JPS54109772A - Resist coating method - Google Patents
Resist coating methodInfo
- Publication number
- JPS54109772A JPS54109772A JP1660778A JP1660778A JPS54109772A JP S54109772 A JPS54109772 A JP S54109772A JP 1660778 A JP1660778 A JP 1660778A JP 1660778 A JP1660778 A JP 1660778A JP S54109772 A JPS54109772 A JP S54109772A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- substrate
- linear
- baking
- inter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To prevent the second dispersion of the linear resist onto the substrate from the periphery of the substrate and thus to obtain the flat pattern by giving the spin-coating of the resist onto the substrate while spraying the inactive gas to the surface to be coated.
CONSTITUTION: The Si substrae is rotated at 4000rpm, and the positive resist of 35cp viscosity is dropped down to the center. At the same time, the N2 gas is sprayed toward the center and vertically to the substrate. Thus, no linear protrusion is caused to the coated resist. Also, the exposure is given via the electron beam to secure the 1μm inter-line space after the pre-baking, and then the development is given with the methyl isobutyl ketone solution. After this, no linear resist is left at the inter-line space even though the after-baking may be applied. As a result, a high-accuracy pattern can be obtained when the Al film pattern is formed on the resist.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1660778A JPS54109772A (en) | 1978-02-17 | 1978-02-17 | Resist coating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1660778A JPS54109772A (en) | 1978-02-17 | 1978-02-17 | Resist coating method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54109772A true JPS54109772A (en) | 1979-08-28 |
Family
ID=11920982
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1660778A Pending JPS54109772A (en) | 1978-02-17 | 1978-02-17 | Resist coating method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54109772A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60171115A (en) * | 1984-02-17 | 1985-09-04 | Toray Ind Inc | Preparation of thin film |
-
1978
- 1978-02-17 JP JP1660778A patent/JPS54109772A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60171115A (en) * | 1984-02-17 | 1985-09-04 | Toray Ind Inc | Preparation of thin film |
JPH0416429B2 (en) * | 1984-02-17 | 1992-03-24 | Toray Industries |
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