JPS5552060A - Photo mask - Google Patents
Photo maskInfo
- Publication number
- JPS5552060A JPS5552060A JP12556678A JP12556678A JPS5552060A JP S5552060 A JPS5552060 A JP S5552060A JP 12556678 A JP12556678 A JP 12556678A JP 12556678 A JP12556678 A JP 12556678A JP S5552060 A JPS5552060 A JP S5552060A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- film
- integrated circuits
- photo
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To form circuit patterns of even accuracy and improve the yield of integrated circuits by providing films of a constant thickness to the shield type pattern parts of the peripheral part and inside of a mask at the time of making the photo mask used for production of thin film integrated circuits.
CONSTITUTION: After silver salt emulsion or the like 2 is deposited on a substrate 1 such as of Myler film or other, desired circuit patterns are formed thereon. Next, a smooth metal film or organic film 7 having a constant thickness is formed on the peripheral part and inside of the non-transmission portions of said patterns by such a method as adhesive agents or vapor deposition. On a ceramic substrate 3 for hybrid integrated circuits a metal thin film 4 is deported and further photo resist 5 is formed, and after these are fixed to a substrate holder 6, the photo mask thus made is superposed and pressured from the arrow direction. In this way, the transparent pattern parts of the mask do not adhere to the photo resist 5 and only the film 7 on the non-transparent portions adheres. Hence, surface peeling, staining, etc. of the resist 5 are prevented, the staining of mask surface is obviated and multiple sheets of the inte grated circuits of good accuracy may be produced from the same mask.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12556678A JPS5552060A (en) | 1978-10-11 | 1978-10-11 | Photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12556678A JPS5552060A (en) | 1978-10-11 | 1978-10-11 | Photo mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5552060A true JPS5552060A (en) | 1980-04-16 |
Family
ID=14913356
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12556678A Pending JPS5552060A (en) | 1978-10-11 | 1978-10-11 | Photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5552060A (en) |
-
1978
- 1978-10-11 JP JP12556678A patent/JPS5552060A/en active Pending
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