporation Material-saving resist spinner and process
JPH10223740A (en) * 1997-01-31 1998-08-21 Motorola Inc Reducing method of particles on substrate using chuck cleaner

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02160074A (en) * 1988-12-12 1990-06-20 Tokyo Electron Ltd Coater
US5378511A (en) * 1993-03-22 1995-01-03 International Business Machines Corporation Material-saving resist spinner and process
JPH10223740A (en) * 1997-01-31 1998-08-21 Motorola Inc Reducing method of particles on substrate using chuck cleaner

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