JPS57167026A - Photo mask - Google Patents

Photo mask

Info

Publication number
JPS57167026A
JPS57167026A JP5398181A JP5398181A JPS57167026A JP S57167026 A JPS57167026 A JP S57167026A JP 5398181 A JP5398181 A JP 5398181A JP 5398181 A JP5398181 A JP 5398181A JP S57167026 A JPS57167026 A JP S57167026A
Authority
JP
Japan
Prior art keywords
thin film
light shielding
amorphous semiconductor
pattern
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5398181A
Other languages
Japanese (ja)
Other versions
JPS627537B2 (en
Inventor
Jun Uno
Teruhiko Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP5398181A priority Critical patent/JPS57167026A/en
Publication of JPS57167026A publication Critical patent/JPS57167026A/en
Publication of JPS627537B2 publication Critical patent/JPS627537B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0216—Coatings
    • H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02162—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors
    • H01L31/02164—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors for shielding light, e.g. light blocking layers, cold shields for infrared detectors

Abstract

PURPOSE:To prevent an electrically conductive thin film from damage and to avoid pattern deformation in usage, by providing a light shielding thin film such as metal (oxide) on conductive amorphous semiconductor film formed on an insulating transparent substrate. CONSTITUTION:An amorphous semiconductor thin film 5 of high electric conductivity is formed on an insulating transparent substrate 1 with plasma decomposition method, a light shielding thin film 3 made of metal (oxide) is coated to form a bland plate. Photo resist is coated on it, exposure is partially and selectively made with a prescribed pattern and etching is made by taking a pattern 4 of photo resist obtained by development processing as a mask. The photo mask is formed without etching of an amorphous semiconductor thin film 5. Thus, stable conductivity is kept by using substance not chemically similar to the light shielding thin film as the raw material of the transparent conductive thin film, without degradation or removal of the transparent conductive thin film in the processing of light shielding thin film.
JP5398181A 1981-04-08 1981-04-08 Photo mask Granted JPS57167026A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5398181A JPS57167026A (en) 1981-04-08 1981-04-08 Photo mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5398181A JPS57167026A (en) 1981-04-08 1981-04-08 Photo mask

Publications (2)

Publication Number Publication Date
JPS57167026A true JPS57167026A (en) 1982-10-14
JPS627537B2 JPS627537B2 (en) 1987-02-18

Family

ID=12957796

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5398181A Granted JPS57167026A (en) 1981-04-08 1981-04-08 Photo mask

Country Status (1)

Country Link
JP (1) JPS57167026A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59123840A (en) * 1982-12-29 1984-07-17 Konishiroku Photo Ind Co Ltd Manufacture of material for exposing mask

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59123840A (en) * 1982-12-29 1984-07-17 Konishiroku Photo Ind Co Ltd Manufacture of material for exposing mask
JPH0437422B2 (en) * 1982-12-29 1992-06-19 Konishiroku Photo Ind

Also Published As

Publication number Publication date
JPS627537B2 (en) 1987-02-18

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