JPS58102586A - Semiconductor light emitting device - Google Patents

Semiconductor light emitting device

Info

Publication number
JPS58102586A
JPS58102586A JP56201230A JP20123081A JPS58102586A JP S58102586 A JPS58102586 A JP S58102586A JP 56201230 A JP56201230 A JP 56201230A JP 20123081 A JP20123081 A JP 20123081A JP S58102586 A JPS58102586 A JP S58102586A
Authority
JP
Japan
Prior art keywords
layer
active
core
active layer
core layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56201230A
Other languages
Japanese (ja)
Inventor
Kiyohide Wakao
若尾 清秀
Nobuyuki Takagi
高木 信行
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56201230A priority Critical patent/JPS58102586A/en
Publication of JPS58102586A publication Critical patent/JPS58102586A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227Buried mesa structure ; Striped active layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227Buried mesa structure ; Striped active layer
    • H01S5/2275Buried mesa structure ; Striped active layer mesa created by etching

Abstract

PURPOSE:To provide a semiconductor laser characterized by a low oscillation threshold current and high differential quantum efficiency, by providing a multiple layer semiconductor layers having a double heterostruction structure and multiple layer semiconductor layers including a core layer. CONSTITUTION:A positive voltage is applied to a P side electrode 21 and a negative volage is applied to an N side electrode 22. Carriers are inputted only to an active layer 18, which is completely embedded in a concave part 16 by P-N reverse bias of epitaxial layers 12, 13, and 14. Light emission is obtained by recombination. The carriers are completely confined in the active layer 18 by clad layers 17 and 19, and the core layer 13. The laser light generated from the active layer 18 is guided by the clad layer 17 and 19 whose refractive index is smaller than that of the active layer 18 and recombined to the epitaxial layers 12, 13, and 14. The light guided into the active layer 18 is again guided into the core layer 13 by clad layers 12 and 14, and resonated between the cleavage planes. The laser light generated in the active layer 18 is confined in the core layer 13 in the lateral direction, and oscillated at a stable fundamental mode.

Description

【発明の詳細な説明】 (1)  発明の技術分野 本A明は出力光導tIL路を有する牛尋体発光装置に関
する0 +2)技術の′#景 牛尋体V−デは他のレーザ系に比べて小me瀘s4効卓
−作、民寿命・扁速直績変調かり一となる利点を有し、
光伝送・元情報処墳の実用システムの元−として用いら
れているO 牛4体し−ザ忙元情味処理分野の光源として用いる1曾
、その光出力を同上させることが望まれる◎例えばガリ
ウムΦアルミニウム・ヒ累(−ALAs)三元化曾物を
材料とする半尋俸レーザにおいてはレーデ出力の限界を
決めるものはレーザJ211I圓の元学横−による破壊
であシ、この光学損傷は表向再結付によるキャリアの不
十分な反転分布に基づくレーデ4血付近の光吸収が原因
である。
DETAILED DESCRIPTION OF THE INVENTION (1) Technical Field of the Invention The present invention relates to a light emitting device having an output light guide tIL path. Comparing to the small melo S4 efficiency table, it has the advantage of short lifespan and flat speed direct performance modulation.
O, which is used as the source of a practical system for optical transmission and former information processing tombs, is used as a light source in the field of emotional processing. In a semicircular laser made of a ternary compound of gallium Φ aluminum arsenic (-ALAs), what determines the limit of the laser output is the destruction caused by the laser J211I round, and this optical damage. This is caused by light absorption near Lede 4 blood due to insufficient population inversion of carriers due to surface recombination.

