JPS55142480A - Manufacture for planer type magnetic bubble element overlay - Google Patents

Manufacture for planer type magnetic bubble element overlay

Info

Publication number
JPS55142480A
JPS55142480A JP4969179A JP4969179A JPS55142480A JP S55142480 A JPS55142480 A JP S55142480A JP 4969179 A JP4969179 A JP 4969179A JP 4969179 A JP4969179 A JP 4969179A JP S55142480 A JPS55142480 A JP S55142480A
Authority
JP
Japan
Prior art keywords
sio
protective film
manufacture
type magnetic
magnetic bubble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4969179A
Other languages
Japanese (ja)
Other versions
JPS599111B2 (en
Inventor
Taiji Tsuruoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP4969179A priority Critical patent/JPS599111B2/en
Publication of JPS55142480A publication Critical patent/JPS55142480A/en
Publication of JPS599111B2 publication Critical patent/JPS599111B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To manufacture the said overlay high in the reliability with less number of processes, by the lift-off method after evaporating the conductor metal on the entire protective film surface, after the conductor pattern location is formed on the SiO2 protective film on the wafer.
CONSTITUTION: SiO2 2 is formed as the protective film of the wafer 1. This SiO2 2 is etched with a given depth by means of reactive sputtering etching method by taking the organic resist on it as the mask to form the conductor pattern location 2a. Next, the entire surface of SiO2 is evaporated with Al-Cu 3 as the conductor metal, and SiO 4 is evaporated on the entire surface of Al-Cu 3. Next, Al-Cu 3 other than the location 2a is spray-ethced with an aqueous solution of hydrochloric acid, and the SiO 4 film attached on it is removed, then the surface of SiO 4 and SiO2 2 is plane without step. Further, after forming the permalloy film 5 on SiO 4 and SiO2 2, patterning is made with photo etching method and the SiO2 6 protective film is formed on it.
COPYRIGHT: (C)1980,JPO&Japio
JP4969179A 1979-04-24 1979-04-24 Manufacturing method of planar magnetic bubble element overlay Expired JPS599111B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4969179A JPS599111B2 (en) 1979-04-24 1979-04-24 Manufacturing method of planar magnetic bubble element overlay

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4969179A JPS599111B2 (en) 1979-04-24 1979-04-24 Manufacturing method of planar magnetic bubble element overlay

Publications (2)

Publication Number Publication Date
JPS55142480A true JPS55142480A (en) 1980-11-07
JPS599111B2 JPS599111B2 (en) 1984-02-29

Family

ID=12838199

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4969179A Expired JPS599111B2 (en) 1979-04-24 1979-04-24 Manufacturing method of planar magnetic bubble element overlay

Country Status (1)

Country Link
JP (1) JPS599111B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6074192A (en) * 1983-09-30 1985-04-26 Fujitsu Ltd Method for forming bubble memory

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0511286Y2 (en) * 1986-07-14 1993-03-19

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6074192A (en) * 1983-09-30 1985-04-26 Fujitsu Ltd Method for forming bubble memory

Also Published As

Publication number Publication date
JPS599111B2 (en) 1984-02-29

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