JPS52120782A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS52120782A JPS52120782A JP3807176A JP3807176A JPS52120782A JP S52120782 A JPS52120782 A JP S52120782A JP 3807176 A JP3807176 A JP 3807176A JP 3807176 A JP3807176 A JP 3807176A JP S52120782 A JPS52120782 A JP S52120782A
- Authority
- JP
- Japan
- Prior art keywords
- manufacture
- semiconductor device
- oxide film
- substrate
- faithful
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Weting (AREA)
Abstract
PURPOSE: The anode oxidation is given to part of the surface of metal thin film coated on the semiconductor substrate to convert it to oxide film, and the exposed area of the substrate is etched by gas plasma using the above oxide film for the mask. In this way, the etching which has no electro migration and is faithful to the pattern becomes possible.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3807176A JPS52120782A (en) | 1976-04-05 | 1976-04-05 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3807176A JPS52120782A (en) | 1976-04-05 | 1976-04-05 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52120782A true JPS52120782A (en) | 1977-10-11 |
Family
ID=12515246
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3807176A Pending JPS52120782A (en) | 1976-04-05 | 1976-04-05 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52120782A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5469091A (en) * | 1977-11-11 | 1979-06-02 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
JPS5494880A (en) * | 1978-01-11 | 1979-07-26 | Mitsubishi Electric Corp | Circuit pattern forming method of semiconductor device |
JPS5496363A (en) * | 1978-01-13 | 1979-07-30 | Mitsubishi Electric Corp | Electrode forming method for semiconductor device |
JPS56162831A (en) * | 1980-05-19 | 1981-12-15 | Mitsubishi Electric Corp | Forming method for electrode and wiring layer |
JPS5740958A (en) * | 1980-08-25 | 1982-03-06 | Mitsubishi Electric Corp | Formation of wiring pattern |
JPS57134929A (en) * | 1981-02-14 | 1982-08-20 | Mitsubishi Electric Corp | Method for interconnection-pattern forming |
JPS57172739A (en) * | 1981-04-17 | 1982-10-23 | Toshiba Corp | Pattern forming method |
JPS57180149A (en) * | 1981-04-30 | 1982-11-06 | Nec Corp | Manufacture of semiconductor device |
JPS59117113A (en) * | 1982-12-24 | 1984-07-06 | Fujitsu Ltd | Formation of wiring pattern |
JPH0277120A (en) * | 1988-06-09 | 1990-03-16 | Mitsubishi Electric Corp | Thin film formation |
-
1976
- 1976-04-05 JP JP3807176A patent/JPS52120782A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5469091A (en) * | 1977-11-11 | 1979-06-02 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
JPS5494880A (en) * | 1978-01-11 | 1979-07-26 | Mitsubishi Electric Corp | Circuit pattern forming method of semiconductor device |
JPS5496363A (en) * | 1978-01-13 | 1979-07-30 | Mitsubishi Electric Corp | Electrode forming method for semiconductor device |
JPS56162831A (en) * | 1980-05-19 | 1981-12-15 | Mitsubishi Electric Corp | Forming method for electrode and wiring layer |
JPS5740958A (en) * | 1980-08-25 | 1982-03-06 | Mitsubishi Electric Corp | Formation of wiring pattern |
JPS57134929A (en) * | 1981-02-14 | 1982-08-20 | Mitsubishi Electric Corp | Method for interconnection-pattern forming |
JPS57172739A (en) * | 1981-04-17 | 1982-10-23 | Toshiba Corp | Pattern forming method |
JPS57180149A (en) * | 1981-04-30 | 1982-11-06 | Nec Corp | Manufacture of semiconductor device |
JPS59117113A (en) * | 1982-12-24 | 1984-07-06 | Fujitsu Ltd | Formation of wiring pattern |
JPH0277120A (en) * | 1988-06-09 | 1990-03-16 | Mitsubishi Electric Corp | Thin film formation |
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