JPS53117382A - Burn mark preventing method - Google Patents
Burn mark preventing methodInfo
- Publication number
- JPS53117382A JPS53117382A JP3242777A JP3242777A JPS53117382A JP S53117382 A JPS53117382 A JP S53117382A JP 3242777 A JP3242777 A JP 3242777A JP 3242777 A JP3242777 A JP 3242777A JP S53117382 A JPS53117382 A JP S53117382A
- Authority
- JP
- Japan
- Prior art keywords
- burn mark
- preventing method
- mark preventing
- burn
- prevnet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To prevnet the occurrence of burn mark on surface by keeping the surfaces of soda lime glass substrates containing alkali components for photo masks used in the production process of semiconductor wafers coated with resin after finishing.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3242777A JPS53117382A (en) | 1977-03-24 | 1977-03-24 | Burn mark preventing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3242777A JPS53117382A (en) | 1977-03-24 | 1977-03-24 | Burn mark preventing method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53117382A true JPS53117382A (en) | 1978-10-13 |
Family
ID=12358645
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3242777A Pending JPS53117382A (en) | 1977-03-24 | 1977-03-24 | Burn mark preventing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53117382A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57108855A (en) * | 1980-12-25 | 1982-07-07 | Fujitsu Ltd | Preparation of photomask |
JPS60165719A (en) * | 1984-02-08 | 1985-08-28 | Kimoto & Co Ltd | Mask substrate for manufacturing semiconductor integrated circuit, surface protecting solution of wafer and method of use thereof |
-
1977
- 1977-03-24 JP JP3242777A patent/JPS53117382A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57108855A (en) * | 1980-12-25 | 1982-07-07 | Fujitsu Ltd | Preparation of photomask |
JPS60165719A (en) * | 1984-02-08 | 1985-08-28 | Kimoto & Co Ltd | Mask substrate for manufacturing semiconductor integrated circuit, surface protecting solution of wafer and method of use thereof |
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