JPS6227535B2 - - Google Patents

Info

Publication number
JPS6227535B2
JPS6227535B2 JP52120656A JP12065677A JPS6227535B2 JP S6227535 B2 JPS6227535 B2 JP S6227535B2 JP 52120656 A JP52120656 A JP 52120656A JP 12065677 A JP12065677 A JP 12065677A JP S6227535 B2 JPS6227535 B2 JP S6227535B2
Authority
JP
Japan
Prior art keywords
electron beam
water
resist
seconds
development
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52120656A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5453966A (en
Inventor
Takateru Asano
Tsutomu Tsujimura
Hideo Kunyoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Yakuhin Kogyo KK
Victor Company of Japan Ltd
Panasonic Holdings Corp
Original Assignee
Fuji Yakuhin Kogyo KK
Victor Company of Japan Ltd
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Yakuhin Kogyo KK, Victor Company of Japan Ltd, Matsushita Electric Industrial Co Ltd filed Critical Fuji Yakuhin Kogyo KK
Priority to JP12065677A priority Critical patent/JPS5453966A/ja
Publication of JPS5453966A publication Critical patent/JPS5453966A/ja
Publication of JPS6227535B2 publication Critical patent/JPS6227535B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Wet Developing In Electrophotography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP12065677A 1977-10-07 1977-10-07 Development method of electron beam resist Granted JPS5453966A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12065677A JPS5453966A (en) 1977-10-07 1977-10-07 Development method of electron beam resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12065677A JPS5453966A (en) 1977-10-07 1977-10-07 Development method of electron beam resist

Publications (2)

Publication Number Publication Date
JPS5453966A JPS5453966A (en) 1979-04-27
JPS6227535B2 true JPS6227535B2 (enExample) 1987-06-15

Family

ID=14791624

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12065677A Granted JPS5453966A (en) 1977-10-07 1977-10-07 Development method of electron beam resist

Country Status (1)

Country Link
JP (1) JPS5453966A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2550655B2 (ja) * 1988-04-26 1996-11-06 凸版印刷株式会社 ポジ型電子線レジスト
JP4190343B2 (ja) * 2002-05-09 2008-12-03 ダイセル化学工業株式会社 分子認識高分子化合物の製造方法
CN110133965B (zh) * 2018-02-09 2023-04-07 台湾永光化学工业股份有限公司 化学增幅型正型光阻组合物

Also Published As

Publication number Publication date
JPS5453966A (en) 1979-04-27

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