従って、ノーずの4出力化のためにはV−ザ41iO付
近で中ヤリアを注入せず、かつ光吸収t−#h處するこ
とがM効とな9、これよりレーザ端面fjtxKrli
注a+1にさまない出力専用の導波路を設けて、后4層
で発生し7tV−ザ元をこの出力尋荻路に結付させる#
I遣が7−ザ簡出力比の一つの南゛力なm遺となる〇 以下、出力4波4を有するレーザで尚出力化を図る一台
に必要となる条件を示す0第IK高出力t−得るために
は、よ6己の4圓破Jiltを抑制することに〃口えて
%値分−子効率の同上及び@振l#l11fILのは義
が必要となる0これは高出力時の励作電tItt−低威
して′Wt處圧入に起因するM発生を稜相し、温度上外
による伸性1丁を抑制する理由による。従って、土紀必
要*件を満足する友めには、后往ノーで電性し7t′j
tk幼4艮〈出力尋読略に結付させるとともに尭fj鴎
1直の低減が町目眩となる工うにt古注ノ曽内の元の閉
じ込め糸数t−最適化することがム景となる0#1sに
1発振横モードを安定化して*g−元出力I4注に訃い
て’ kink(電流−元出力籍性における曲がシ)”
4O倣分量子効率の低下をもたらす一因を除去すること
が必要である。従って、a次元的な元導波機傳を発光憤
域に作シ込んで横モード′ft劇御する必要がある。
Therefore, in order to make the laser 4-output, it is effective to not inject the intermediate layer near the V-za 41iO and to absorb light in the t-#h area.9 From this, the laser end face fjtxKrli
Note: Provide an output-only waveguide that does not get caught in A+1, and connect the 7 tV source generated in the rear 4th layer to this output interrogation path.
The following shows the conditions necessary for a laser with 4 waves and 4 outputs to achieve higher output.IK high output In order to obtain t-, it is necessary to suppress the 4-circle breakage of the 4-circle break Jilt, and also to understand the % value of the molecular efficiency and the value of the This is due to the fact that the excitation current tItt- is low to avoid the occurrence of M caused by press-fitting in the Wt area, and to suppress the elongation caused by changes in temperature. Therefore, if you are a friend who satisfies the *requirements* of the Earth, I will give you electricity without going back.
tk young 4 艮〈As well as connecting to the output reading omission, the reduction of the first shift of the tk becomes dizzy, and the original number of confinement threads t in the old notes is optimized. After stabilizing the 1 oscillation transverse mode at 0#1s and changing to *g-original output I4 note, 'kink (the song in the current-original output property)'
It is necessary to eliminate the factors that cause the reduction in 4O imitation quantum efficiency. Therefore, it is necessary to control the transverse mode by incorporating the a-dimensional original waveguide device into the light emitting region.

(3)  従来技術と問題点 不発−の従来技術として、本出纏人が従系しfcV−ザ
晃振肩圓で活性ノーが線用せず、かつ出力鎖酸に元4波
路愼4を−えた牛4捧レーザを挙けることにする。A1
図はこの半導体レーザのレーザ発振力向に対して平行な
概略断IIII図である。
(3) Conventional technology and problems - As a conventional technology, the present inventor has developed a system in which the active node is not used in the subordinate fcV-the vibration shoulder circle, and the output chain acid is connected to the original 4-wave route 4. -I'm going to raise the 4-saved laser that I got. A1
The figure is a schematic cross-section III parallel to the laser oscillation force direction of this semiconductor laser.

第1図において、lはn形ガリウム・ヒJg(da((
hAs ) fi似、8はn形AL ()I Asクラ
ッド層、感はp形AtuaAs (5注層1番はp形A
jLiaAsクラッド層、6は嵐−コンタクト用p形(
)aAs層、6は出力光4改路用クツッド層、7は出力
光導匿錯用コ1ノー、8はn7彪t)aAs層、9はp
m’tl憤、10はn陶電億をそれぞれ示している。
In Figure 1, l is n-type gallium hiJg(da((
hAs) similar to fi, 8 is n-type AL ()I As cladding layer, sense is p-type AtuaAs (5 note layer 1 is p-type A
jLiaAs cladding layer, 6 is p-type for storm-contact (
) aAs layer, 6 is a cross-layer for output light 4, 7 is a layer for output light guiding and shielding, 8 is n7 彪t) aAs layer, 9 is p
m'tl indignation, 10 respectively represent n taiden billion.

