JPS57122439A - Optical mask - Google Patents

Optical mask

Info

Publication number
JPS57122439A
JPS57122439A JP863081A JP863081A JPS57122439A JP S57122439 A JPS57122439 A JP S57122439A JP 863081 A JP863081 A JP 863081A JP 863081 A JP863081 A JP 863081A JP S57122439 A JPS57122439 A JP S57122439A
Authority
JP
Japan
Prior art keywords
resist
wafer
optical mask
contact
transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP863081A
Other languages
English (en)
Inventor
Hiroyuki Matsuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP863081A priority Critical patent/JPS57122439A/ja
Publication of JPS57122439A publication Critical patent/JPS57122439A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
JP863081A 1981-01-23 1981-01-23 Optical mask Pending JPS57122439A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP863081A JPS57122439A (en) 1981-01-23 1981-01-23 Optical mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP863081A JPS57122439A (en) 1981-01-23 1981-01-23 Optical mask

Publications (1)

Publication Number Publication Date
JPS57122439A true JPS57122439A (en) 1982-07-30

Family

ID=11698266

Family Applications (1)

Application Number Title Priority Date Filing Date
JP863081A Pending JPS57122439A (en) 1981-01-23 1981-01-23 Optical mask

Country Status (1)

Country Link
JP (1) JPS57122439A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60108852A (ja) * 1983-11-18 1985-06-14 Fuji Xerox Co Ltd フォトリソグラフィ−における露光用マスク
JPH02968A (ja) * 1988-06-08 1990-01-05 Fujitsu Ltd フォトマスク

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60108852A (ja) * 1983-11-18 1985-06-14 Fuji Xerox Co Ltd フォトリソグラフィ−における露光用マスク
JPH02968A (ja) * 1988-06-08 1990-01-05 Fujitsu Ltd フォトマスク

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