JPS52117550A - Electrode formation method - Google Patents

Electrode formation method

Info

Publication number
JPS52117550A
JPS52117550A JP3491976A JP3491976A JPS52117550A JP S52117550 A JPS52117550 A JP S52117550A JP 3491976 A JP3491976 A JP 3491976A JP 3491976 A JP3491976 A JP 3491976A JP S52117550 A JPS52117550 A JP S52117550A
Authority
JP
Japan
Prior art keywords
formation method
electrode formation
electrode
electrode film
sensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3491976A
Other languages
Japanese (ja)
Other versions
JPS6019661B2 (en
Inventor
Akira Kojima
Yoshio Nagakubo
Norio Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP3491976A priority Critical patent/JPS6019661B2/en
Publication of JPS52117550A publication Critical patent/JPS52117550A/en
Publication of JPS6019661B2 publication Critical patent/JPS6019661B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE: To form both lower and upper electrode film on the entire surface by coating sensitive resin onto the electrode non-formation area of semiconductor substrate and then to select and remove the lower electrode film by removing the electrode film and sensitive resin at the non-formation area. Thus, multi-player electrode of micro-pattern can be obtained.
COPYRIGHT: (C)1977,JPO&Japio
JP3491976A 1976-03-30 1976-03-30 Electrode formation method Expired JPS6019661B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3491976A JPS6019661B2 (en) 1976-03-30 1976-03-30 Electrode formation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3491976A JPS6019661B2 (en) 1976-03-30 1976-03-30 Electrode formation method

Publications (2)

Publication Number Publication Date
JPS52117550A true JPS52117550A (en) 1977-10-03
JPS6019661B2 JPS6019661B2 (en) 1985-05-17

Family

ID=12427614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3491976A Expired JPS6019661B2 (en) 1976-03-30 1976-03-30 Electrode formation method

Country Status (1)

Country Link
JP (1) JPS6019661B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55125627A (en) * 1979-03-22 1980-09-27 Hitachi Ltd Formation of electrode for semiconductor device
JPS574156A (en) * 1980-06-10 1982-01-09 Nec Corp Semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55125627A (en) * 1979-03-22 1980-09-27 Hitachi Ltd Formation of electrode for semiconductor device
JPS574156A (en) * 1980-06-10 1982-01-09 Nec Corp Semiconductor device

Also Published As

Publication number Publication date
JPS6019661B2 (en) 1985-05-17

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