このレーザはj[t41上にコア層7と、該コアノー7
19刑祈卓が小さくかつ該コア層を上下から挾んだクラ
ッド層6とから成る光導波路を設け、該元4波路ノーに
4截lに達する深さの凸部を設け、該曲部内に活性)−
8と該活性1m 11工多系割帝暢が大きく、かつat
占注1m al t’上下から挾んだクラッド層1及び
番とから成るダブルへテロ!Ift曾佛造の半導体ノー
全種l−シ、活性ノー8とコア層7とt−As接して配
置し、活性ノー8で発生し次元を繭紀元導波路に結合4
波させ次ものである。
This laser has a core layer 7 on j[t41 and the core layer 7 on
19 An optical waveguide is provided with a small cladding layer 6 sandwiching the core layer from above and below, and a convex portion with a depth of 4 holes is provided in the original 4 waveguides, and within the curved portion. activity) −
8 and the activity 1m 11 engineering multi-system splitting is large and at
1m al t'Double hetero consisting of cladding layer 1 and cladding layer sandwiched from above and below! Ift Sobutsuzo's semiconductor no-all types are placed in contact with the active no. 8 and core layer 7, and the active no. 8 is generated and the dimension is coupled to the cocoon era waveguide 4
This is the next thing that makes waves.

マ友、−作はp[1[*9に正、n ill@ @ I
 Oに路 負の電圧を印力口し、出力光導波$全形成している半4
VFrv46−7−8のp −n逆バイアスに工って凹
椰内の活性ノー8にのみキャリア金注入し、再−曾によ
り元jt、’に傅る0この元は屈折率の低いクラッドt
fa’jA及び会に1うて活性層8内に導かれ、出力外 饋域に設けられた元専政−へ結付される。このとき1光
導波路を形成しているクラッド層6はコア層7エ9もJ
Ig折卓が低い友め、活性ノー8内に46波された元は
再びクラッドノー6によってコアI−7内に導波され、
4Is−面間で共蚕する0ので、活性ノー8はレーザが
発振する4@で嬉出されることはなく、レーザj411
Oでの光学D4湯によるが低く倣分瀘子効4の高いレー
ザt Qi =!にすることができ几oしかしながら、
このレーザには発嶽横モードt−11IJg4するため
の措置が例らとられていないので、前述し次理由、即ち
、#ttlL−元出力時性において“kink”l$の
問題が生じ、倣分量子効率の低下倉もたらす要因がまだ
解決されていないこ七になる0 (4)開明の目的 不発明の目的は、従来の半導体レーザが有している入点
を離去し、従来のレーザよりも発fJA14厘Ill處
がはく、かつ値分量子効卓の嶋い牛尋俸ノーデt−−供
するにめる0 (5)4@の構成 本発明はI古注ノーと−a古注ノーよp類本1j惜1−
が大きくかつIgI紀清注l−を上下から挾んだクラッ
ド層とからなるダブルへテロiIl曾4造の第lの多層
牛4体ノーと、コアノーと該コアtya工夛屈折4が小
さくかつmtLコアノ11?土下から挾んだクラッド層
とからなる48の多ノー半導体層と金有し、−11記第
1の41−牛4棒!−の周囲を取郵囲むように前記42
の多ノー半4体ノーを媛して配置し、かつ−11紀活性
ノーの周囲に罰mlコ1ノーを隣接して配置したもので
ある。
Mayu, -saku is p[1 [*9 correct, n ill @ @ I
A negative voltage is applied to O, and the output optical waveguide is formed in half 4.
By modifying the p-n reverse bias of VFrv46-7-8, carrier gold is injected only into the active node 8 in the concave column, and by re-setting, the element jt,'0 is the cladding t with a low refractive index.
It is guided into the active layer 8 through the fa'jA and the board, and is connected to the former dictatorship provided in the output outer area. At this time, the cladding layer 6 forming one optical waveguide and the core layer 7 and 9 are also J.
For a friend with a low Ig folding table, the 46 waves in the active No. 8 are guided again into the core I-7 by the clad No. 6,
4Is - Since the 0 co-occurs between the planes, the active No. 8 is not excited by the 4@ when the laser oscillates, and the laser j411
Depending on the optical D4 temperature at O, the laser t Qi =! is low and has a high filtering effect of 4. However, you can
Since this laser does not take any measures to create a transverse mode t-11IJg4, the problem of "kink" l$ occurs due to the following reasons mentioned above, i.e., #ttlL-original output time. (4) Purpose of invention The purpose of non-invention is to remove the entrance point that conventional semiconductor lasers have, and to 0 (5) 4 @ configuration The present invention is based on the I old note and the -a old note. Note: No, p class book 1j regret 1-
is large and consists of a double hetero layer consisting of a clad layer sandwiching the IgI layer from above and below, and the core layer and the core layer are small and mtL Koano 11? 48 multi-no semiconductor layers consisting of a cladding layer sandwiched from the ground and gold, -11 first 41-Cow 4 sticks! -The above 42
The multi-no half of 4 nos are arranged in a hidden manner, and the punishment ml co1 no is placed adjacent to the -11th period active no.

