JPS57202742A - Glass for semiconductor coating - Google Patents

Glass for semiconductor coating

Info

Publication number
JPS57202742A
JPS57202742A JP56088411A JP8841181A JPS57202742A JP S57202742 A JPS57202742 A JP S57202742A JP 56088411 A JP56088411 A JP 56088411A JP 8841181 A JP8841181 A JP 8841181A JP S57202742 A JPS57202742 A JP S57202742A
Authority
JP
Japan
Prior art keywords
glass
hard
fluidity
crystalline glass
singularity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56088411A
Other languages
English (en)
Other versions
JPS6349897B2 (ja
Inventor
Masaru Shinpo
Katsujiro Tanzawa
Kazuyoshi Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP56088411A priority Critical patent/JPS57202742A/ja
Publication of JPS57202742A publication Critical patent/JPS57202742A/ja
Publication of JPS6349897B2 publication Critical patent/JPS6349897B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
JP56088411A 1981-06-09 1981-06-09 Glass for semiconductor coating Granted JPS57202742A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56088411A JPS57202742A (en) 1981-06-09 1981-06-09 Glass for semiconductor coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56088411A JPS57202742A (en) 1981-06-09 1981-06-09 Glass for semiconductor coating

Publications (2)

Publication Number Publication Date
JPS57202742A true JPS57202742A (en) 1982-12-11
JPS6349897B2 JPS6349897B2 (ja) 1988-10-06

Family

ID=13942050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56088411A Granted JPS57202742A (en) 1981-06-09 1981-06-09 Glass for semiconductor coating

Country Status (1)

Country Link
JP (1) JPS57202742A (ja)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012051761A (ja) * 2010-09-01 2012-03-15 Nippon Electric Glass Co Ltd 半導体被覆用ガラス
JP4927237B1 (ja) * 2011-05-26 2012-05-09 新電元工業株式会社 半導体接合保護用ガラス組成物、半導体装置の製造方法及び半導体装置
WO2012160962A1 (ja) * 2011-05-23 2012-11-29 新電元工業株式会社 半導体装置の製造方法及び半導体装置
WO2013030922A1 (ja) * 2011-08-29 2013-03-07 新電元工業株式会社 半導体接合保護用ガラス組成物、半導体装置の製造方法及び半導体装置
JP2013060353A (ja) * 2011-08-25 2013-04-04 Nippon Electric Glass Co Ltd 半導体素子被覆用ガラス
JP5184717B1 (ja) * 2012-01-31 2013-04-17 新電元工業株式会社 半導体接合保護用ガラス組成物、半導体装置の製造方法及び半導体装置
JP5340511B1 (ja) * 2012-05-08 2013-11-13 新電元工業株式会社 半導体装置の製造方法及び半導体装置
WO2013168236A1 (ja) * 2012-05-08 2013-11-14 新電元工業株式会社 樹脂封止型半導体装置及び樹脂封止型半導体装置の製造方法
JP5655139B2 (ja) * 2011-05-23 2015-01-14 新電元工業株式会社 半導体装置の製造方法及び半導体装置
JP5655140B2 (ja) * 2011-05-23 2015-01-14 新電元工業株式会社 半導体装置の製造方法及び半導体装置
JP5827398B2 (ja) * 2012-05-08 2015-12-02 新電元工業株式会社 半導体接合保護用ガラス組成物の製造方法、半導体装置の製造方法及び半導体装置
JPWO2013168623A1 (ja) * 2012-05-08 2016-01-07 新電元工業株式会社 半導体接合保護用ガラス組成物、半導体装置の製造方法及び半導体装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52134617A (en) * 1976-05-06 1977-11-11 Hitachi Ltd Composite of glass for coating on semiconductor apparatus
JPS5333578A (en) * 1976-09-10 1978-03-29 Hitachi Ltd Glass composition for stabilizing semiconductor element surface

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52134617A (en) * 1976-05-06 1977-11-11 Hitachi Ltd Composite of glass for coating on semiconductor apparatus
JPS5333578A (en) * 1976-09-10 1978-03-29 Hitachi Ltd Glass composition for stabilizing semiconductor element surface

