JPH0377988B2 - - Google Patents
Info
- Publication number
- JPH0377988B2 JPH0377988B2 JP58138271A JP13827183A JPH0377988B2 JP H0377988 B2 JPH0377988 B2 JP H0377988B2 JP 58138271 A JP58138271 A JP 58138271A JP 13827183 A JP13827183 A JP 13827183A JP H0377988 B2 JPH0377988 B2 JP H0377988B2
- Authority
- JP
- Japan
- Prior art keywords
- copolymer
- resin film
- electron beam
- crosslinked
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58138271A JPS6029745A (ja) | 1983-07-28 | 1983-07-28 | パタ−ン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58138271A JPS6029745A (ja) | 1983-07-28 | 1983-07-28 | パタ−ン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6029745A JPS6029745A (ja) | 1985-02-15 |
| JPH0377988B2 true JPH0377988B2 (enExample) | 1991-12-12 |
Family
ID=15218017
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58138271A Granted JPS6029745A (ja) | 1983-07-28 | 1983-07-28 | パタ−ン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6029745A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100957013B1 (ko) | 2008-05-27 | 2010-05-13 | 연세대학교 산학협력단 | 반도체 박막의 제조방법 |
| JPWO2023228691A1 (enExample) * | 2022-05-27 | 2023-11-30 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57118243A (en) * | 1981-01-14 | 1982-07-23 | Toshiba Corp | Formation of fine resist pattern |
| JPS5833246A (ja) * | 1981-08-24 | 1983-02-26 | Oki Electric Ind Co Ltd | ポジ型レジストのパタ−ン形成方法 |
| JPS58113933A (ja) * | 1981-12-26 | 1983-07-07 | Daikin Ind Ltd | レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法 |
| JPS58116532A (ja) * | 1981-12-29 | 1983-07-11 | Fujitsu Ltd | パタ−ン形成方法 |
-
1983
- 1983-07-28 JP JP58138271A patent/JPS6029745A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6029745A (ja) | 1985-02-15 |
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