JPS57111261A - Formation of stria of glass base plate - Google Patents
Formation of stria of glass base plateInfo
- Publication number
- JPS57111261A JPS57111261A JP18796580A JP18796580A JPS57111261A JP S57111261 A JPS57111261 A JP S57111261A JP 18796580 A JP18796580 A JP 18796580A JP 18796580 A JP18796580 A JP 18796580A JP S57111261 A JPS57111261 A JP S57111261A
- Authority
- JP
- Japan
- Prior art keywords
- base plate
- resin film
- glass base
- etching
- striae
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Surface Treatment Of Glass (AREA)
- Weting (AREA)
Abstract
PURPOSE: To prevent super adhesion between photo mask and wafer or master mask and copy mask, by applying a resin film to a glass plate in a striated way, followed by etching the coated plate with an etching solution having the equal etching rate both on the glass base plate and the resin film.
CONSTITUTION: For example, a resin such as the resin film 2 of PVA is applied to the surface of the glass base plate 1 for photo mask by rotary coating in such a way that striae are formed on the surface. The thickness of the resin film 2 is 7,000W8,000 A, and the difference of the thickness betweeen the ridge a and the bottom b of the striae is about 2,000 A. The all surface of the resin film 2 is uniformly etched with an etching solution having the equal etching rate both on the resin film 2 and the glass base plate 1. Consequently, the etching is advanced to the glass base plate 1 at the bottom b of the resin film 2, so that the striae 3 are formed on the surface of the glass base plate 1.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18796580A JPS57111261A (en) | 1980-12-29 | 1980-12-29 | Formation of stria of glass base plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18796580A JPS57111261A (en) | 1980-12-29 | 1980-12-29 | Formation of stria of glass base plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57111261A true JPS57111261A (en) | 1982-07-10 |
Family
ID=16215249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18796580A Pending JPS57111261A (en) | 1980-12-29 | 1980-12-29 | Formation of stria of glass base plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57111261A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0145604A2 (en) * | 1983-12-13 | 1985-06-19 | Saint Gobain Vitrage International | Method for brazing an electric connector to a current feed conductor of an electrically heated glass |
-
1980
- 1980-12-29 JP JP18796580A patent/JPS57111261A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0145604A2 (en) * | 1983-12-13 | 1985-06-19 | Saint Gobain Vitrage International | Method for brazing an electric connector to a current feed conductor of an electrically heated glass |
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