16)  発−のA4例 以F1本発明の一実施例を用いて不@鴫の基本濃理倉威
−する0第3図は本実施例の徨々の製造工程を示し沈子
4体し−ザの一部#l断斜視図で6るO Jt?jJKdi図金用いて本実施例の製造工程を周率
に説明することにするOn形GaAs 基板11土にW
IL相エビメキ7ヤル成艮沃に19n形AtGaム畠ク
ツッド層1j1.、形At(iaAsコアノーla 、
n形AjLjaAsクノッド79$14をl−久精晶成
員する0ここでコア層18の屈折率は上下のクラツドノ
1111!及び140そn工9も大きくし、元4tjl
慎傅金もたせる。なお、 AtGaAa系材料の44台
は上記8増傅造の上に更にn形G1ムS層15t一連続
的に成員する0これは、久の発光S成氏時において該n
形GaA s層15と成員用m液との濡れを成<シ、績
晶成員を容易にするためである(第8図(−)0典麿的
な各ノー厚はクラッド層1jl及びl慟が約1μm・コ
アノー18が0.8pmsn形GaAe虐l暴か0.8
pasである。48図1a)の鳴層―造(或いは8層傳
造)の成14t−に化学工、チングに1って民さ100
〜500IIm、−8−6μms深さが、44111に
達する深さ、約2.8〜B、6.umの凹部16を形成
する(第2図IW ) o続いて再に液相にエピタキシ
ャル成員法によル凹部16にn形AjGaAmクラッド
虐17゜p形AjGmAm活性層18、p形AtGaA
sクラッド層19.]!に電−コンタクト用のp形Ga
A1ノー80を成員する0このとき活性層18はエピタ
キシャル層1811811117.19に比べて系制蛍
@を小さく、かつA111近4’を大きくし、活性層重
8の周囲を取Mむようにコア層18を一嵌して配直しな
ければならない。4M的な!?!rl−厚はn形りラッ
ド層17がIJ 〜g、o am%ia/ml 8が0
.1−2.0μm。
16) Example A4 to F1 Using an embodiment of the present invention, the basic concentration of Fukui is made. Fig. 3 shows the manufacturing process of this embodiment, with four pieces of dipstick. - 6 O Jt in a perspective cross-sectional view of part #l of the part? jJKdi The manufacturing process of this example will be explained in detail using a diagram. On-type GaAs substrate 11
A 19n-type AtGa layer 1j1. , form At(iaAs core no la,
The n-type AjLjaAs node 79$14 is the l-Kuse crystal member 0. Here, the refractive index of the core layer 18 is the upper and lower Cladnos 1111! And 140 son engineering 9 also enlarged, former 4tjl
Shinfu also makes money. In addition, 44 units of AtGaAa-based material have an n-type G1 S layer 15t continuously formed on top of the above-mentioned 8 layers.
This is to facilitate the wetting of the GaAs layer 15 with the member liquid (Fig. 8 (-)). is approximately 1 μm, core no. 18 is 0.8 pmsn type GaAe mass is 0.8
It is pas. 48 In Figure 1a), there were 14 tons of chemical engineering in Nairyo-zukuri (or 8-layer denzo), and 100 people in Chingu.
~500IIm, -8-6μms depth reaches 44111, approximately 2.8~B, 6. um recess 16 is formed (FIG. 2 IW) o Next, in the liquid phase, an n-type AjGaAm cladding layer 17°p-type AjGmAm active layer 18 and p-type AtGaA are formed in the recess 16 by an epitaxial deposition method in the liquid phase.
s cladding layer 19. ]! p-type Ga for electrical contacts
At this time, the active layer 18 has a smaller system control fluorescence @ and a larger A111 4' than the epitaxial layer 1811811117.19, and the core layer 18 is formed so as to surround the active layer weight 8. I have to fit it in and rearrange it. 4M-like! ? ! rl-thickness of n-shaped rad layer 17 is IJ~g, o am%ia/ml 8 is 0
.. 1-2.0 μm.

