JPS6446932A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS6446932A JPS6446932A JP20378187A JP20378187A JPS6446932A JP S6446932 A JPS6446932 A JP S6446932A JP 20378187 A JP20378187 A JP 20378187A JP 20378187 A JP20378187 A JP 20378187A JP S6446932 A JPS6446932 A JP S6446932A
- Authority
- JP
- Japan
- Prior art keywords
- film
- etched
- metallic silicide
- resist
- nitride film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE:To eliminate the need for another process for removing a low reflecting film, and to form a fine pattern accurately by forming a metallic silicide nitride film or a metallic silicide oxynitride film onto a film to be etched and getting rid of a resist and the metallic silicide nitride film or the metallic silicide oxynitride film at a time. CONSTITUTION:A film to be etched 12 is shaped onto a semiconductor substrate or an oxide film 11, a metallic silicide nitride film or a metallic silicide oxynitride film 13 is formed onto the film 12, and a resist film 14 is shaped onto the film 13 and a fine pattern is formed. The nitride film 13 is etched, using the resist film 14 as an etching mask, and the film to be etched 12 is etched, employing the resist film 14 and the nitride film 13 as etching masks. The resist film 14 and the nitride film 13 are taken off at a time. Accordingly, the number of processes can be decreased, and a fine pattern can easily be formed accurately without damaging the substrate, etc.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20378187A JPH0738389B2 (en) | 1987-08-17 | 1987-08-17 | Method for manufacturing semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20378187A JPH0738389B2 (en) | 1987-08-17 | 1987-08-17 | Method for manufacturing semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6446932A true JPS6446932A (en) | 1989-02-21 |
JPH0738389B2 JPH0738389B2 (en) | 1995-04-26 |
Family
ID=16479668
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20378187A Expired - Lifetime JPH0738389B2 (en) | 1987-08-17 | 1987-08-17 | Method for manufacturing semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0738389B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100479960B1 (en) * | 2002-06-17 | 2005-03-30 | 동부아남반도체 주식회사 | Method for forming diffused reflection film for the photo-resist pattern to be form precisely |
EP2202578A1 (en) * | 2008-12-25 | 2010-06-30 | National Institute of Advanced Industrial Science and Technology | Etching resist |
CN102199333A (en) * | 2010-03-22 | 2011-09-28 | 苏州美克思科技发展有限公司 | Method for manufacturing advanced reinforced phenolic honeycomb core composite material |
-
1987
- 1987-08-17 JP JP20378187A patent/JPH0738389B2/en not_active Expired - Lifetime
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100479960B1 (en) * | 2002-06-17 | 2005-03-30 | 동부아남반도체 주식회사 | Method for forming diffused reflection film for the photo-resist pattern to be form precisely |
EP2202578A1 (en) * | 2008-12-25 | 2010-06-30 | National Institute of Advanced Industrial Science and Technology | Etching resist |
JP2010152105A (en) * | 2008-12-25 | 2010-07-08 | National Institute Of Advanced Industrial Science & Technology | Etching resist |
US8734964B2 (en) | 2008-12-25 | 2014-05-27 | National Institute Of Advanced Industrial Science And Technology | Etching resist |
CN102199333A (en) * | 2010-03-22 | 2011-09-28 | 苏州美克思科技发展有限公司 | Method for manufacturing advanced reinforced phenolic honeycomb core composite material |
Also Published As
Publication number | Publication date |
---|---|
JPH0738389B2 (en) | 1995-04-26 |
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