JPS5498179A - Preparation of minute circuits and elements - Google Patents
Preparation of minute circuits and elementsInfo
- Publication number
- JPS5498179A JPS5498179A JP433578A JP433578A JPS5498179A JP S5498179 A JPS5498179 A JP S5498179A JP 433578 A JP433578 A JP 433578A JP 433578 A JP433578 A JP 433578A JP S5498179 A JPS5498179 A JP S5498179A
- Authority
- JP
- Japan
- Prior art keywords
- film
- mask
- layer
- minute
- register
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE: To provide a minute thin metallic film of high melting point by arranging a mask made by laminating two films; metallic film and register film.
CONSTITUTION: Al film 4 of the specified thickness is formed on substrate 1 and photoregister 5 is laminated on it for the exposed light development. Then, make a mask layer by etching Al 4 and steam affix 6 a high melting point metal such as W, Ti, etc. and a metallic compound such as NbN, etc. on the mask layer. At this time, register 5 is slightly deformed, but the mask pattern is not changed because of the lower layer 4 of Al. A minute pattern is formed when layer 4 is etched after film 5 is lifted off.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP433578A JPS5498179A (en) | 1978-01-20 | 1978-01-20 | Preparation of minute circuits and elements |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP433578A JPS5498179A (en) | 1978-01-20 | 1978-01-20 | Preparation of minute circuits and elements |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5498179A true JPS5498179A (en) | 1979-08-02 |
Family
ID=11581566
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP433578A Pending JPS5498179A (en) | 1978-01-20 | 1978-01-20 | Preparation of minute circuits and elements |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5498179A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6445039A (en) * | 1987-08-13 | 1989-02-17 | Sony Corp | Manufacture of electron tube cathode device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5045571A (en) * | 1973-08-25 | 1975-04-23 |
-
1978
- 1978-01-20 JP JP433578A patent/JPS5498179A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5045571A (en) * | 1973-08-25 | 1975-04-23 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6445039A (en) * | 1987-08-13 | 1989-02-17 | Sony Corp | Manufacture of electron tube cathode device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS561533A (en) | Method of photoetching | |
JPS5669835A (en) | Method for forming thin film pattern | |
JPS5498179A (en) | Preparation of minute circuits and elements | |
JPS5461478A (en) | Chromium plate | |
JPS5568655A (en) | Manufacturing method of wiring | |
JPS55163539A (en) | Photo mask | |
JPS5680130A (en) | Manufacture of semiconductor device | |
JPS57198632A (en) | Fine pattern formation | |
JPS5421272A (en) | Metal photo mask | |
JPS5387668A (en) | Forming method of patterns | |
JPS56138941A (en) | Forming method of wiring layer | |
JPS5646582A (en) | Formation of pattern of filmlike article | |
JPS5493970A (en) | Patttern forming method of multi-layer metallic thin film | |
JPS5797629A (en) | Manufacture of semiconductor device | |
JPS5616676A (en) | Preparation of minute pattern | |
JPS55142480A (en) | Manufacture for planer type magnetic bubble element overlay | |
JPS5585030A (en) | Forming method for electrode of semiconductor device | |
JPS5635774A (en) | Dry etching method | |
JPS55107781A (en) | Etching method for metal film | |
JPS5378195A (en) | Manufacture of electrode panel for display | |
JPS56296A (en) | Production of watch or clock dial plate | |
JPS5480688A (en) | Schottky diode and its manufacture | |
JPS5588333A (en) | Manufacture of x-ray exposing mask | |
JPS5586118A (en) | Alignment mark formation | |
JPS5552060A (en) | Photo mask |