p形りクッド7119がIfi板表1がほぼ平坦化する
まで、p形(JaAsmjlGが0.il)mである。
The p-type quad 7119 is p-type (JaAsmjlG is 0.il) m until the Ifi plate surface 1 is almost flat.

なおエピタキシャル層17 、l B、1 eを液相成
員させる一1n形(jmAam15止にも凹部16中に
形成される層厚よりも4いノーが形成される。最後にp
形u a A lノー20114にpllll[惚g1
.基板11側に。
In addition, when the epitaxial layers 17, 1B, and 1e are formed into a liquid phase, a layer thickness of 4 times thicker than the layer thickness formed in the recess 16 is also formed.
Shape u a A l no 20114 pllll [love g1
.. On the board 11 side.

l1IIE他am金ノー成し、V−ザ発伽力向即ち鍔の
艮手力向に対して−直にエピタキシャル層tg、ta+
14ft%開すると本実施例の発光装置が完成する(第
2図+cl )。
l1IIE et al.
When the opening is 14 ft%, the light emitting device of this example is completed (Figure 2+cl).

動作は914g421に正、n141電憾2Sに負の唯
圧を印)Jすし、エピタキシャル)−1m 、■1.1
4のp −a逆バイアスによって凹部16内に完全に塊
め込まれた活性層18にのみキャリアを注入し、^−曾
にLシ元元金得る0活性膚18に注入され几キャリアは
縦力岡に対して14−するクラッド層17.18と%−
力向に対して隣接するコア層18のそれぞれに=9、活
性層18内に完全に閉じ込めら扛る。十分な注入電流に
工って損失に利得が打ち勝った時、活性層18からV−
ザ元が生じる。
The operation is positive on 914g421, negative pressure on n141 electric 2S) J Sushi, epitaxial) -1m, ■1.1
The carriers are injected only into the active layer 18 that is completely lumped into the recess 16 by the p-a reverse bias of 4, and the carriers are vertically injected into the active layer 18 to obtain the L element. Cladding layer 17.18% to 14% for Rikioka
=9 for each of the core layers 18 adjacent to the force direction, completely confined within the active layer 18. When the gain overcomes the loss with sufficient injection current, V-
The origin arises.

