JPS6039047U - mask blank board - Google Patents
mask blank boardInfo
- Publication number
- JPS6039047U JPS6039047U JP1983130550U JP13055083U JPS6039047U JP S6039047 U JPS6039047 U JP S6039047U JP 1983130550 U JP1983130550 U JP 1983130550U JP 13055083 U JP13055083 U JP 13055083U JP S6039047 U JPS6039047 U JP S6039047U
- Authority
- JP
- Japan
- Prior art keywords
- mask blank
- blank board
- transparent substrate
- board
- shielding film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来のマスクブランク板の一例を示し第１図イ
は平面図、第１図口は断面図である。第２図は従来のマ
スクブランク板の欠点を示す説明図であり、第３図は本
考案のマスクブランク板の一実施例を示し第３図イは平
面図、第３図口は断面図である。第４図は本考案のマス
クブランク板の製造法の一例を示す説明図である。
１・・・透明基板、２・・・遮光膜、３・・・周辺部、
４・・・側面、５・・・粉片、６・・・パターン部。FIG. 1 shows an example of a conventional mask blank plate, and FIG. 1A is a plan view, and FIG. 1A is a sectional view. Fig. 2 is an explanatory diagram showing the drawbacks of the conventional mask blank board, and Fig. 3 shows an embodiment of the mask blank board of the present invention. be. FIG. 4 is an explanatory diagram showing an example of a method for manufacturing a mask blank plate of the present invention. 1... Transparent substrate, 2... Light shielding film, 3... Peripheral part,
4...Side surface, 5...Powder piece, 6...Pattern part.
Claims (1)
を一様に形成してなること特徴とするマスクブランク板
。1. A mask blank plate, characterized in that a light-shielding film is uniformly formed on one side of a transparent substrate except for the periphery of the transparent substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1983130550U JPS6039047U (en) | 1983-08-24 | 1983-08-24 | mask blank board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1983130550U JPS6039047U (en) | 1983-08-24 | 1983-08-24 | mask blank board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6039047U true JPS6039047U (en) | 1985-03-18 |
Family
ID=30295438
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1983130550U Pending JPS6039047U (en) | 1983-08-24 | 1983-08-24 | mask blank board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6039047U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004051369A1 (en) * | 2002-12-03 | 2004-06-17 | Hoya Corporation | Photomask blank, and photomask |
| JP2005210093A (en) * | 2003-12-25 | 2005-08-04 | Hoya Corp | Substrate with muti-layer reflective film, exposure reflection type mask blank, exposure reflection type mask, and manufacturing methods for these |
| US7635544B2 (en) | 2004-09-13 | 2009-12-22 | Hoya Corporation | Transparent substrate for mask blank and mask blank |
| JP2011124612A (en) * | 2003-12-25 | 2011-06-23 | Hoya Corp | Substrate having multilayer reflection film, reflection type mask blanks for exposure and reflection type mask for exposure, and method of manufacturing the same |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57130421A (en) * | 1981-02-04 | 1982-08-12 | Nec Corp | Photo mask |
| JPS5868748A (en) * | 1981-10-21 | 1983-04-23 | Hitachi Ltd | Photomask and developing method using said mask |
-
1983
- 1983-08-24 JP JP1983130550U patent/JPS6039047U/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57130421A (en) * | 1981-02-04 | 1982-08-12 | Nec Corp | Photo mask |
| JPS5868748A (en) * | 1981-10-21 | 1983-04-23 | Hitachi Ltd | Photomask and developing method using said mask |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004051369A1 (en) * | 2002-12-03 | 2004-06-17 | Hoya Corporation | Photomask blank, and photomask |
| KR100779956B1 (en) | 2002-12-03 | 2007-11-28 | 호야 가부시키가이샤 | Photomask blank and manufacturing process of photomask |
| JP2005210093A (en) * | 2003-12-25 | 2005-08-04 | Hoya Corp | Substrate with muti-layer reflective film, exposure reflection type mask blank, exposure reflection type mask, and manufacturing methods for these |
| JP2011124612A (en) * | 2003-12-25 | 2011-06-23 | Hoya Corp | Substrate having multilayer reflection film, reflection type mask blanks for exposure and reflection type mask for exposure, and method of manufacturing the same |
| US7635544B2 (en) | 2004-09-13 | 2009-12-22 | Hoya Corporation | Transparent substrate for mask blank and mask blank |
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