JPS5636120A - Manufacture of magnetic bubble device - Google Patents
Manufacture of magnetic bubble deviceInfo
- Publication number
- JPS5636120A JPS5636120A JP11225879A JP11225879A JPS5636120A JP S5636120 A JPS5636120 A JP S5636120A JP 11225879 A JP11225879 A JP 11225879A JP 11225879 A JP11225879 A JP 11225879A JP S5636120 A JPS5636120 A JP S5636120A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- film
- layer film
- location matching
- flatness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
- H01F41/34—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film in patterns, e.g. by lithography
Abstract
PURPOSE:To improve a location matching of a transfer circuit pattern and a multilayer pattern, and the flatness of a surface by a method wherein an ion implantation is performed on a metal mask pattern of 2 layers, upper and lower, the multilayer pattern is formed after the etching of the upper layer film leaving the lower layer film. CONSTITUTION:The transfer circuit pattern is formed by the mask laminated 2 kinds of metal such as a thin Ti film2, a thick Au film 3 on a crystalline substrate for the magnetic buble, an ion implatatation layer 5 is formed on the substrate other than the pattern by the ion implantation method. Next thereto, the upper layer film 3 is removed by etching leaving the lower layer film 2, an Si2O film 6 is coated thereupon, an Au film of a gate material 7 is deposited thereupon, and a photoregist 8 is coated to perform the location matching of the conductive pattern. In this case, only a slight step differnce is generated but the relative location matching can be throughly made and the flatness of the surface can be also made so well.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11225879A JPS5636120A (en) | 1979-09-01 | 1979-09-01 | Manufacture of magnetic bubble device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11225879A JPS5636120A (en) | 1979-09-01 | 1979-09-01 | Manufacture of magnetic bubble device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5636120A true JPS5636120A (en) | 1981-04-09 |
JPS6246967B2 JPS6246967B2 (en) | 1987-10-06 |
Family
ID=14582195
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11225879A Granted JPS5636120A (en) | 1979-09-01 | 1979-09-01 | Manufacture of magnetic bubble device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5636120A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5716956U (en) * | 1980-06-30 | 1982-01-28 |
-
1979
- 1979-09-01 JP JP11225879A patent/JPS5636120A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5716956U (en) * | 1980-06-30 | 1982-01-28 |
Also Published As
Publication number | Publication date |
---|---|
JPS6246967B2 (en) | 1987-10-06 |
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