JPS56165244A - Manufacture of multilayer thin film electrode - Google Patents
Manufacture of multilayer thin film electrodeInfo
- Publication number
- JPS56165244A JPS56165244A JP6847980A JP6847980A JPS56165244A JP S56165244 A JPS56165244 A JP S56165244A JP 6847980 A JP6847980 A JP 6847980A JP 6847980 A JP6847980 A JP 6847980A JP S56165244 A JPS56165244 A JP S56165244A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist film
- base plate
- predetermined pattern
- light
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
PURPOSE:To form precisely an electrode pattern, by forming electrode films of a predetermined pattern on a light permeable insulating base plate, next, forming successively a light permeable insulator layer, an electrode coating and a photoresist film on them, and having them irradiated by light from the back surface side of the base plate. CONSTITUTION:Shift electrodes y11, y12 which are the first layer of a predetermined pattern are formed on a glass base plate. Then, thin films of a dielectric layer of Al2O3 and a metal layer 11 of Cr are formed on them so that light can be transmitted. Next, after spreading a positive type photoresist film 12, they are irradiated by ultraviolet rays from the back surface of the base plate. Then, after exposing the photoresist film 12 while applying electrodes y11, y12 as masks, and the photoresist film 12 is formed into a predetermined pattern, the metal layer 11 is formed into a predetermined pattern by means of the patterned photoresist film 12 utilized as a mask.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6847980A JPS56165244A (en) | 1980-05-22 | 1980-05-22 | Manufacture of multilayer thin film electrode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6847980A JPS56165244A (en) | 1980-05-22 | 1980-05-22 | Manufacture of multilayer thin film electrode |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56165244A true JPS56165244A (en) | 1981-12-18 |
Family
ID=13374856
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6847980A Pending JPS56165244A (en) | 1980-05-22 | 1980-05-22 | Manufacture of multilayer thin film electrode |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56165244A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2754633A1 (en) * | 1996-10-14 | 1998-04-17 | Corning Inc | Manufacture of plasma screen displays using two electrode networks |
US6238829B1 (en) * | 1997-05-20 | 2001-05-29 | Sony Corporation | Method of manufacturing plasma addressed electro-optical display |
-
1980
- 1980-05-22 JP JP6847980A patent/JPS56165244A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2754633A1 (en) * | 1996-10-14 | 1998-04-17 | Corning Inc | Manufacture of plasma screen displays using two electrode networks |
US6238829B1 (en) * | 1997-05-20 | 2001-05-29 | Sony Corporation | Method of manufacturing plasma addressed electro-optical display |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5565365A (en) | Pattern forming method | |
JPS5548935A (en) | Forming of electrode pattern | |
JPS56165244A (en) | Manufacture of multilayer thin film electrode | |
JPS56168654A (en) | Photomask | |
JPS5446479A (en) | Negative plate for photo mask | |
JPS5797626A (en) | Manufacture of semiconductor device | |
JPS56153646A (en) | Manufacture of electrode for display panel | |
JPS5680130A (en) | Manufacture of semiconductor device | |
JPS53147531A (en) | Forming method for thin film pattern | |
JPS5637629A (en) | Formation of thin film pattern | |
JPS57118641A (en) | Lifting-off method | |
JPS5732635A (en) | Production of semiconductor device | |
JPS5689741A (en) | Dryplate for photomasking | |
JPS5594491A (en) | Forming method for thick minute metal pattern | |
JPS5640828A (en) | Production of photomask | |
JPS5621328A (en) | Method of making pattern | |
JPS57112025A (en) | Formation of pattern | |
JPS57102015A (en) | Pattern formation | |
JPS56130750A (en) | Manufacture of mask | |
JPS5787046A (en) | Forming method for index phospher of beam index type color picture tube | |
JPS5743425A (en) | Forming method for fine pattern | |
JPS5452473A (en) | Forming method for coating for fine pattern | |
JPS5778026A (en) | Production of optical display panel | |
JPS56130751A (en) | Manufacture of mask | |
JPS5719931A (en) | Electrode forming method for face discharge type gas discharge panel |