JPS5656261A - Method and apparatus for rotary coating - Google Patents
Method and apparatus for rotary coatingInfo
- Publication number
- JPS5656261A JPS5656261A JP13148479A JP13148479A JPS5656261A JP S5656261 A JPS5656261 A JP S5656261A JP 13148479 A JP13148479 A JP 13148479A JP 13148479 A JP13148479 A JP 13148479A JP S5656261 A JPS5656261 A JP S5656261A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- photoresist
- liquid
- coating liquid
- injected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13148479A JPS5656261A (en) | 1979-10-11 | 1979-10-11 | Method and apparatus for rotary coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13148479A JPS5656261A (en) | 1979-10-11 | 1979-10-11 | Method and apparatus for rotary coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5656261A true JPS5656261A (en) | 1981-05-18 |
| JPS6250194B2 JPS6250194B2 (enrdf_load_stackoverflow) | 1987-10-23 |
Family
ID=15059052
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13148479A Granted JPS5656261A (en) | 1979-10-11 | 1979-10-11 | Method and apparatus for rotary coating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5656261A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59208832A (ja) * | 1983-05-13 | 1984-11-27 | Hitachi Tokyo Electronics Co Ltd | 塗布装置 |
| JPS60189936A (ja) * | 1984-03-12 | 1985-09-27 | Nippon Kogaku Kk <Nikon> | 半導体製造装置 |
| JPS61104623A (ja) * | 1984-10-29 | 1986-05-22 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 回転塗布方法及び回転塗布装置 |
| JPH03272140A (ja) * | 1990-03-22 | 1991-12-03 | Fujitsu Ltd | 半導体基板の薬品処理装置 |
| JP2009021268A (ja) * | 2007-07-10 | 2009-01-29 | Tokyo Electron Ltd | 基板処理装置 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4996080A (en) * | 1989-04-05 | 1991-02-26 | Olin Hunt Specialty Products Inc. | Process for coating a photoresist composition onto a substrate |
-
1979
- 1979-10-11 JP JP13148479A patent/JPS5656261A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59208832A (ja) * | 1983-05-13 | 1984-11-27 | Hitachi Tokyo Electronics Co Ltd | 塗布装置 |
| JPS60189936A (ja) * | 1984-03-12 | 1985-09-27 | Nippon Kogaku Kk <Nikon> | 半導体製造装置 |
| JPS61104623A (ja) * | 1984-10-29 | 1986-05-22 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 回転塗布方法及び回転塗布装置 |
| JPH03272140A (ja) * | 1990-03-22 | 1991-12-03 | Fujitsu Ltd | 半導体基板の薬品処理装置 |
| JP2009021268A (ja) * | 2007-07-10 | 2009-01-29 | Tokyo Electron Ltd | 基板処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6250194B2 (enrdf_load_stackoverflow) | 1987-10-23 |
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