JPS6050419A - サ−マル質量流量計 - Google Patents
サ−マル質量流量計Info
- Publication number
- JPS6050419A JPS6050419A JP58203752A JP20375283A JPS6050419A JP S6050419 A JPS6050419 A JP S6050419A JP 58203752 A JP58203752 A JP 58203752A JP 20375283 A JP20375283 A JP 20375283A JP S6050419 A JPS6050419 A JP S6050419A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- channel
- flow
- thermal mass
- sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 70
- 239000012530 fluid Substances 0.000 claims description 44
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 16
- 238000005530 etching Methods 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 11
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- 229910052710 silicon Inorganic materials 0.000 claims description 9
- 238000000151 deposition Methods 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000012937 correction Methods 0.000 claims description 3
- 238000005520 cutting process Methods 0.000 claims description 2
- 238000012544 monitoring process Methods 0.000 claims description 2
- 238000002161 passivation Methods 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 150000003377 silicon compounds Chemical group 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 239000007789 gas Substances 0.000 description 24
- 238000011144 upstream manufacturing Methods 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 230000004044 response Effects 0.000 description 10
- 238000012546 transfer Methods 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 230000006870 function Effects 0.000 description 7
- 229910052581 Si3N4 Inorganic materials 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 238000011109 contamination Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000005070 sampling Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910000792 Monel Inorganic materials 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910001120 nichrome Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XOJVVFBFDXDTEG-UHFFFAOYSA-N Norphytane Natural products CC(C)CCCC(C)CCCC(C)CCCC(C)C XOJVVFBFDXDTEG-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 229940030980 inova Drugs 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- HEPLMSKRHVKCAQ-UHFFFAOYSA-N lead nickel Chemical compound [Ni].[Pb] HEPLMSKRHVKCAQ-UHFFFAOYSA-N 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- -1 microetching Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/68—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using thermal effects
- G01F1/684—Structural arrangements; Mounting of elements, e.g. in relation to fluid flow
- G01F1/6842—Structural arrangements; Mounting of elements, e.g. in relation to fluid flow with means for influencing the fluid flow
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/68—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using thermal effects
- G01F1/684—Structural arrangements; Mounting of elements, e.g. in relation to fluid flow
- G01F1/6845—Micromachined devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/68—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using thermal effects
- G01F1/696—Circuits therefor, e.g. constant-current flow meters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/68—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using thermal effects
