JPS56158334A - Manufacture of hard mask - Google Patents

Manufacture of hard mask

Info

Publication number
JPS56158334A
JPS56158334A JP6429680A JP6429680A JPS56158334A JP S56158334 A JPS56158334 A JP S56158334A JP 6429680 A JP6429680 A JP 6429680A JP 6429680 A JP6429680 A JP 6429680A JP S56158334 A JPS56158334 A JP S56158334A
Authority
JP
Japan
Prior art keywords
layer
hard mask
pattern
mask
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6429680A
Other languages
Japanese (ja)
Other versions
JPS6212503B2 (en
Inventor
Yaichiro Watakabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP6429680A priority Critical patent/JPS56158334A/en
Publication of JPS56158334A publication Critical patent/JPS56158334A/en
Publication of JPS6212503B2 publication Critical patent/JPS6212503B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Glass (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To obtain a hard mask of high quality and high accuracy by a dry etching method by laying a hard mask material, a heat resistant resist and a resist with high sensitivity on a substrate in order, drawing a pattern with electron beams, developing it, and using the resulting resist layer as a mask. CONSTITUTION:A layer 2 of a hard mask material such as Cr is formed on a transparent glass substrate 1, and on the layer 2 a heat resistant photoresist layer 13 and an electron beam resist layer 14 with high sensitivity are formed in order by coating. A pattern is drawn on the layer 14 with electron beams and developed. Using the pattern of the layer 14 as a mask the layer 13 is developed or dissolved to form the same pattern. Using the layers 13, 14 as a mask the Cr layer 2 is then dry etched by plasma, sputtering or ion etching. Thus, a hard mask 2 of high accuracy can be manufactured without causing defects such as pinholes.
JP6429680A 1980-05-12 1980-05-12 Manufacture of hard mask Granted JPS56158334A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6429680A JPS56158334A (en) 1980-05-12 1980-05-12 Manufacture of hard mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6429680A JPS56158334A (en) 1980-05-12 1980-05-12 Manufacture of hard mask

Publications (2)

Publication Number Publication Date
JPS56158334A true JPS56158334A (en) 1981-12-07
JPS6212503B2 JPS6212503B2 (en) 1987-03-19

Family

ID=13254131

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6429680A Granted JPS56158334A (en) 1980-05-12 1980-05-12 Manufacture of hard mask

Country Status (1)

Country Link
JP (1) JPS56158334A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010088332A (en) * 2000-02-16 2001-09-26 카나가와 치히로 Photomask blank, photomask and method of manufacture
KR100422822B1 (en) * 1996-10-05 2004-06-16 주식회사 하이닉스반도체 Method for fabricating mask by dry etch

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100422822B1 (en) * 1996-10-05 2004-06-16 주식회사 하이닉스반도체 Method for fabricating mask by dry etch
KR20010088332A (en) * 2000-02-16 2001-09-26 카나가와 치히로 Photomask blank, photomask and method of manufacture

Also Published As

Publication number Publication date
JPS6212503B2 (en) 1987-03-19

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