JPS5555532A - Method of manufacturing semiconductor integrated circuit - Google Patents
Method of manufacturing semiconductor integrated circuitInfo
- Publication number
- JPS5555532A JPS5555532A JP12798578A JP12798578A JPS5555532A JP S5555532 A JPS5555532 A JP S5555532A JP 12798578 A JP12798578 A JP 12798578A JP 12798578 A JP12798578 A JP 12798578A JP S5555532 A JPS5555532 A JP S5555532A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- negative
- positive
- positive photoresist
- integrated circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To accurately process a negative pattern, by coating a negative photoresist on a silicon dioxide film on a substrate, coating a positive photoresist on the negative photoresist and using a positive pattern as a mask.
CONSTITUTION: A negative photoresist 102 and a positive photoresist 103 are coated on a silicon dioxide film 101 on a substrate 100. The positive photoresist 103 is develop-removed. The negative photoresist 102 is etched under an atmosphere of oxygen plasma by using the positive photoresist 103 as a mask. Gas etching is performed under an atmosphere of hydrogen fluoride gas to make an opening 104. Since the resolution of the positive photoresist 103 is higher than that of the negative photoresist 102, the positive photoresist is appropriate to make a fine pattern.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12798578A JPS5555532A (en) | 1978-10-18 | 1978-10-18 | Method of manufacturing semiconductor integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12798578A JPS5555532A (en) | 1978-10-18 | 1978-10-18 | Method of manufacturing semiconductor integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5555532A true JPS5555532A (en) | 1980-04-23 |
Family
ID=14973586
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12798578A Pending JPS5555532A (en) | 1978-10-18 | 1978-10-18 | Method of manufacturing semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5555532A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006107942A1 (en) * | 2005-04-05 | 2006-10-12 | Analog Devices, Inc. | Vapor hf etch process mask and method |
-
1978
- 1978-10-18 JP JP12798578A patent/JPS5555532A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006107942A1 (en) * | 2005-04-05 | 2006-10-12 | Analog Devices, Inc. | Vapor hf etch process mask and method |
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