JPS5654085A - Semiconductor laser and manufacture thereof - Google Patents
Semiconductor laser and manufacture thereofInfo
- Publication number
- JPS5654085A JPS5654085A JP13038179A JP13038179A JPS5654085A JP S5654085 A JPS5654085 A JP S5654085A JP 13038179 A JP13038179 A JP 13038179A JP 13038179 A JP13038179 A JP 13038179A JP S5654085 A JPS5654085 A JP S5654085A
- Authority
- JP
- Japan
- Prior art keywords
- type
- regions
- converted
- those
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0421—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers
- H01S5/0422—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers with n- and p-contacts on the same side of the active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2203—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure with a transverse junction stripe [TJS] structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
- H01S5/4043—Edge-emitting structures with vertically stacked active layers
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Semiconductor Lasers (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
PURPOSE:To obtain a laser output having narrowed the radiation angle by a high output by maintaining a good oscillation characteristic by a method wherein a number of active regions are provided and the active regions are respectively brought into contact with each other in order to be phase-locked. CONSTITUTION:Regions 11, 21 converted into P type regions and regions 12, 22 converted into P<+> type regions respectively are formed in an N type GaAlAs crystal layer 1 and an N type GaAs crystal layer 2 and further, a region 31 converted into a P type region and a region 32 converted into a P type region are formed in an N type GaAlAs crystal layer 3, thereby forming a P-N junction of semiconductor crystal layers. Also, the P-N junction is made up by providing an N type GaAlAs crystal layer 5 which respectively have regions 41, 51 converted into those of P type and regions 42, 52 converted into those of P<+> type. The refractive indexes of the crystal layers 1, 3, 5 are made lower than those of the crystal layers 2, 4 and the forbidden band widths thereof are made wider than those of the crystal layers 2, 4 to generate laser lights with a narrow radiation angle in high output, with a good oscillation characteristic being held.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13038179A JPS5654085A (en) | 1979-10-09 | 1979-10-09 | Semiconductor laser and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13038179A JPS5654085A (en) | 1979-10-09 | 1979-10-09 | Semiconductor laser and manufacture thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5654085A true JPS5654085A (en) | 1981-05-13 |
Family
ID=15032969
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13038179A Pending JPS5654085A (en) | 1979-10-09 | 1979-10-09 | Semiconductor laser and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5654085A (en) |
-
1979
- 1979-10-09 JP JP13038179A patent/JPS5654085A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5640292A (en) | Semiconductor laser | |
JPS55165691A (en) | Compound semiconductor laser element | |
JPS568890A (en) | Semiconductor laser and manufacture thereof | |
JPS5654085A (en) | Semiconductor laser and manufacture thereof | |
JPS5673487A (en) | Semiconductor laser and its manufacture | |
JPS55140286A (en) | Buried heterogeneous structure semiconductor for use in laser | |
JPS55108789A (en) | Semiconductor laser | |
JPS5618484A (en) | Manufacture of semiconductor laser | |
JPS5654080A (en) | Avalanche photodiode | |
JPS5524418A (en) | Light integrated circuit | |
JPS5680195A (en) | Semiconductor laser device | |
JPS5636184A (en) | Manufacture of semiconductor laser | |
JPS5522807A (en) | Semiconductor laser element and manufacturing of the same | |
JPS55125692A (en) | Semiconductor laser | |
JPS56157083A (en) | Manufacture of semiconductor laser | |
JPS5645089A (en) | Semiconductor laser | |
JPS57198684A (en) | Manufacture of semiconductor device having multilayer semiconductor crystal layer | |
JPS5694793A (en) | Semiconductor laser device | |
JPS5518037A (en) | Semiconductor laser | |
JPS5721884A (en) | Semiconductor laser | |
JPS55138888A (en) | Semiconductor light oscillator | |
JPS5669885A (en) | Semiconductor laser device | |
JPS5735393A (en) | Semiconductor laser | |
JPS55128894A (en) | Semiconductor light emitting device and method of fabricating the same | |
JPS5643789A (en) | Semiconductor laser |