この元は活性1fjl18Lシも屈折率のはいクラッド
層17及び19に1って導かn、出力鎖酸即ち伸開向付
近に形成さi″したエピタキシャル層11111゜14
へ結合される。このときクラッド層12及びl慟はコア
W118ニジも屈折率が低いため、活性層18内に導波
さ扛た元は再びクラッド層12及び1条によってコア層
18内圧4波さtL11II開1間で共損する。iた横
モード制御においては、レーザの兼手力回に対して平行
なレーザiI411tm@に、活性層18工夛も屈折率
の低いコア層18が活性層18に114接して設けられ
ているので活性層18内で発生し友し−ザ元はコア層1
8vcLつて横力間に閉じ込められ、安定した基本モー
ドで@掘し、また前述し几理出にニジ、従来のレーザエ
9も発振?jj4++i[#を訛が低く、かつ値分産子
効率の^いレーデを得ることができる0 第8図は季晃例の応用例における−1I圏科視図でh夛
、41図に関して説明した部分と同部分はlWl記号で
指示しである0 不応用例が4S図夷處例と相違する点は、活性41Bよ
)Jm折卓が小さく、かつ禁制帯幅が大きい元ガイド及
びキャリア閉じ込め層(以上光ガイド層と略記)SS及
びIB4t−活性層18の上下に積層したことである。
This source is derived from the active 1fjl18L and the cladding layers 17 and 19 with a high refractive index.
is combined with At this time, since the refractive index of the cladding layer 12 and the core W118 is low, the wave guided into the active layer 18 is again caused by the cladding layer 12 and the single layer to increase the internal pressure of the core layer 18 by 4 waves. There is a common loss. In transverse mode control, the core layer 18 with a low refractive index is provided in 114 contact with the active layer 18 in the laser iI411tm which is parallel to the dual-handed power rotation of the laser. It occurs in the active layer 18 and originates from the core layer 1.
8vcL is trapped between the lateral forces and digs in a stable fundamental mode, and as mentioned above, the conventional laser 9 also oscillates? jj4++i[# can be used to obtain a lede with a low accent and a high value denominator efficiency 0 Figure 8 is a -1I category diagram in an application example of Kishu. The same part as the part is indicated by lWl symbol.0 The difference between the non-applied example and the 4S example is that the active 41B) Jm folding table is small and the original guide and carrier confinement layer has a large forbidden band width. (abbreviated as light guide layer) SS and IB4t are laminated above and below the active layer 18.

不応用例ではz8はn形AtGaAh元ガイド層、24
はp形AtG a A s光ガイド層で必る0 この半導体レーザの制作を量率に説明することにする。
In the non-application example, z8 is an n-type AtGaAh original guide layer, 24
is necessarily 0 in the p-type AtGaAs light guide layer.The production of this semiconductor laser will be explained in terms of quantity.

電億81に正、電惚isに負の電圧を印加し、活性層重
8にキャリアを注入し、再結合によ多発光を得る0粘性
層18に注入されたキャリアは縦7j同に対して配慮さ
れ九千尋体層17・19゜8&B#ハと、横方向で緩触
しているコア層重8に1りてt占性418内に閉じ込め
られ、また元はn形光ガイド層88とp形光ガイド層z
Oの両方にしみ出し%屈折率の低いクラッド層重7及び
!9に工つて4かれるOこのレーザ元は活性層18及び
元ガイド層ga・24内を伝叙し、エピタキシャル層1
 fill@14へ結付される。
A positive voltage is applied to the voltage 81 and a negative voltage is applied to the voltage is, and carriers are injected into the active layer layer 8, and multiple lights are obtained by recombination.The carriers injected into the viscous layer 18 are vertically The nine-chihiro body layer 17.19°8&B#c is confined in the t-occupancy 418 by the core layer 8, which is in gentle contact with the lateral direction, and is originally an n-type light guide layer. 88 and p-type light guide layer z
O seeps into both % cladding layer weight with low refractive index 7 and! 9, this laser beam propagates through the active layer 18 and the original guide layer ga, 24, and forms the epitaxial layer 1.
Connected to fill@14.

