JPS568890A - Semiconductor laser and manufacture thereof - Google Patents
Semiconductor laser and manufacture thereofInfo
- Publication number
- JPS568890A JPS568890A JP8116279A JP8116279A JPS568890A JP S568890 A JPS568890 A JP S568890A JP 8116279 A JP8116279 A JP 8116279A JP 8116279 A JP8116279 A JP 8116279A JP S568890 A JPS568890 A JP S568890A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- wave guide
- buried
- far
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/16—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
- H01S5/164—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface with window regions comprising semiconductor material with a wider bandgap than the active layer
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To facilitate wave guide as far as a reflection surface by expanding the width of a forbidden band bigger than that of an active layer wherein the absorption of laser light is minimized and the expansion of the laser light in vertical direction of p-n junction is prevented. CONSTITUTION:Epitaxial growth is made for a P-type GaAs active layer 15 which is installed on an n-type GaAs substrate 11 of a semiconductor device and interposed by an n-type Al0.3Ga0.7As layer 12 and a P-type Al0.3Ga0.7As layer 16. The resonator of the layer 15 is buried so that the end sides in a longitudinal direction may be covered by a P-type Al0.1Ga0.9As layer 13. Wherein, the layer 13 is composed of a high resistant light wave guide layer which has smaller reflective index, wider forbidden band and greater thickness than those of the layer 15. Furthermore, on the layer 13, an n-type Al0.3Ga0.7As layer 14 buried the end sides of the P-type Al0.3Ga0.7As layer 16 is formed at the same level with the surface of the layer 16. Zn is diffused in the layer 16 through the windows of an SiO2 mask 17 installed on the layers 14 and a metal electrodes 18 and 19 are formed on the mask 17 and under the base frame 11 respectively to facilitate wave guide as far as a reflection surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8116279A JPS568890A (en) | 1979-06-27 | 1979-06-27 | Semiconductor laser and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8116279A JPS568890A (en) | 1979-06-27 | 1979-06-27 | Semiconductor laser and manufacture thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS568890A true JPS568890A (en) | 1981-01-29 |
Family
ID=13738748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8116279A Pending JPS568890A (en) | 1979-06-27 | 1979-06-27 | Semiconductor laser and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS568890A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS587893A (en) * | 1981-07-08 | 1983-01-17 | Hitachi Ltd | Semiconductor laser element |
JPS58102588A (en) * | 1981-12-14 | 1983-06-18 | Fujitsu Ltd | Semiconductor light emitting device |
JPS58102586A (en) * | 1981-12-14 | 1983-06-18 | Fujitsu Ltd | Semiconductor light emitting device |
JPS58102587A (en) * | 1981-12-14 | 1983-06-18 | Fujitsu Ltd | Semiconductor light emitting device |
DE3322388A1 (en) * | 1982-10-29 | 1984-05-03 | Rca Corp., New York, N.Y. | SEMICONDUCTOR LASER |
JPS6321889A (en) * | 1986-07-16 | 1988-01-29 | Matsushita Electric Ind Co Ltd | Semiconductor laser |
US5113405A (en) * | 1989-12-12 | 1992-05-12 | U.S. Philips Corp. | Semiconductor diode laser having a stepped effective refractive index |
JPH0537092A (en) * | 1991-07-31 | 1993-02-12 | Nec Corp | Manufacture of optical semiconductor device |
US6385225B1 (en) | 1999-05-11 | 2002-05-07 | Nec Corporation | Window type semiconductor laser light emitting device and a process of fabricating thereof |
CN111679454A (en) * | 2020-06-19 | 2020-09-18 | 联合微电子中心有限责任公司 | Method for manufacturing semiconductor device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4924084A (en) * | 1972-06-26 | 1974-03-04 | ||
JPS51134594A (en) * | 1975-05-16 | 1976-11-22 | Mitsubishi Electric Corp | Semiconductor leser device |
-
1979
- 1979-06-27 JP JP8116279A patent/JPS568890A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4924084A (en) * | 1972-06-26 | 1974-03-04 | ||
JPS51134594A (en) * | 1975-05-16 | 1976-11-22 | Mitsubishi Electric Corp | Semiconductor leser device |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS587893A (en) * | 1981-07-08 | 1983-01-17 | Hitachi Ltd | Semiconductor laser element |
JPS6318879B2 (en) * | 1981-12-14 | 1988-04-20 | Fujitsu Ltd | |
JPS58102586A (en) * | 1981-12-14 | 1983-06-18 | Fujitsu Ltd | Semiconductor light emitting device |
JPS58102587A (en) * | 1981-12-14 | 1983-06-18 | Fujitsu Ltd | Semiconductor light emitting device |
JPS58102588A (en) * | 1981-12-14 | 1983-06-18 | Fujitsu Ltd | Semiconductor light emitting device |
DE3322388A1 (en) * | 1982-10-29 | 1984-05-03 | Rca Corp., New York, N.Y. | SEMICONDUCTOR LASER |
DE3322388C2 (en) * | 1982-10-29 | 1994-11-03 | Rca Corp | Semiconductor laser |
JPS6321889A (en) * | 1986-07-16 | 1988-01-29 | Matsushita Electric Ind Co Ltd | Semiconductor laser |
US5113405A (en) * | 1989-12-12 | 1992-05-12 | U.S. Philips Corp. | Semiconductor diode laser having a stepped effective refractive index |
JPH0537092A (en) * | 1991-07-31 | 1993-02-12 | Nec Corp | Manufacture of optical semiconductor device |
US6385225B1 (en) | 1999-05-11 | 2002-05-07 | Nec Corporation | Window type semiconductor laser light emitting device and a process of fabricating thereof |
CN111679454A (en) * | 2020-06-19 | 2020-09-18 | 联合微电子中心有限责任公司 | Method for manufacturing semiconductor device |
CN111679454B (en) * | 2020-06-19 | 2023-07-07 | 联合微电子中心有限责任公司 | Method for manufacturing semiconductor device |
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