- G01F1/696—Circuits therefor, e.g. constant-current flow meters
- G01F1/6965—Circuits therefor, e.g. constant-current flow meters comprising means to store calibration data for flow signal calculation or correction
Landscapes
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Volume Flow (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/526,860 US4542650A (en) | 1983-08-26 | 1983-08-26 | Thermal mass flow meter |
| US526860 | 1990-05-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6050419A true JPS6050419A (ja) | 1985-03-20 |
| JPH0342616B2 JPH0342616B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-06-27 |
Family
ID=24099109
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58203752A Granted JPS6050419A (ja) | 1983-08-26 | 1983-11-01 | サ−マル質量流量計 |
Country Status (4)
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4794947A (en) * | 1986-11-29 | 1989-01-03 | Kabushiki Kaisha Nippon IC (also trading as Nippon IC, Inc.) | Mass flow controller |
| JP2004514140A (ja) * | 2000-11-03 | 2004-05-13 | メンシク インコーポレイテッド | 閉ループヒータ制御付き熱対流加速度計 |
| WO2008132956A1 (ja) * | 2007-04-24 | 2008-11-06 | Konica Minolta Medical & Graphic, Inc. | 流量センサ |
| WO2013175547A1 (ja) * | 2012-05-21 | 2013-11-28 | 愛知時計電機 株式会社 | 流量検出器 |
Families Citing this family (110)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4691566A (en) * | 1984-12-07 | 1987-09-08 | Aine Harry E | Immersed thermal fluid flow sensor |
| US4790181A (en) * | 1983-12-01 | 1988-12-13 | Aine Harry E | Thermal mass flow meter and method of making same |
| US4648270A (en) * | 1984-02-22 | 1987-03-10 | Sirris Flow Technology, Inc. | Mass flowmeter |
| JPS60236024A (ja) * | 1984-05-09 | 1985-11-22 | Nippon Soken Inc | 直熱型空気流量センサ |
| JPS61178614A (ja) * | 1985-02-02 | 1986-08-11 | Nippon Soken Inc | 直熱型流量センサ |
| US4685331A (en) * | 1985-04-10 | 1987-08-11 | Innovus | Thermal mass flowmeter and controller |
| JPS61274222A (ja) * | 1985-05-30 | 1986-12-04 | Sharp Corp | 流量センサ |
| FR2586105B1 (fr) * | 1985-08-06 | 1990-08-31 | Veglia | Circuit conducteur et procede de fabrication de ce circuit |
| JPS62123318A (ja) * | 1985-08-13 | 1987-06-04 | Nippon Soken Inc | 直熱型流量センサ |
| GB2179748B (en) * | 1985-08-20 | 1989-09-06 | Sharp Kk | Thermal flow sensor |
| AT396998B (de) * | 1985-12-09 | 1994-01-25 | Ottosensors Corp | Messeinrichtungen und rohranschluss sowie verfahren zur herstellung einer messeinrichtung und verfahren zur verbindung von rohren mit einer messeinrichtung bzw. zur herstellung von rohranschlüssen |
| US4682503A (en) * | 1986-05-16 | 1987-07-28 | Honeywell Inc. | Microscopic size, thermal conductivity type, air or gas absolute pressure sensor |
| DE3724966C3 (de) * | 1986-07-29 | 1996-03-21 | Sharp Kk | Sensor |
| US4821997A (en) * | 1986-09-24 | 1989-04-18 | The Board Of Trustees Of The Leland Stanford Junior University | Integrated, microminiature electric-to-fluidic valve and pressure/flow regulator |
| US4943032A (en) * | 1986-09-24 | 1990-07-24 | Stanford University | Integrated, microminiature electric to fluidic valve and pressure/flow regulator |
| US4966646A (en) * | 1986-09-24 | 1990-10-30 | Board Of Trustees Of Leland Stanford University | Method of making an integrated, microminiature electric-to-fluidic valve |
| JPH06103287B2 (ja) * | 1987-10-07 | 1994-12-14 | シャープ株式会社 | センサ素子 |