本応用例によれば、元ガイドPIIIt−設け、d元ガ
イドノーの組成及びI−厚’kK化させることKLって
活性4付近での九装置分布をかえられるので、レーザ発
振繭値t−低減できるような#1注l−円の元閉じ込め
iM数のJ1通化と、出力懺域との元O結付効卓の向上
の両刃が満足できる粂件を広げることができる・ 第4図は不発明の変形例における全反射Ji v −ザ
の上向1fi圓図でめるO第6図において、86は活性
層と該活性層を上下から挾んだクラッド層とからなる活
性領域、36はコア層と威コア層を上下から挾んだクラ
ッド層とからなる反射懺城會示している。
According to this application example, by providing the original guide PIIIt and changing the composition and thickness of the original guide d to 'kK, KL can change the nine device distribution near the active 4, so the laser oscillation cocoon value t- It is possible to expand the range of conditions that can be satisfied with both the reduction of the number of confinement iM of the #1 Note l-circle and the improvement of the effect of the coupling of the original O with the output area. In FIG. 6, which shows an upward 1-fi circle diagram of the total reflection Jiv-zer in the modified example of the invention, 86 is an active region consisting of an active layer and cladding layers sandwiching the active layer from above and below; shows a reflective layer consisting of a core layer and a cladding layer sandwiching the core layer from above and below.

本変形例にぶれば活性慣域BISと反射領域S6との屈
折率差を大きくとることにより活性領域z5の四面で全
反射imこすので、低−値V−ザが得られる〇 (7)  発明の幼果 本釦−に工れば従来のレーザよpも尭伽龜處がはく、か
つ倣分盪子効率の問い半導体レーザを祷ることができる
According to this modification, by increasing the refractive index difference between the active inertial region BIS and the reflection region S6, total reflection im is performed on the four surfaces of the active region z5, so that a low value V-za can be obtained.〇(7) Invention If it is built into a young fruit button, it will have more space than a conventional laser, and it will be possible to use a semiconductor laser with imitative splitter efficiency.

【図面の簡単な説明】[Brief explanation of the drawing]

41Aは従来の半4体レーザのレーザ発振方向に対して
平行な祇略断面図、第8図は本実施例の傷々の鯛遣工4
t−示した牛4俸レーザの一部破断dOL図、148図
は不発明の応用例における一部破wR科視図、44図は
本発明の変形例における全反mii*v−ザのよL!o
断面図である01.17     n形AtGa Am
クラッド層B I i 8     p形Aj (Ja
 As活性層4.19    9形kl Cka As
クラッド層@、l!、14    出力光4彼路用クラ
ッド層7、is     田力光4腋路用コアノー9、
at     p稠電憾 10 # m +an @電礁 iim、a会   元ガイド層 S6      活性蛸域
41A is a schematic cross-sectional view parallel to the laser oscillation direction of a conventional half-four body laser, and FIG.
Figure 148 is a partially broken dOL diagram of the cow 4-barrow laser shown in Figure 4, a partly broken wR view in an application example of the invention, and Figure 44 is a fully broken dOL diagram of the cow 4-barrow laser in a modified example of the present invention. L! o
Cross-sectional view of 01.17 n-type AtGa Am
Cladding layer B I i 8 p type Aj (Ja
As active layer 4.19 9 type kl Cka As
Cladding layer @, l! , 14 Output light 4 cladding layer 7 for axillary route 9,
at p 稠稠熾10 # m +an @ Den reef iim, a meeting former guide layer S6 active octopus area

Claims (1)

