JPS57131371A - Dry etching method - Google Patents

Dry etching method

Info

Publication number
JPS57131371A
JPS57131371A JP56014806A JP1480681A JPS57131371A JP S57131371 A JPS57131371 A JP S57131371A JP 56014806 A JP56014806 A JP 56014806A JP 1480681 A JP1480681 A JP 1480681A JP S57131371 A JPS57131371 A JP S57131371A
Authority
JP
Japan
Prior art keywords
etching
parts
oxide film
produced
owing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56014806A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6110037B2 (enExample
Inventor
Hitoshi Kudo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56014806A priority Critical patent/JPS57131371A/ja
Publication of JPS57131371A publication Critical patent/JPS57131371A/ja
Publication of JPS6110037B2 publication Critical patent/JPS6110037B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
JP56014806A 1981-02-02 1981-02-02 Dry etching method Granted JPS57131371A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56014806A JPS57131371A (en) 1981-02-02 1981-02-02 Dry etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56014806A JPS57131371A (en) 1981-02-02 1981-02-02 Dry etching method

Publications (2)

Publication Number Publication Date
JPS57131371A true JPS57131371A (en) 1982-08-14
JPS6110037B2 JPS6110037B2 (enExample) 1986-03-27

Family

ID=11871279

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56014806A Granted JPS57131371A (en) 1981-02-02 1981-02-02 Dry etching method

Country Status (1)

Country Link
JP (1) JPS57131371A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59222933A (ja) * 1983-06-01 1984-12-14 Hitachi Ltd エツチング方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59222933A (ja) * 1983-06-01 1984-12-14 Hitachi Ltd エツチング方法

Also Published As

Publication number Publication date
JPS6110037B2 (enExample) 1986-03-27

Similar Documents

Publication Publication Date Title
JPS57204133A (en) Manufacture of semiconductor integrated circuit
JPS57170534A (en) Dry etching method for aluminum and aluminum alloy
JPS5656636A (en) Processing method of fine pattern
JPS52120782A (en) Manufacture of semiconductor device
JPS57131371A (en) Dry etching method
JPS5569264A (en) Etching method
JPS643663A (en) Forming method for fine pattern
JPS57130431A (en) Manufacture of semiconductor device
JPS56116880A (en) Plasma etching method
JPS5519873A (en) Forming method of metallic layer pattern for semiconductor
JPS5477068A (en) Pattern forming method
JPS56277A (en) Forming method of metal layer pattern
JPS5496363A (en) Electrode forming method for semiconductor device
JPS5457982A (en) Manufacture for semiconductor device
JPS5587436A (en) Method of producing semiconductor device
JPS56138941A (en) Forming method of wiring layer
JPS5478668A (en) Manufacture of semiconductor device
JPS559481A (en) Method of forming fine pattern
JPS57137472A (en) Etching method for polycrystalline silicon
JPS5691446A (en) Forming of element segregation region of semiconductor integrated circuit
JPS54116882A (en) Manufacture of semiconductor device
JPS5267985A (en) Manufacturing process of semiconductor unit
JPS5635774A (en) Dry etching method
JPS56136976A (en) Working method for aluminum coat
JPS55142480A (en) Manufacture for planer type magnetic bubble element overlay