JPS5446479A - Negative plate for photo mask - Google Patents

Negative plate for photo mask

Info

Publication number
JPS5446479A
JPS5446479A JP11384077A JP11384077A JPS5446479A JP S5446479 A JPS5446479 A JP S5446479A JP 11384077 A JP11384077 A JP 11384077A JP 11384077 A JP11384077 A JP 11384077A JP S5446479 A JPS5446479 A JP S5446479A
Authority
JP
Japan
Prior art keywords
film
photo mask
resist film
conductive film
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11384077A
Other languages
Japanese (ja)
Other versions
JPS6025024B2 (en
Inventor
Takashi Itasaka
Kazuo Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP52113840A priority Critical patent/JPS6025024B2/en
Publication of JPS5446479A publication Critical patent/JPS5446479A/en
Publication of JPS6025024B2 publication Critical patent/JPS6025024B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To obtain a photo mask patterned with high precision, by stacking a transparent conductive film, pattern formation film, and conductive film on a transparent substrate.
CONSTITUTION: Transparent glass plate 1 is preheated and onto it, a mixed solution of SnCl3 and SbCl3 is sprayed, thereby forming transparent conductive film 4a. Next, Cr2O32 and Sn04b are laminated. If this photo-mask negative plate is made electrically conductive through a terminal attached to coating 4b, the charge accumulation is prevented at the time of exposing the resist film formed on the plate to charge particles. Therefore, the ecposure amount to the resist film will not be decreased and unstable, and the pattern formed on the resist film has no exposure unevenness, so that a fine pattern will be formed on the photo mask with high precision
COPYRIGHT: (C)1979,JPO&Japio
JP52113840A 1977-09-20 1977-09-20 Original plate for photomask Expired JPS6025024B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52113840A JPS6025024B2 (en) 1977-09-20 1977-09-20 Original plate for photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52113840A JPS6025024B2 (en) 1977-09-20 1977-09-20 Original plate for photomask

Publications (2)

Publication Number Publication Date
JPS5446479A true JPS5446479A (en) 1979-04-12
JPS6025024B2 JPS6025024B2 (en) 1985-06-15

Family

ID=14622360

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52113840A Expired JPS6025024B2 (en) 1977-09-20 1977-09-20 Original plate for photomask

Country Status (1)

Country Link
JP (1) JPS6025024B2 (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120137A (en) * 1979-03-09 1980-09-16 Chiyou Lsi Gijutsu Kenkyu Kumiai Masking material for manufacturing semiconductor device and manufacture of mask
JPS5739490U (en) * 1980-08-18 1982-03-03
JPS5741638A (en) * 1980-08-25 1982-03-08 Fujitsu Ltd Photomask for electron beam
JPS5796333A (en) * 1980-12-09 1982-06-15 Fujitsu Ltd Production of substrate for exposure of charged beam
JPS57144550A (en) * 1981-02-28 1982-09-07 Dainippon Printing Co Ltd Blank plate for photomask
JPS57144549A (en) * 1981-02-28 1982-09-07 Dainippon Printing Co Ltd Photomask
JPS59146954A (en) * 1982-12-28 1984-08-23 Seiko Epson Corp See-through mask
JPH02103046A (en) * 1988-10-12 1990-04-16 Toshiba Corp Manufacture of mask for producing semiconductor and hard mask blank placing table
JPH04223328A (en) * 1990-12-25 1992-08-13 Toppan Printing Co Ltd Photomask blank and photomask
JP2016182782A (en) * 2015-03-26 2016-10-20 アルプス電気株式会社 Decorative laminate structure, housing, and electronic apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS492626A (en) * 1972-04-24 1974-01-10
JPS5113577A (en) * 1974-06-19 1976-02-03 Western Electric Co

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS492626A (en) * 1972-04-24 1974-01-10
JPS5113577A (en) * 1974-06-19 1976-02-03 Western Electric Co

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120137A (en) * 1979-03-09 1980-09-16 Chiyou Lsi Gijutsu Kenkyu Kumiai Masking material for manufacturing semiconductor device and manufacture of mask
JPS6315740B2 (en) * 1979-03-09 1988-04-06 Cho Eru Esu Ai Gijutsu Kenkyu Kumiai
JPS5739490U (en) * 1980-08-18 1982-03-03
JPS6018870Y2 (en) * 1980-08-18 1985-06-07 株式会社東芝 Plug-in unit storage device
JPS6262336B2 (en) * 1980-08-25 1987-12-25 Fujitsu Ltd
JPS5741638A (en) * 1980-08-25 1982-03-08 Fujitsu Ltd Photomask for electron beam
JPS5796333A (en) * 1980-12-09 1982-06-15 Fujitsu Ltd Production of substrate for exposure of charged beam
JPH033379B2 (en) * 1980-12-09 1991-01-18 Fujitsu Ltd
JPS57144550A (en) * 1981-02-28 1982-09-07 Dainippon Printing Co Ltd Blank plate for photomask
JPS6322299B2 (en) * 1981-02-28 1988-05-11 Dainippon Printing Co Ltd
JPS6322298B2 (en) * 1981-02-28 1988-05-11 Dainippon Printing Co Ltd
JPS57144549A (en) * 1981-02-28 1982-09-07 Dainippon Printing Co Ltd Photomask
JPS59146954A (en) * 1982-12-28 1984-08-23 Seiko Epson Corp See-through mask
JPH02103046A (en) * 1988-10-12 1990-04-16 Toshiba Corp Manufacture of mask for producing semiconductor and hard mask blank placing table
JPH04223328A (en) * 1990-12-25 1992-08-13 Toppan Printing Co Ltd Photomask blank and photomask
JP2016182782A (en) * 2015-03-26 2016-10-20 アルプス電気株式会社 Decorative laminate structure, housing, and electronic apparatus

Also Published As

Publication number Publication date
JPS6025024B2 (en) 1985-06-15

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