JPS5687471A - Coating process - Google Patents

Coating process

Info

Publication number
JPS5687471A
JPS5687471A JP16440479A JP16440479A JPS5687471A JP S5687471 A JPS5687471 A JP S5687471A JP 16440479 A JP16440479 A JP 16440479A JP 16440479 A JP16440479 A JP 16440479A JP S5687471 A JPS5687471 A JP S5687471A
Authority
JP
Japan
Prior art keywords
closed space
semiconductor substrate
photosensitive resin
space zone
control system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16440479A
Other languages
Japanese (ja)
Other versions
JPS621793B2 (en
Inventor
Mototsugu Ogura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP16440479A priority Critical patent/JPS5687471A/en
Publication of JPS5687471A publication Critical patent/JPS5687471A/en
Publication of JPS621793B2 publication Critical patent/JPS621793B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To form a uniform coating film and to improve a dimensional accuracy of LSI patterns, by providing a closed space zone on a surface of an article to be coated in a rotation coating process, the closed space zone being maintained at a pressure level near a saturated pressure.
CONSTITUTION: A photosensitive resin is dropped onto a semiconductor substrate 1 which is fixed on a spinner head 3. A closed space zone 21 is formed with a closed space forming plate 11 which is arranged above the semiconductor substrate 1 with a gap 17 by a control system 10. The closed space zone 21 is substantially saturated with a volatile solvent part of the photosensitive resin dropped onto the semiconductor substrate 1, owing to the rotation coating movement by a control system 4. In this state, a photosensitive resin film is generated on the semiconductor substrate 1 by the rotation movement by the control system 4. The obtained photosensitive resin film has an extremely flat surface and suitable for making accurate patterns by exposing and developing.
COPYRIGHT: (C)1981,JPO&Japio
JP16440479A 1979-12-17 1979-12-17 Coating process Granted JPS5687471A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16440479A JPS5687471A (en) 1979-12-17 1979-12-17 Coating process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16440479A JPS5687471A (en) 1979-12-17 1979-12-17 Coating process

Publications (2)

Publication Number Publication Date
JPS5687471A true JPS5687471A (en) 1981-07-16
JPS621793B2 JPS621793B2 (en) 1987-01-16

Family

ID=15792484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16440479A Granted JPS5687471A (en) 1979-12-17 1979-12-17 Coating process

Country Status (1)

Country Link
JP (1) JPS5687471A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5950525A (en) * 1982-09-16 1984-03-23 M Setetsuku Kk Photo resist applying device
JPS60149131A (en) * 1984-01-17 1985-08-06 Fujitsu Ltd Method of applying resist
JPS60193339A (en) * 1984-03-14 1985-10-01 Fujitsu Ltd Method of coating resist film
JPS6156414A (en) * 1984-08-28 1986-03-22 Fujitsu Ltd Spin coating method
JPS61119341U (en) * 1985-01-10 1986-07-28
JPS6379635U (en) * 1986-11-11 1988-05-26
US5001084A (en) * 1986-11-27 1991-03-19 Mitsubishi Denki Kabushiki Kaisha Method for applying a treatment liquid on a semiconductor wafer
JP2004160336A (en) * 2002-11-12 2004-06-10 Seiko Epson Corp Film forming apparatus, film forming method, manufacturing method for organic el device and liquid discharge device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5950525A (en) * 1982-09-16 1984-03-23 M Setetsuku Kk Photo resist applying device
JPS60149131A (en) * 1984-01-17 1985-08-06 Fujitsu Ltd Method of applying resist
JPH0463532B2 (en) * 1984-01-17 1992-10-12 Fujitsu Ltd
JPS60193339A (en) * 1984-03-14 1985-10-01 Fujitsu Ltd Method of coating resist film
JPS6156414A (en) * 1984-08-28 1986-03-22 Fujitsu Ltd Spin coating method
JPS61119341U (en) * 1985-01-10 1986-07-28
JPH0236276Y2 (en) * 1985-01-10 1990-10-03
JPS6379635U (en) * 1986-11-11 1988-05-26
US5001084A (en) * 1986-11-27 1991-03-19 Mitsubishi Denki Kabushiki Kaisha Method for applying a treatment liquid on a semiconductor wafer
JP2004160336A (en) * 2002-11-12 2004-06-10 Seiko Epson Corp Film forming apparatus, film forming method, manufacturing method for organic el device and liquid discharge device

Also Published As

Publication number Publication date
JPS621793B2 (en) 1987-01-16

Similar Documents

Publication Publication Date Title
JPS5217815A (en) Substrate and material using the same
JPS5687471A (en) Coating process
JPS5654435A (en) Photosensitive resin coating method
JPS5249772A (en) Process for production of semiconductor device
DE3374790D1 (en) Method for forming thin films
JPS6461025A (en) Method of finely processing polyimide film
JPS55157737A (en) Resist pattern forming method for photofabrication
JPS569742A (en) Developing method of photosensitive resin
JPS57176040A (en) Preparation of photomask
JPS5275438A (en) Liquid development means for diazo type copying machine
JPS5691434A (en) Method for forming pattern of deposited film by lift-off method
JPS5646230A (en) Exposing method
JPS5763829A (en) Pattern forming method
JPS5689741A (en) Dryplate for photomasking
JPS51122140A (en) A process for manufacturing a coated metal having a coat of uniform th ickness
JPS5427367A (en) Manufacture of microwave circuit pattern
JPS5342829A (en) Image supporting material
JPS6472309A (en) Manufacture of thin film magnetic head
JPS5318965A (en) Resist coating method
JPS5389674A (en) Forming method of fine pattern in semiconductor
JPS57111261A (en) Formation of stria of glass base plate
JPS51132085A (en) Manufacturing method of semiconductor device
JPS52119204A (en) Magnetic disc production
JPS53120529A (en) Forming method of positive type radiation sensitive material layer
JPS52155058A (en) Film formation method