JPS5654435A - Photosensitive resin coating method - Google Patents

Photosensitive resin coating method

Info

Publication number
JPS5654435A
JPS5654435A JP13148879A JP13148879A JPS5654435A JP S5654435 A JPS5654435 A JP S5654435A JP 13148879 A JP13148879 A JP 13148879A JP 13148879 A JP13148879 A JP 13148879A JP S5654435 A JPS5654435 A JP S5654435A
Authority
JP
Japan
Prior art keywords
soln
resist
head
photosensitive resin
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13148879A
Other languages
Japanese (ja)
Inventor
Kenzo Hatada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP13148879A priority Critical patent/JPS5654435A/en
Publication of JPS5654435A publication Critical patent/JPS5654435A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To prevent the occurrence of creases on a resist film and obtain a pattern of high precision by applying a photosensitive resin to a substrate in an atmosphere contg. vapor of a solvent for the resin to the desired degree. CONSTITUTION:In a photosensitive resin (resist) applying method used to manufacture super LSI, etc., resist soln. 20' is dropped onto semiconductor substrate 11 on spinner head 12 from nozzle 17 with pump 23, head 12 is rotated, and 1/50 dil. resist soln. 21' is dropped from nozzle 18 while rotating head 12. Head 12 may be rotated simultaneously with dropping 1/10 dil. resist soln. 19' from nozzle 16, and then solns. 20', 21' are dropped in order, whereby the fittability of soln. 20' with substrate 11 is improved to rapidly disperse soln. 20', and the occurrence of creases on the resulting resist film is prevented by the presence of solvent vapor. Thus, a minute pattern is obtd. with accuracy to enhance the yield of super LSI, etc.
JP13148879A 1979-10-11 1979-10-11 Photosensitive resin coating method Pending JPS5654435A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13148879A JPS5654435A (en) 1979-10-11 1979-10-11 Photosensitive resin coating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13148879A JPS5654435A (en) 1979-10-11 1979-10-11 Photosensitive resin coating method

Publications (1)

Publication Number Publication Date
JPS5654435A true JPS5654435A (en) 1981-05-14

Family

ID=15059156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13148879A Pending JPS5654435A (en) 1979-10-11 1979-10-11 Photosensitive resin coating method

Country Status (1)

Country Link
JP (1) JPS5654435A (en)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5864027A (en) * 1981-10-13 1983-04-16 Nec Kyushu Ltd Semiconductor manufacturing device
EP0110558A2 (en) * 1982-10-28 1984-06-13 Fujitsu Limited Method and apparatus for use in developing resist film
JPH0194970A (en) * 1987-10-05 1989-04-13 Hitachi Maxell Ltd Rotary coating apparatus
JPH01107546A (en) * 1987-10-20 1989-04-25 Nec Corp Coating machine for polyimide coating agent
EP0403086A2 (en) * 1989-06-14 1990-12-19 Hewlett-Packard Company Method for improving deposit of photoresist on wafers
US5378511A (en) * 1993-03-22 1995-01-03 International Business Machines Corporation Material-saving resist spinner and process
JPH07169680A (en) * 1993-08-30 1995-07-04 Semiconductor Syst Inc Spin coating device and method of suchas wafer
US5449405A (en) * 1991-10-29 1995-09-12 International Business Machines Corporation Material-saving resist spinner and process
JPH07302745A (en) * 1994-05-10 1995-11-14 Hitachi Ltd Coating method and device
JP2000189883A (en) * 1994-08-08 2000-07-11 Tokyo Electron Ltd Method and apparatus for forming coating film
EP1847328A1 (en) * 1997-12-08 2007-10-24 ASML Holding N.V. Photoresist coating process control with solvent vapor sensor
JP2008006379A (en) * 2006-06-29 2008-01-17 Disco Abrasive Syst Ltd Protection film formation method
JP2012069823A (en) * 2010-09-24 2012-04-05 Seiko Instruments Inc Manufacturing method of semiconductor device

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5864027A (en) * 1981-10-13 1983-04-16 Nec Kyushu Ltd Semiconductor manufacturing device
EP0110558A2 (en) * 1982-10-28 1984-06-13 Fujitsu Limited Method and apparatus for use in developing resist film
JPH0741191B2 (en) * 1987-10-05 1995-05-10 日立マクセル株式会社 Spin coating device
JPH0194970A (en) * 1987-10-05 1989-04-13 Hitachi Maxell Ltd Rotary coating apparatus
JPH01107546A (en) * 1987-10-20 1989-04-25 Nec Corp Coating machine for polyimide coating agent
EP0403086A2 (en) * 1989-06-14 1990-12-19 Hewlett-Packard Company Method for improving deposit of photoresist on wafers
US5449405A (en) * 1991-10-29 1995-09-12 International Business Machines Corporation Material-saving resist spinner and process
US5378511A (en) * 1993-03-22 1995-01-03 International Business Machines Corporation Material-saving resist spinner and process
JPH07169680A (en) * 1993-08-30 1995-07-04 Semiconductor Syst Inc Spin coating device and method of suchas wafer
JPH07302745A (en) * 1994-05-10 1995-11-14 Hitachi Ltd Coating method and device
JP2000189883A (en) * 1994-08-08 2000-07-11 Tokyo Electron Ltd Method and apparatus for forming coating film
EP1847328A1 (en) * 1997-12-08 2007-10-24 ASML Holding N.V. Photoresist coating process control with solvent vapor sensor
JP2008006379A (en) * 2006-06-29 2008-01-17 Disco Abrasive Syst Ltd Protection film formation method
JP2012069823A (en) * 2010-09-24 2012-04-05 Seiko Instruments Inc Manufacturing method of semiconductor device

Similar Documents

Publication Publication Date Title
JPS5654435A (en) Photosensitive resin coating method
JPS5569265A (en) Pattern-forming method
JPS5669835A (en) Method for forming thin film pattern
EP0280197A3 (en) Process for forming photoresist pattern
JPS54102123A (en) Developing method
JPS574012A (en) Production of color filter
JPS57190912A (en) Production of color filter
JPS5687471A (en) Coating process
JPS5494881A (en) Exposure method
JPS57183030A (en) Manufacture of semiconductor device
JPS57143826A (en) Formation of resist pattern on gapped semiconductor substrate
JPS55138839A (en) Method of fabricating semiconductor device
JPS5235980A (en) Manufacturing method of semiconductor device
JPS569742A (en) Developing method of photosensitive resin
JPS5578531A (en) Semiconductor substrate
JPS55138835A (en) Method of forming photoresist pattern
JPS5616676A (en) Preparation of minute pattern
JPS5533035A (en) Forming of resist pattern shaped like inverted truncated pyramid
JPS56102582A (en) Etching process of thin film
JPS54159873A (en) Forming method of pattern on thin film
JPS5555528A (en) Mask aligner
JPS57191219A (en) Formation of silica coating pattern
JPS54109772A (en) Resist coating method
JPS5222936A (en) Method of making polaroid
JPS5659236A (en) Photoresist developing method