JPS59133365A - 真空装置 - Google Patents

真空装置

Info

Publication number
JPS59133365A
JPS59133365A JP22202383A JP22202383A JPS59133365A JP S59133365 A JPS59133365 A JP S59133365A JP 22202383 A JP22202383 A JP 22202383A JP 22202383 A JP22202383 A JP 22202383A JP S59133365 A JPS59133365 A JP S59133365A
Authority
JP
Japan
Prior art keywords
vacuum
valve
deposition chamber
vapor deposition
slow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22202383A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0124224B2 (enrdf_load_stackoverflow
Inventor
Kenichi Ikeda
健一 池田
Yasushi Asami
康 浅見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP22202383A priority Critical patent/JPS59133365A/ja
Publication of JPS59133365A publication Critical patent/JPS59133365A/ja
Publication of JPH0124224B2 publication Critical patent/JPH0124224B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP22202383A 1983-11-28 1983-11-28 真空装置 Granted JPS59133365A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22202383A JPS59133365A (ja) 1983-11-28 1983-11-28 真空装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22202383A JPS59133365A (ja) 1983-11-28 1983-11-28 真空装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP594177A Division JPS5913587B2 (ja) 1977-01-24 1977-01-24 真空蒸着装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP6573286A Division JPS61217572A (ja) 1986-03-26 1986-03-26 真空装置による処理方法

Publications (2)

Publication Number Publication Date
JPS59133365A true JPS59133365A (ja) 1984-07-31
JPH0124224B2 JPH0124224B2 (enrdf_load_stackoverflow) 1989-05-10

Family

ID=16775885

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22202383A Granted JPS59133365A (ja) 1983-11-28 1983-11-28 真空装置

Country Status (1)

Country Link
JP (1) JPS59133365A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6191375A (ja) * 1984-10-11 1986-05-09 Hitachi Electronics Eng Co Ltd プラズマエツチング装置の排気ベント機構
FR2606426A1 (fr) * 1986-11-10 1988-05-13 Stoltenberg Kevin Procede et systeme de traitement de pieces sous vide
WO2011102405A1 (ja) * 2010-02-18 2011-08-25 株式会社アルバック 縦型真空装置及び処理方法
JP2020095513A (ja) * 2018-12-13 2020-06-18 株式会社アルバック ベント装置
CN112609044A (zh) * 2020-12-11 2021-04-06 北京首钢股份有限公司 一种rh预抽真空装置与方法
CN117305801A (zh) * 2023-11-29 2023-12-29 龙焱能源科技（杭州）有限公司 用于基板镀膜的传动装置及镀膜传动系统

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0430627U (enrdf_load_stackoverflow) * 1990-07-09 1992-03-12

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6191375A (ja) * 1984-10-11 1986-05-09 Hitachi Electronics Eng Co Ltd プラズマエツチング装置の排気ベント機構
FR2606426A1 (fr) * 1986-11-10 1988-05-13 Stoltenberg Kevin Procede et systeme de traitement de pieces sous vide
WO2011102405A1 (ja) * 2010-02-18 2011-08-25 株式会社アルバック 縦型真空装置及び処理方法
JP2020095513A (ja) * 2018-12-13 2020-06-18 株式会社アルバック ベント装置
CN112609044A (zh) * 2020-12-11 2021-04-06 北京首钢股份有限公司 一种rh预抽真空装置与方法
CN112609044B (zh) * 2020-12-11 2022-07-19 北京首钢股份有限公司 一种rh预抽真空装置与方法
CN117305801A (zh) * 2023-11-29 2023-12-29 龙焱能源科技（杭州）有限公司 用于基板镀膜的传动装置及镀膜传动系统
CN117305801B (zh) * 2023-11-29 2024-03-08 龙焱能源科技（杭州）有限公司 用于基板镀膜的传动装置及镀膜传动系统

Also Published As

Publication number Publication date
JPH0124224B2 (enrdf_load_stackoverflow) 1989-05-10

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