JPS6379635U - - Google Patents
Info
- Publication number
- JPS6379635U JPS6379635U JP17383386U JP17383386U JPS6379635U JP S6379635 U JPS6379635 U JP S6379635U JP 17383386 U JP17383386 U JP 17383386U JP 17383386 U JP17383386 U JP 17383386U JP S6379635 U JPS6379635 U JP S6379635U
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- semiconductor manufacturing
- coating
- semiconductor wafer
- maintaining
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 229920002120 photoresistant polymer Polymers 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Description
第１図は、本考案に係る半導体製造装置の一実
施例を示す概略縦断側面図、第２図は第１図の半
導体製造装置によつてフオトレジスト膜を形成し
た半導体ウエーハを示す縦断側面図、第３図は本
考案に係る半導体製造装置の他の実施例を示す概
略側断面図、第４図並びに第５図は夫々、従来の
半導体製造装置を示す概略縦断側面図、第６図乃
至第８図は、上記従来の半導体製造装置における
問題点を説明するための図面である。
Ｗ……半導体ウエーハ、Ｆ……フオトレジスト
膜、２０……チヤンバー。
FIG. 1 is a schematic vertical side view showing an embodiment of a semiconductor manufacturing apparatus according to the present invention, and FIG. 2 is a vertical side view showing a semiconductor wafer on which a photoresist film is formed by the semiconductor manufacturing apparatus shown in FIG. , FIG. 3 is a schematic side sectional view showing another embodiment of the semiconductor manufacturing apparatus according to the present invention, FIGS. 4 and 5 are schematic longitudinal sectional side views showing a conventional semiconductor manufacturing apparatus, and FIGS. FIG. 8 is a diagram for explaining problems in the conventional semiconductor manufacturing apparatus. W...Semiconductor wafer, F...Photoresist film, 20...Chamber.
Claims (1)
オトレジスト膜を形成する装置であつて、上記フ
オトレジスト塗布作業領域を、上記フオトレジス
トに含まれる溶剤と同一溶剤の蒸気雰囲気に保つ
た手段を設けたことを特徴とする半導体製造装置
。 An apparatus for coating a semiconductor wafer with a photoresist to form a photoresist film, comprising means for maintaining the photoresist coating work area in a vapor atmosphere of the same solvent as that contained in the photoresist. Features of semiconductor manufacturing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17383386U JPS6379635U (en) | 1986-11-11 | 1986-11-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17383386U JPS6379635U (en) | 1986-11-11 | 1986-11-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6379635U true JPS6379635U (en) | 1988-05-26 |
Family
ID=31111667
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17383386U Pending JPS6379635U (en) | 1986-11-11 | 1986-11-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6379635U (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5687471A (en) * | 1979-12-17 | 1981-07-16 | Matsushita Electric Ind Co Ltd | Coating process |
| JPS6010248A (en) * | 1983-06-30 | 1985-01-19 | Fujitsu Ltd | Resist coating method |
-
1986
- 1986-11-11 JP JP17383386U patent/JPS6379635U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5687471A (en) * | 1979-12-17 | 1981-07-16 | Matsushita Electric Ind Co Ltd | Coating process |
| JPS6010248A (en) * | 1983-06-30 | 1985-01-19 | Fujitsu Ltd | Resist coating method |