JPS6029745A - パタ−ン形成方法 - Google Patents

パタ−ン形成方法

Info

Publication number
JPS6029745A
JPS6029745A JP58138271A JP13827183A JPS6029745A JP S6029745 A JPS6029745 A JP S6029745A JP 58138271 A JP58138271 A JP 58138271A JP 13827183 A JP13827183 A JP 13827183A JP S6029745 A JPS6029745 A JP S6029745A
Authority
JP
Japan
Prior art keywords
copolymer
resin film
dry etching
pattern
crosslinking agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58138271A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0377988B2 (enExample
Inventor
Seiji Akimoto
誠司 秋本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58138271A priority Critical patent/JPS6029745A/ja
Publication of JPS6029745A publication Critical patent/JPS6029745A/ja
Publication of JPH0377988B2 publication Critical patent/JPH0377988B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP58138271A 1983-07-28 1983-07-28 パタ−ン形成方法 Granted JPS6029745A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58138271A JPS6029745A (ja) 1983-07-28 1983-07-28 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58138271A JPS6029745A (ja) 1983-07-28 1983-07-28 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS6029745A true JPS6029745A (ja) 1985-02-15
JPH0377988B2 JPH0377988B2 (enExample) 1991-12-12

Family

ID=15218017

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58138271A Granted JPS6029745A (ja) 1983-07-28 1983-07-28 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS6029745A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100957013B1 (ko) 2008-05-27 2010-05-13 연세대학교 산학협력단 반도체 박막의 제조방법
WO2023228691A1 (ja) * 2022-05-27 2023-11-30 日本ゼオン株式会社 ポジ型レジスト組成物

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118243A (en) * 1981-01-14 1982-07-23 Toshiba Corp Formation of fine resist pattern
JPS5833246A (ja) * 1981-08-24 1983-02-26 Oki Electric Ind Co Ltd ポジ型レジストのパタ−ン形成方法
JPS58113933A (ja) * 1981-12-26 1983-07-07 Daikin Ind Ltd レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法
JPS58116532A (ja) * 1981-12-29 1983-07-11 Fujitsu Ltd パタ−ン形成方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118243A (en) * 1981-01-14 1982-07-23 Toshiba Corp Formation of fine resist pattern
JPS5833246A (ja) * 1981-08-24 1983-02-26 Oki Electric Ind Co Ltd ポジ型レジストのパタ−ン形成方法
JPS58113933A (ja) * 1981-12-26 1983-07-07 Daikin Ind Ltd レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法
JPS58116532A (ja) * 1981-12-29 1983-07-11 Fujitsu Ltd パタ−ン形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100957013B1 (ko) 2008-05-27 2010-05-13 연세대학교 산학협력단 반도체 박막의 제조방법
WO2023228691A1 (ja) * 2022-05-27 2023-11-30 日本ゼオン株式会社 ポジ型レジスト組成物

Also Published As

Publication number Publication date
JPH0377988B2 (enExample) 1991-12-12

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