| US4909078A (en) * | 1987-10-14 | 1990-03-20 | Rosemount Inc. | Fluid flow detector |
| US4888988A (en) * | 1987-12-23 | 1989-12-26 | Siemens-Bendix Automotive Electronics L.P. | Silicon based mass airflow sensor and its fabrication method |
| US4870745A (en) * | 1987-12-23 | 1989-10-03 | Siemens-Bendix Automotive Electronics L.P. | Methods of making silicon-based sensors |
| US5074629A (en) * | 1988-10-26 | 1991-12-24 | Stanford University | Integrated variable focal length lens and its applications |
| DE3842399C2 (de) * | 1988-12-16 | 1997-07-31 | Fisher Rosemount Gmbh & Co Ges | Mikroströmungsfühler für Gase |
| JPH06100568B2 (ja) * | 1989-09-05 | 1994-12-12 | シャープ株式会社 | 雰囲気センサ |
| DE3907209C1 (de) * | 1989-01-18 | 1990-03-01 | Danfoss A/S, Nordborg | Vorrichtung zum Überwachen eines Leitungssystems für Fluid auf Leckstellen |
| GB2240627A (en) * | 1990-02-05 | 1991-08-07 | Yamatake Honeywell Co Ltd | Microbridge flow sensor |
| US5050429A (en) * | 1990-02-22 | 1991-09-24 | Yamatake-Honeywell Co., Ltd. | Microbridge flow sensor |
| US5291781A (en) * | 1991-04-12 | 1994-03-08 | Yamatake-Honeywell Co., Ltd. | Diaphragm-type sensor |
| US5193400A (en) * | 1991-05-10 | 1993-03-16 | Lew Hyok S | Universal rotameter |
| JP2992848B2 (ja) * | 1991-08-21 | 1999-12-20 | 株式会社山武 | 熱伝導率検出器 |
| US5406841A (en) * | 1992-03-17 | 1995-04-18 | Ricoh Seiki Company, Ltd. | Flow sensor |
| US5349322A (en) * | 1992-03-27 | 1994-09-20 | Ngk Insulators, Ltd. | Resistors for thermal flowmeters |
| US5423212A (en) * | 1993-06-18 | 1995-06-13 | Ricoh Seiki Company, Ltd. | Flow sensor |
| WO1995002164A1 (en) * | 1993-07-07 | 1995-01-19 | Ic Sensors, Inc. | Pulsed thermal flow sensor system |
| US5511416A (en) * | 1993-09-15 | 1996-04-30 | Alicat Scientific, Inc. | Wide range laminar flow element |
| DE4344101C2 (de) * | 1993-12-20 | 1996-02-22 | Birnbaum Jacek | Vorrichtung zur Luftmassenmessung im Lufteinlaßkanal einer Brennkraftmaschine |
| US5719333A (en) * | 1994-01-20 | 1998-02-17 | Honda Giken Kogyo Kabushiki Kaisha | Acceleration sensor |
| US5520969A (en) * | 1994-02-04 | 1996-05-28 | Applied Materials, Inc. | Method for in-situ liquid flow rate estimation and verification |
| JP3244208B2 (ja) * | 1994-02-07 | 2002-01-07 | 本田技研工業株式会社 | ガスレート検出器 |
| JP3312227B2 (ja) * | 1994-02-23 | 2002-08-05 | 本田技研工業株式会社 | ガス式角速度センサ |
| JP3281169B2 (ja) * | 1994-03-24 | 2002-05-13 | 本田技研工業株式会社 | 多軸型ガスレートセンサ |
| US5786744A (en) * | 1994-03-24 | 1998-07-28 | Honda Giken Kogyo Kabushiki Kaisha | Hybrid sensor |
| US5461910A (en) * | 1994-06-16 | 1995-10-31 | Alnor Instrument Company | Fluid flow direction and velocity monitor |
| JP3282773B2 (ja) * | 1994-12-12 | 2002-05-20 | 東京瓦斯株式会社 | 熱式流量計 |
| DE19534906C2 (de) * | 1995-09-20 | 1998-03-19 | Deutsche Automobilgesellsch | Sensoranordnung zum Messen der Masse eines strömenden Mediums nach dem Prinzip des Heißfilm-Anemometers |
| NO304328B1 (no) * | 1996-02-27 | 1998-11-30 | Nyfotek As | TrykkmÕler |
| WO1997049998A1 (en) | 1996-06-26 | 1997-12-31 | Simon Fraser University | Accelerometer without proof mass |
| US6182509B1 (en) | 1996-06-26 | 2001-02-06 | Simon Fraser University | Accelerometer without proof mass |
| US6589433B2 (en) | 1996-06-26 | 2003-07-08 | Simon Fraser University | Accelerometer without proof mass |
| US5868159A (en) * | 1996-07-12 | 1999-02-09 | Mks Instruments, Inc. | Pressure-based mass flow controller |
