JPS5630723A - Pattern formation by electron beam exposing device - Google Patents

Pattern formation by electron beam exposing device

Info

Publication number
JPS5630723A
JPS5630723A JP10618579A JP10618579A JPS5630723A JP S5630723 A JPS5630723 A JP S5630723A JP 10618579 A JP10618579 A JP 10618579A JP 10618579 A JP10618579 A JP 10618579A JP S5630723 A JPS5630723 A JP S5630723A
Authority
JP
Japan
Prior art keywords
patterns
electron beam
pattern
exposing device
auxiliary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10618579A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6111461B2 (enrdf_load_stackoverflow
Inventor
Akira Noma
Bunro Komatsu
Yasuo Matsuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP10618579A priority Critical patent/JPS5630723A/ja
Publication of JPS5630723A publication Critical patent/JPS5630723A/ja
Publication of JPS6111461B2 publication Critical patent/JPS6111461B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
JP10618579A 1979-08-21 1979-08-21 Pattern formation by electron beam exposing device Granted JPS5630723A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10618579A JPS5630723A (en) 1979-08-21 1979-08-21 Pattern formation by electron beam exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10618579A JPS5630723A (en) 1979-08-21 1979-08-21 Pattern formation by electron beam exposing device

Publications (2)

Publication Number Publication Date
JPS5630723A true JPS5630723A (en) 1981-03-27
JPS6111461B2 JPS6111461B2 (enrdf_load_stackoverflow) 1986-04-03

Family

ID=14427146

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10618579A Granted JPS5630723A (en) 1979-08-21 1979-08-21 Pattern formation by electron beam exposing device

Country Status (1)

Country Link
JP (1) JPS5630723A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5769742A (en) * 1980-10-20 1982-04-28 Sanyo Electric Co Ltd Inspecting method for accuracy of pattern
JPS5835922A (ja) * 1981-08-28 1983-03-02 Toshiba Corp 電子ビ−ム露光装置によるパタ−ン形成方法
JPS5834731U (ja) * 1981-08-28 1983-03-07 三洋電機株式会社 電子ビ−ム露光用マスク

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5769742A (en) * 1980-10-20 1982-04-28 Sanyo Electric Co Ltd Inspecting method for accuracy of pattern
JPS5835922A (ja) * 1981-08-28 1983-03-02 Toshiba Corp 電子ビ−ム露光装置によるパタ−ン形成方法
JPS5834731U (ja) * 1981-08-28 1983-03-07 三洋電機株式会社 電子ビ−ム露光用マスク

Also Published As

Publication number Publication date
JPS6111461B2 (enrdf_load_stackoverflow) 1986-04-03

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