Cited By (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012051761A (ja) * 2010-09-01 2012-03-15 Nippon Electric Glass Co Ltd 半導体被覆用ガラス
WO2012160961A1 (ja) * 2011-05-23 2012-11-29 新電元工業株式会社 半導体装置の製造方法及び半導体装置
JP5655140B2 (ja) * 2011-05-23 2015-01-14 新電元工業株式会社 半導体装置の製造方法及び半導体装置
WO2012160962A1 (ja) * 2011-05-23 2012-11-29 新電元工業株式会社 半導体装置の製造方法及び半導体装置
JP5655139B2 (ja) * 2011-05-23 2015-01-14 新電元工業株式会社 半導体装置の製造方法及び半導体装置
US9159549B2 (en) 2011-05-26 2015-10-13 Shindengen Electric Manufacturing Co., Ltd. Glass composition for protecting semiconductor junction, method of manufacturing semiconductor device and semiconductor device
CN102781861A (zh) * 2011-05-26 2012-11-14 新电元工业株式会社 半导体接合保护用玻璃合成物、半导体装置及其制造方法
US9941112B2 (en) 2011-05-26 2018-04-10 Shindengen Electric Manufacturing Co., Ltd Method of manufacturing semiconductor device and semiconductor device
JP4927237B1 (ja) * 2011-05-26 2012-05-09 新電元工業株式会社 半導体接合保護用ガラス組成物、半導体装置の製造方法及び半導体装置
TWI424472B (zh) * 2011-05-26 2014-01-21 Shindengen Electric Mfg Method for fabricating glass for semiconductor bonding, method for manufacturing semiconductor device, and semiconductor device
WO2012160704A1 (ja) * 2011-05-26 2012-11-29 新電元工業株式会社 半導体接合保護用ガラス組成物、半導体装置の製造方法及び半導体装置
JP2013060353A (ja) * 2011-08-25 2013-04-04 Nippon Electric Glass Co Ltd 半導体素子被覆用ガラス
WO2013030922A1 (ja) * 2011-08-29 2013-03-07 新電元工業株式会社 半導体接合保護用ガラス組成物、半導体装置の製造方法及び半導体装置
US9006113B2 (en) 2011-08-29 2015-04-14 Shindengen Electric Manufacturing Co. Ltd. Glass composition for protecting semiconductor junction, method of manufacturing semiconductor device and semiconductor device
JP5548276B2 (ja) * 2011-08-29 2014-07-16 新電元工業株式会社 半導体接合保護用ガラス組成物、半導体装置の製造方法及び半導体装置
JP5184717B1 (ja) * 2012-01-31 2013-04-17 新電元工業株式会社 半導体接合保護用ガラス組成物、半導体装置の製造方法及び半導体装置
WO2013114562A1 (ja) * 2012-01-31 2013-08-08 新電元工業株式会社 半導体接合保護用ガラス組成物、半導体装置の製造方法及び半導体装置
US9099483B2 (en) 2012-01-31 2015-08-04 Shindengen Electric Manufacturing Co., Ltd. Glass composition for protecting semiconductor junction, method of manufacturing semiconductor device and semiconductor device
WO2013168314A1 (ja) * 2012-05-08 2013-11-14 新電元工業株式会社 半導体装置の製造方法及び半導体装置
CN103890935A (zh) * 2012-05-08 2014-06-25 新电元工业株式会社 树脂封装型半导体装置及其制造方法
WO2013168521A1 (ja) * 2012-05-08 2013-11-14 新電元工業株式会社 樹脂封止型半導体装置及びその製造方法
WO2013168236A1 (ja) * 2012-05-08 2013-11-14 新電元工業株式会社 樹脂封止型半導体装置及び樹脂封止型半導体装置の製造方法
JP5827397B2 (ja) * 2012-05-08 2015-12-02 新電元工業株式会社 樹脂封止型半導体装置及び樹脂封止型半導体装置の製造方法
JP5827398B2 (ja) * 2012-05-08 2015-12-02 新電元工業株式会社 半導体接合保護用ガラス組成物の製造方法、半導体装置の製造方法及び半導体装置
JPWO2013168623A1 (ja) * 2012-05-08 2016-01-07 新電元工業株式会社 半導体接合保護用ガラス組成物、半導体装置の製造方法及び半導体装置
US9455231B2 (en) 2012-05-08 2016-09-27 Shindengen Electric Manufacturing Co., Ltd. Resin-sealed semiconductor device and method of manufacturing the same
CN103890935B (zh) * 2012-05-08 2016-10-26 新电元工业株式会社 树脂封装型半导体装置及其制造方法
US9570408B2 (en) 2012-05-08 2017-02-14 Shindengen Electric Manufacturing Co., Ltd. Resin-sealed semiconductor device and method of manufacturing resin-sealed semiconductor device
US9698069B2 (en) 2012-05-08 2017-07-04 Shindengen Electric Manufacturing Co., Ltd. Glass composition for protecting semiconductor junction, method of manufacturing semiconductor device and semiconductor device
JP5340511B1 (ja) * 2012-05-08 2013-11-13 新電元工業株式会社 半導体装置の製造方法及び半導体装置

Also Published As

Publication number Publication date
JPS6349897B2 (ja) 1988-10-06

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