JPS57123826A - Method for forming oxide thin film pattern - Google Patents

Method for forming oxide thin film pattern

Info

Publication number
JPS57123826A
JPS57123826A JP56009569A JP956981A JPS57123826A JP S57123826 A JPS57123826 A JP S57123826A JP 56009569 A JP56009569 A JP 56009569A JP 956981 A JP956981 A JP 956981A JP S57123826 A JPS57123826 A JP S57123826A
Authority
JP
Japan
Prior art keywords
thin film
oxide thin
volume ratio
solution
hcl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56009569A
Other languages
Japanese (ja)
Other versions
JPS6317773B2 (en
Inventor
Toshiaki Murakami
Minoru Suzuki
Yoichi Enomoto
Takashi Inukai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP56009569A priority Critical patent/JPS57123826A/en
Publication of JPS57123826A publication Critical patent/JPS57123826A/en
Publication of JPS6317773B2 publication Critical patent/JPS6317773B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PURPOSE: To form a pattern of oxide thin film, in high dimensional accuracy, without leaving the insoluble materials at the edge, by etching an oxide thin film containing both Ba and Pb with a solution obtained by adding a specific volume ratio of HCl to an aqueous solution containing a specific volume ratio of HClO4.
CONSTITUTION: A BaPb1-xBixO3 thin film formed on a substrate is coated with a positive resist, exposed to light through a mask having a desired circuit pattern, and developed to obtain an oxide thin film composed of BaPb1-xBixO3 contaning both Ba and Pb. The unnecessary part of the oxide thin film is removed with an etching solution obtained by adding a 60W62% HCl O4 solution to water at a volume ratio of 20W60%, and adding a 35W37% HCl solution to the above solution at a volume ratio of 0.3W1%.
COPYRIGHT: (C)1982,JPO&Japio
JP56009569A 1981-01-27 1981-01-27 Method for forming oxide thin film pattern Granted JPS57123826A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56009569A JPS57123826A (en) 1981-01-27 1981-01-27 Method for forming oxide thin film pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56009569A JPS57123826A (en) 1981-01-27 1981-01-27 Method for forming oxide thin film pattern

Publications (2)

Publication Number Publication Date
JPS57123826A true JPS57123826A (en) 1982-08-02
JPS6317773B2 JPS6317773B2 (en) 1988-04-15

Family

ID=11723923

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56009569A Granted JPS57123826A (en) 1981-01-27 1981-01-27 Method for forming oxide thin film pattern

Country Status (1)

Country Link
JP (1) JPS57123826A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5947783A (en) * 1982-09-10 1984-03-17 Nippon Telegr & Teleph Corp <Ntt> Formation of pattern of oxide superconductor
US5646095A (en) * 1991-06-18 1997-07-08 International Business Machines Corporation Selective insulation etching for fabricating superconductor microcircuits
US8246847B2 (en) * 2005-09-12 2012-08-21 Nippon Sheet Glass Company, Limited Separating method for conductive ceramics sintered body
US8409401B2 (en) 2005-09-12 2013-04-02 Nippon Sheet Glass Co., Ltd. Separating method for dark ceramics sintered body

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5947783A (en) * 1982-09-10 1984-03-17 Nippon Telegr & Teleph Corp <Ntt> Formation of pattern of oxide superconductor
JPH0343794B2 (en) * 1982-09-10 1991-07-03 Nippon Telegraph & Telephone
US5646095A (en) * 1991-06-18 1997-07-08 International Business Machines Corporation Selective insulation etching for fabricating superconductor microcircuits
US8246847B2 (en) * 2005-09-12 2012-08-21 Nippon Sheet Glass Company, Limited Separating method for conductive ceramics sintered body
US8409401B2 (en) 2005-09-12 2013-04-02 Nippon Sheet Glass Co., Ltd. Separating method for dark ceramics sintered body

Also Published As

Publication number Publication date
JPS6317773B2 (en) 1988-04-15

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