| DE19744228C1 (de) * | 1997-10-07 | 1998-11-26 | Bosch Gmbh Robert | Sensor mit einer Membran |
| DE19803186C1 (de) * | 1998-01-28 | 1999-06-17 | Bosch Gmbh Robert | Verfahren zur Herstellung strukturierter Wafer |
| US6794981B2 (en) * | 1998-12-07 | 2004-09-21 | Honeywell International Inc. | Integratable-fluid flow and property microsensor assembly |
| DE19906100C2 (de) * | 1999-02-13 | 2003-07-31 | Sls Micro Technology Gmbh | Thermischer Durchflußsensor in Mikrosystemtechnik |
| JP3562712B2 (ja) * | 1999-05-17 | 2004-09-08 | 松下電器産業株式会社 | 流量計測装置 |
| US6367970B1 (en) * | 1999-06-07 | 2002-04-09 | The United States Of America As Represented By The Secretary Of The Navy | Rapid response h-q-T sensor |
| JP3461469B2 (ja) * | 1999-07-27 | 2003-10-27 | 株式会社日立製作所 | 熱式空気流量センサ及び内燃機関制御装置 |
| DE19952055A1 (de) * | 1999-10-28 | 2001-05-17 | Bosch Gmbh Robert | Massenflußsensor mit verbesserter Membranstabilität |
| US6526823B2 (en) * | 1999-11-30 | 2003-03-04 | California Institute Of Technology | Microelectromechanical system sensor assembly |
| KR100447378B1 (ko) * | 2000-05-19 | 2004-09-04 | 미쓰비시덴키 가부시키가이샤 | 감열식 유량 검출 소자 및 그 홀더 |
| JP3825242B2 (ja) * | 2000-10-17 | 2006-09-27 | 株式会社山武 | フローセンサ |
| US6631638B2 (en) | 2001-01-30 | 2003-10-14 | Rosemount Aerospace Inc. | Fluid flow sensor |
| GB2375401A (en) * | 2001-05-03 | 2002-11-13 | Endress & Hauser Ltd | A flow meter incorporating thermal loss sensors and an installation adapter to provide known flow conditions upstream of the flow meter |
| JP2003035580A (ja) * | 2001-07-19 | 2003-02-07 | Denso Corp | フローセンサ |
| US20030130624A1 (en) * | 2002-01-07 | 2003-07-10 | Kowalik Francis C. | Medical infusion system with integrated power supply and pump therefor |
| EP1365216B1 (en) * | 2002-05-10 | 2018-01-17 | Azbil Corporation | Flow sensor and method of manufacturing the same |
| US6796172B2 (en) * | 2002-07-31 | 2004-09-28 | Hewlett-Packard Development Company, L.P. | Flow sensor |
| US6684695B1 (en) * | 2002-10-08 | 2004-02-03 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Mass flow sensor utilizing a resistance bridge |
| TW559460U (en) * | 2002-12-12 | 2003-10-21 | Ind Tech Res Inst | Enhanced heat conductance structure configured with electrodes |
| US6799456B2 (en) * | 2003-02-26 | 2004-10-05 | Ckd Corporation | Thermal flow sensor |
| GB0307616D0 (en) | 2003-04-02 | 2003-05-07 | Melexis Nv | Calorimetric flow meter |
| US7131766B2 (en) * | 2003-07-16 | 2006-11-07 | Delphi Technologies, Inc. | Temperature sensor apparatus and method |
| US20050120805A1 (en) * | 2003-12-04 | 2005-06-09 | John Lane | Method and apparatus for substrate temperature control |
| US7481213B2 (en) * | 2004-02-11 | 2009-01-27 | Hewlett-Packard Development Company, L.P. | Medicament dispenser |
| US7467630B2 (en) * | 2004-02-11 | 2008-12-23 | Hewlett-Packard Development Company, L.P. | Medicament dispenser |
| US7036369B2 (en) * | 2004-06-30 | 2006-05-02 | Codman & Shurtleff, Inc. | Thermal flow sensor having recesses in a substrate |
| US7181963B2 (en) * | 2004-06-30 | 2007-02-27 | Codman & Shurtleff, Inc | Thermal flow sensor having streamlined packaging |
| US20060000272A1 (en) * | 2004-06-30 | 2006-01-05 | Beat Neuenschwander | Thermal flow sensor having an asymmetric design |
