JPS52120770A - Thin film formation method - Google Patents
Thin film formation methodInfo
- Publication number
- JPS52120770A JPS52120770A JP3715376A JP3715376A JPS52120770A JP S52120770 A JPS52120770 A JP S52120770A JP 3715376 A JP3715376 A JP 3715376A JP 3715376 A JP3715376 A JP 3715376A JP S52120770 A JPS52120770 A JP S52120770A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film formation
- formation method
- substrate
- enhance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Weting (AREA)
Abstract
PURPOSE: To enhance the adhesion intensity between the substrate and metal film by coating metal layer on the semiconductor substrate with photo resist pattern formed through ion beam evaporation method using ion acceleration voltage of over 50V substantially and then by removing the resist.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3715376A JPS52120770A (en) | 1976-04-05 | 1976-04-05 | Thin film formation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3715376A JPS52120770A (en) | 1976-04-05 | 1976-04-05 | Thin film formation method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52120770A true JPS52120770A (en) | 1977-10-11 |
Family
ID=12489653
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3715376A Pending JPS52120770A (en) | 1976-04-05 | 1976-04-05 | Thin film formation method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52120770A (en) |
-
1976
- 1976-04-05 JP JP3715376A patent/JPS52120770A/en active Pending
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