JPS6250194B2 - - Google Patents
Info
- Publication number
- JPS6250194B2 JPS6250194B2 JP13148479A JP13148479A JPS6250194B2 JP S6250194 B2 JPS6250194 B2 JP S6250194B2 JP 13148479 A JP13148479 A JP 13148479A JP 13148479 A JP13148479 A JP 13148479A JP S6250194 B2 JPS6250194 B2 JP S6250194B2
- Authority
- JP
- Japan
- Prior art keywords
- coating
- photoresist
- liquid
- coating liquid
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 61
- 238000000576 coating method Methods 0.000 claims description 52
- 239000011248 coating agent Substances 0.000 claims description 44
- 239000007788 liquid Substances 0.000 claims description 40
- 239000000758 substrate Substances 0.000 claims description 37
- 239000000463 material Substances 0.000 claims description 16
- 230000007246 mechanism Effects 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- 238000004528 spin coating Methods 0.000 claims description 11
- 238000002347 injection Methods 0.000 claims description 10
- 239000007924 injection Substances 0.000 claims description 10
- 239000000243 solution Substances 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 claims description 6
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims 2
- 238000003825 pressing Methods 0.000 claims 1
- 239000007921 spray Substances 0.000 claims 1
- 230000007547 defect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000007863 gel particle Substances 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13148479A JPS5656261A (en) | 1979-10-11 | 1979-10-11 | Method and apparatus for rotary coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13148479A JPS5656261A (en) | 1979-10-11 | 1979-10-11 | Method and apparatus for rotary coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5656261A JPS5656261A (en) | 1981-05-18 |
| JPS6250194B2 true JPS6250194B2 (enrdf_load_stackoverflow) | 1987-10-23 |
Family
ID=15059052
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13148479A Granted JPS5656261A (en) | 1979-10-11 | 1979-10-11 | Method and apparatus for rotary coating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5656261A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04504377A (ja) * | 1989-04-05 | 1992-08-06 | オー・シー・ジー・マイクロエレクトロニツク・マテリアルズ・インコーポレイテツド | 基体上へフォトレジスト組成物をコーティングする方法 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59208832A (ja) * | 1983-05-13 | 1984-11-27 | Hitachi Tokyo Electronics Co Ltd | 塗布装置 |
| JPH0669019B2 (ja) * | 1984-03-12 | 1994-08-31 | 株式会社ニコン | 半導体製造装置 |
| US4590094A (en) * | 1984-10-29 | 1986-05-20 | International Business Machines Corporation | Inverted apply using bubble dispense |
| JPH03272140A (ja) * | 1990-03-22 | 1991-12-03 | Fujitsu Ltd | 半導体基板の薬品処理装置 |
| JP4812704B2 (ja) * | 2007-07-10 | 2011-11-09 | 東京エレクトロン株式会社 | 基板処理装置 |
-
1979
- 1979-10-11 JP JP13148479A patent/JPS5656261A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04504377A (ja) * | 1989-04-05 | 1992-08-06 | オー・シー・ジー・マイクロエレクトロニツク・マテリアルズ・インコーポレイテツド | 基体上へフォトレジスト組成物をコーティングする方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5656261A (en) | 1981-05-18 |
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