JPS57130421A - Photo mask - Google Patents

Photo mask

Info

Publication number
JPS57130421A
JPS57130421A JP1549181A JP1549181A JPS57130421A JP S57130421 A JPS57130421 A JP S57130421A JP 1549181 A JP1549181 A JP 1549181A JP 1549181 A JP1549181 A JP 1549181A JP S57130421 A JPS57130421 A JP S57130421A
Authority
JP
Japan
Prior art keywords
pattern
photo
semiconductor substrate
photo resist
external circumference
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1549181A
Other languages
Japanese (ja)
Inventor
Yoshiaki Yadoiwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP1549181A priority Critical patent/JPS57130421A/en
Publication of JPS57130421A publication Critical patent/JPS57130421A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Abstract

PURPOSE:To prevent a generation of photo resist dust by using in the outer circumference part of a semiconductor substrate a photo mask having a pattern in the manner as leaving no photo resist available for manufacture of a semiconductor device. CONSTITUTION:The area of a photo mask pattern face is made a little smaller than the area of a semiconductor substrate 1 to transcriber a mask pattern 5. However, from the area slightly inside of the external circumference of the substrate 1 to the photo mask face which is wider than the external circumference, a light shielding pattern is formed when a negative photo resist pattern is to be obtained while a light transmitting pattern is formed when a positive photo resist pattern is to be obtained. According to such a constitution, after the photo resist pattern has been developed, the resist would not be left in the external circumference of the substrate. Therefore, if the end face at the external circumference of the semiconductor substrate may make contact with a semiconductor manufacturing equipment and a semiconductor substrate housing cassette or the like, no dust would be completely generated.
JP1549181A 1981-02-04 1981-02-04 Photo mask Pending JPS57130421A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1549181A JPS57130421A (en) 1981-02-04 1981-02-04 Photo mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1549181A JPS57130421A (en) 1981-02-04 1981-02-04 Photo mask

Publications (1)

Publication Number Publication Date
JPS57130421A true JPS57130421A (en) 1982-08-12

Family

ID=11890260

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1549181A Pending JPS57130421A (en) 1981-02-04 1981-02-04 Photo mask

Country Status (1)

Country Link
JP (1) JPS57130421A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6039046U (en) * 1983-08-24 1985-03-18 凸版印刷株式会社 mask board
JPS6039047U (en) * 1983-08-24 1985-03-18 凸版印刷株式会社 mask blank board
JPS60108852A (en) * 1983-11-18 1985-06-14 Fuji Xerox Co Ltd Mask for exposure of photolithography

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5016479A (en) * 1973-06-11 1975-02-21

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5016479A (en) * 1973-06-11 1975-02-21

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6039046U (en) * 1983-08-24 1985-03-18 凸版印刷株式会社 mask board
JPS6039047U (en) * 1983-08-24 1985-03-18 凸版印刷株式会社 mask blank board
JPS60108852A (en) * 1983-11-18 1985-06-14 Fuji Xerox Co Ltd Mask for exposure of photolithography

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