JPS5446479A - Negative plate for photo mask - Google Patents
Negative plate for photo maskInfo
- Publication number
- JPS5446479A JPS5446479A JP11384077A JP11384077A JPS5446479A JP S5446479 A JPS5446479 A JP S5446479A JP 11384077 A JP11384077 A JP 11384077A JP 11384077 A JP11384077 A JP 11384077A JP S5446479 A JPS5446479 A JP S5446479A
- Authority
- JP
- Japan
- Prior art keywords
- film
- photo mask
- resist film
- conductive film
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To obtain a photo mask patterned with high precision, by stacking a transparent conductive film, pattern formation film, and conductive film on a transparent substrate.
CONSTITUTION: Transparent glass plate 1 is preheated and onto it, a mixed solution of SnCl3 and SbCl3 is sprayed, thereby forming transparent conductive film 4a. Next, Cr2O32 and Sn04b are laminated. If this photo-mask negative plate is made electrically conductive through a terminal attached to coating 4b, the charge accumulation is prevented at the time of exposing the resist film formed on the plate to charge particles. Therefore, the ecposure amount to the resist film will not be decreased and unstable, and the pattern formed on the resist film has no exposure unevenness, so that a fine pattern will be formed on the photo mask with high precision
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52113840A JPS6025024B2 (en) | 1977-09-20 | 1977-09-20 | Original plate for photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52113840A JPS6025024B2 (en) | 1977-09-20 | 1977-09-20 | Original plate for photomask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5446479A true JPS5446479A (en) | 1979-04-12 |
JPS6025024B2 JPS6025024B2 (en) | 1985-06-15 |
Family
ID=14622360
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52113840A Expired JPS6025024B2 (en) | 1977-09-20 | 1977-09-20 | Original plate for photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6025024B2 (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55120137A (en) * | 1979-03-09 | 1980-09-16 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Masking material for manufacturing semiconductor device and manufacture of mask |
JPS5739490U (en) * | 1980-08-18 | 1982-03-03 | ||
JPS5741638A (en) * | 1980-08-25 | 1982-03-08 | Fujitsu Ltd | Photomask for electron beam |
JPS5796333A (en) * | 1980-12-09 | 1982-06-15 | Fujitsu Ltd | Production of substrate for exposure of charged beam |
JPS57144550A (en) * | 1981-02-28 | 1982-09-07 | Dainippon Printing Co Ltd | Blank plate for photomask |
JPS57144549A (en) * | 1981-02-28 | 1982-09-07 | Dainippon Printing Co Ltd | Photomask |
JPS59146954A (en) * | 1982-12-28 | 1984-08-23 | Seiko Epson Corp | See-through mask |
JPH02103046A (en) * | 1988-10-12 | 1990-04-16 | Toshiba Corp | Manufacture of mask for producing semiconductor and hard mask blank placing table |
JPH04223328A (en) * | 1990-12-25 | 1992-08-13 | Toppan Printing Co Ltd | Photomask blank and photomask |
JP2016182782A (en) * | 2015-03-26 | 2016-10-20 | アルプス電気株式会社 | Decorative laminate structure, housing, and electronic apparatus |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS492626A (en) * | 1972-04-24 | 1974-01-10 | ||
JPS5113577A (en) * | 1974-06-19 | 1976-02-03 | Western Electric Co |
-
1977
- 1977-09-20 JP JP52113840A patent/JPS6025024B2/en not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS492626A (en) * | 1972-04-24 | 1974-01-10 | ||
JPS5113577A (en) * | 1974-06-19 | 1976-02-03 | Western Electric Co |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55120137A (en) * | 1979-03-09 | 1980-09-16 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Masking material for manufacturing semiconductor device and manufacture of mask |
JPS6315740B2 (en) * | 1979-03-09 | 1988-04-06 | Cho Eru Esu Ai Gijutsu Kenkyu Kumiai | |
JPS5739490U (en) * | 1980-08-18 | 1982-03-03 | ||
JPS6018870Y2 (en) * | 1980-08-18 | 1985-06-07 | 株式会社東芝 | Plug-in unit storage device |
JPS6262336B2 (en) * | 1980-08-25 | 1987-12-25 | Fujitsu Ltd | |
JPS5741638A (en) * | 1980-08-25 | 1982-03-08 | Fujitsu Ltd | Photomask for electron beam |
JPS5796333A (en) * | 1980-12-09 | 1982-06-15 | Fujitsu Ltd | Production of substrate for exposure of charged beam |
JPH033379B2 (en) * | 1980-12-09 | 1991-01-18 | Fujitsu Ltd | |
JPS57144550A (en) * | 1981-02-28 | 1982-09-07 | Dainippon Printing Co Ltd | Blank plate for photomask |
JPS6322299B2 (en) * | 1981-02-28 | 1988-05-11 | Dainippon Printing Co Ltd | |
JPS6322298B2 (en) * | 1981-02-28 | 1988-05-11 | Dainippon Printing Co Ltd | |
JPS57144549A (en) * | 1981-02-28 | 1982-09-07 | Dainippon Printing Co Ltd | Photomask |
JPS59146954A (en) * | 1982-12-28 | 1984-08-23 | Seiko Epson Corp | See-through mask |
JPH02103046A (en) * | 1988-10-12 | 1990-04-16 | Toshiba Corp | Manufacture of mask for producing semiconductor and hard mask blank placing table |
JPH04223328A (en) * | 1990-12-25 | 1992-08-13 | Toppan Printing Co Ltd | Photomask blank and photomask |
JP2016182782A (en) * | 2015-03-26 | 2016-10-20 | アルプス電気株式会社 | Decorative laminate structure, housing, and electronic apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS6025024B2 (en) | 1985-06-15 |
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