JPS53117382A - Burn mark preventing method - Google Patents

Burn mark preventing method

Info

Publication number
JPS53117382A
JPS53117382A JP3242777A JP3242777A JPS53117382A JP S53117382 A JPS53117382 A JP S53117382A JP 3242777 A JP3242777 A JP 3242777A JP 3242777 A JP3242777 A JP 3242777A JP S53117382 A JPS53117382 A JP S53117382A
Authority
JP
Japan
Prior art keywords
burn mark
preventing method
mark preventing
burn
prevnet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3242777A
Other languages
Japanese (ja)
Inventor
Eiji Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3242777A priority Critical patent/JPS53117382A/en
Publication of JPS53117382A publication Critical patent/JPS53117382A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To prevnet the occurrence of burn mark on surface by keeping the surfaces of soda lime glass substrates containing alkali components for photo masks used in the production process of semiconductor wafers coated with resin after finishing.
COPYRIGHT: (C)1978,JPO&Japio
JP3242777A 1977-03-24 1977-03-24 Burn mark preventing method Pending JPS53117382A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3242777A JPS53117382A (en) 1977-03-24 1977-03-24 Burn mark preventing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3242777A JPS53117382A (en) 1977-03-24 1977-03-24 Burn mark preventing method

Publications (1)

Publication Number Publication Date
JPS53117382A true JPS53117382A (en) 1978-10-13

Family

ID=12358645

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3242777A Pending JPS53117382A (en) 1977-03-24 1977-03-24 Burn mark preventing method

Country Status (1)

Country Link
JP (1) JPS53117382A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57108855A (en) * 1980-12-25 1982-07-07 Fujitsu Ltd Preparation of photomask
JPS60165719A (en) * 1984-02-08 1985-08-28 Kimoto & Co Ltd Mask substrate for manufacturing semiconductor integrated circuit, surface protecting solution of wafer and method of use thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57108855A (en) * 1980-12-25 1982-07-07 Fujitsu Ltd Preparation of photomask
JPS60165719A (en) * 1984-02-08 1985-08-28 Kimoto & Co Ltd Mask substrate for manufacturing semiconductor integrated circuit, surface protecting solution of wafer and method of use thereof

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