【特許請求の範囲】 0) 活性I−と該活性ノーより屈折4が小さく、かつ
Jl鯛借−が大盛〈、かつ−ml活性虐全土下から挾ん
だクラッドl−とからなるダブルへテロ緩曾佛造の4I
 047−半導体層と、コア層と該コア層よりAl近卓
が小さく、かつl1IJ記コアノーを上下から挾んだク
ラッドノーとから成るgsの多層半導体l曽とを有し、
罰l11c!mgl12)憂ノー半導体層の周囲を取シ
囲むようにflIJ記4zの多層半纏体層を接して配置
し。 かつ+5!J紀l&往I−の周囲に前記コア!−を瞬接
して配置したことを4値とする半導体発光装置011 
 活性ノーと、鎮活性層の少なくとも片側に該活性1I
11工)屈折4が小さく、かつ系割惜幅が太き一元ガイ
ド及びキャリア閉じ込め作用を持つ元ガイド層と、j1
!に薊ml活性層と前記元ガイド層の上下に#11]紀
元ガイドI−よル屈折卓が小さく、かつ前記IIs吐1
−19雇副蛍暢が大きいクラッド層とから成る一1CD
−ノ四半4体ノ曽と、コアノ曽と販コアI−よプ腐折卓
が小さく、かつ前記コア/11t−上下から挾んだクラ
ッドノーとから成る第goa)層半4体I−とを有し、
前記5glの多層半導体層の周囲t−取9囲むように#
−第8の多層半纏体層曽を曽して配慮し。 かりMl紀活性ノーの周囲に前記コア層を瞬接して配置
したことを特徴とする特許請求011Q囲第1機紀−の
半4体)Ajtf7c瀘0
[Scope of Claims] 0) To a double consisting of an active I- and a cladding L- which has a smaller refraction 4 than the active No, and a large amount of Jl and a large amount of Jl, and a clad l- which is sandwiched from below the -ml active mass. The 4Is of Butsuzou to Slow Terrorism
047- having a semiconductor layer, a core layer and a cladding layer having a smaller Al layer than the core layer and sandwiching the core layer from above and below,
Punishment l11c! mgl12) The multilayer semi-coated layer of flIJ4z is placed in contact with the periphery of the semiconductor layer so as to surround it. And +5! Said core around JK & OI-! Semiconductor light emitting device 011 which has four values when - is placed in instant contact
and the active 1I on at least one side of the anti-activating layer.
11) An original guide layer with a small refraction 4 and a large system allowance width and a carrier confinement function, and j1
! Above and below the active layer and the original guide layer #11] Era guide I - the refractor table is small, and the IIs discharge 1
- 1 CD consisting of a large cladding layer with 19 sub-layers
The fourth goa) layer half-four bodies I- are made up of four quarters of the four bodies, and the fourth half of the fourth body I-, which is small in size and consists of the core/11t and the crudnos sandwiched from above and below. has
The circumference of the 5gl multilayer semiconductor layer is #
- Considering the eighth multi-layer semi-woven body layer. Patent claim 011Q, characterized in that the core layer is disposed around the Ml period active no.
JP56201230A 1981-12-14 1981-12-14 Semiconductor light emitting device Pending JPS58102586A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56201230A JPS58102586A (en) 1981-12-14 1981-12-14 Semiconductor light emitting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56201230A JPS58102586A (en) 1981-12-14 1981-12-14 Semiconductor light emitting device

Publications (1)

Publication Number Publication Date
JPS58102586A true JPS58102586A (en) 1983-06-18

Family

ID=16437486

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56201230A Pending JPS58102586A (en) 1981-12-14 1981-12-14 Semiconductor light emitting device

Country Status (1)

Country Link
JP (1) JPS58102586A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51134594A (en) * 1975-05-16 1976-11-22 Mitsubishi Electric Corp Semiconductor leser device
JPS5333080A (en) * 1976-09-08 1978-03-28 Nippon Telegr & Teleph Corp <Ntt> Light emitting semiconductor device and its production
JPS568890A (en) * 1979-06-27 1981-01-29 Nec Corp Semiconductor laser and manufacture thereof
JPS56112782A (en) * 1980-02-08 1981-09-05 Nec Corp Semiconductor laser

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51134594A (en) * 1975-05-16 1976-11-22 Mitsubishi Electric Corp Semiconductor leser device
JPS5333080A (en) * 1976-09-08 1978-03-28 Nippon Telegr & Teleph Corp <Ntt> Light emitting semiconductor device and its production
JPS568890A (en) * 1979-06-27 1981-01-29 Nec Corp Semiconductor laser and manufacture thereof
JPS56112782A (en) * 1980-02-08 1981-09-05 Nec Corp Semiconductor laser

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