| US20060108003A1 (en) * | 2004-11-15 | 2006-05-25 | Bradford Steven K | Fluid flow and leak detection system |
| CN100468029C (zh) * | 2005-03-03 | 2009-03-11 | 清华大学 | 标准漏孔及其制作方法 |
| GB0504379D0 (en) * | 2005-03-03 | 2005-04-06 | Melexis Nv | Low profile overmoulded semiconductor package with transparent lid |
| TWI272374B (en) * | 2005-11-29 | 2007-02-01 | Ind Tech Res Inst | Flow measurement device and manufacture method thereof |
| US8302471B2 (en) * | 2005-12-02 | 2012-11-06 | Melexis Nv | Calorimetric flow meter having high heat conductivity strips |
| US7755466B2 (en) | 2006-04-26 | 2010-07-13 | Honeywell International Inc. | Flip-chip flow sensor |
| US20080013291A1 (en) * | 2006-07-17 | 2008-01-17 | Toralf Bork | Thermal flow sensor having streamlined packaging |
| US7480577B1 (en) * | 2007-02-21 | 2009-01-20 | Murray F Feller | Multiple sensor flow meter |
| DE202007003027U1 (de) * | 2007-03-01 | 2007-06-21 | Sensirion Ag | Vorrichtung zur Handhabung von Fluiden mit einem Flußsensor |
| TW200918899A (en) * | 2007-10-24 | 2009-05-01 | Univ Yuan Ze | Fluid reactor with thin chip of two-dimensionally distributed micro-resistance units |
| US20110252882A1 (en) * | 2010-04-19 | 2011-10-20 | Honeywell International Inc. | Robust sensor with top cap |
| DE102010043686A1 (de) | 2010-11-10 | 2012-05-10 | Agilent Technologies Inc. | Bestimmen einer Flüssigkeitszusammensetzung aus unterschiedlich gewonnenen Flusssignalen |
| DE102010055115B4 (de) * | 2010-11-16 | 2018-07-19 | Diehl Metering Gmbh | Durchflusssensor zum Einsetzen in eine Messstrecke |
| DE102011054225B4 (de) | 2011-10-06 | 2018-08-23 | Hjs Emission Technology Gmbh & Co. Kg | Verfahren zum Bestimmen des bei einer mehrflutigen Abgasreinigungsanlage durch jeden Teilstrang strömenden Abgasvolumens sowie Abgasreinigungsanlage |
| DE102011120899B4 (de) * | 2011-12-12 | 2015-08-20 | Karlsruher Institut für Technologie | Verfahren und Verwendung einer Vorrichtung zur Bestimmung des Massenstroms eines Fluids |
| JP5945782B2 (ja) * | 2012-06-28 | 2016-07-05 | パナソニックＩｐマネジメント株式会社 | 流体計測装置 |
| DE102013101403B8 (de) * | 2012-12-21 | 2024-07-11 | Innovative Sensor Technology Ist Ag | Sensor zur Ermittlung einer Prozessgröße eines Mediums und Verfahren zur Herstellung des Sensors |
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| AU2019299093B2 (en) | 2018-07-06 | 2024-08-15 | Becton, Dickinson And Company | Flow sensor and method for adjusting fluid flow measurement |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US4794947A (en) * | 1986-11-29 | 1989-01-03 | Kabushiki Kaisha Nippon IC (also trading as Nippon IC, Inc.) | Mass flow controller |
| JP2004514140A (ja) * | 2000-11-03 | 2004-05-13 | メンシク インコーポレイテッド | 閉ループヒータ制御付き熱対流加速度計 |
| WO2008132956A1 (ja) * | 2007-04-24 | 2008-11-06 | Konica Minolta Medical & Graphic, Inc. | 流量センサ |
| WO2013175547A1 (ja) * | 2012-05-21 | 2013-11-28 | 愛知時計電機 株式会社 | 流量検出器 |
| JPWO2013175547A1 (ja) * | 2012-05-21 | 2016-01-12 | 愛知時計電機株式会社 | 流量検出器 |
| US9752906B2 (en) | 2012-05-21 | 2017-09-05 | Aichi Tokei Denki Co., Ltd. | Flow volume detector |
Also Published As
| Publication number | Publication date |
|---|---|
| US4542650A (en) | 1985-09-24 |
| JPH0342616B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-06-27 |
| DE137687T1 (de) | 1986-02-27 |
| EP0137687A1 (en) | 1985-04-17 |
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