JPS5535214A - Method and device for film-thickness measurement making use of infrared-ray interference - Google Patents

Method and device for film-thickness measurement making use of infrared-ray interference

Info

Publication number
JPS5535214A
JPS5535214A JP10754778A JP10754778A JPS5535214A JP S5535214 A JPS5535214 A JP S5535214A JP 10754778 A JP10754778 A JP 10754778A JP 10754778 A JP10754778 A JP 10754778A JP S5535214 A JPS5535214 A JP S5535214A
Authority
JP
Japan
Prior art keywords
infrared
interference
film
thin plastic
making use
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10754778A
Other languages
English (en)
Japanese (ja)
Inventor
Fumitaka Yasujima
Shingo Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Dow Ltd
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Dow Ltd
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Dow Ltd, Asahi Chemical Industry Co Ltd filed Critical Asahi Dow Ltd
Priority to JP10754778A priority Critical patent/JPS5535214A/ja
Priority to GB7929457A priority patent/GB2033079B/en
Priority to US06/070,555 priority patent/US4254337A/en
Priority to FR7921872A priority patent/FR2435019A1/fr
Priority to DE19792935716 priority patent/DE2935716A1/de
Publication of JPS5535214A publication Critical patent/JPS5535214A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP10754778A 1978-09-04 1978-09-04 Method and device for film-thickness measurement making use of infrared-ray interference Pending JPS5535214A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP10754778A JPS5535214A (en) 1978-09-04 1978-09-04 Method and device for film-thickness measurement making use of infrared-ray interference
GB7929457A GB2033079B (en) 1978-09-04 1979-08-23 Infrared interference type film thickness measuring method and instrument
US06/070,555 US4254337A (en) 1978-09-04 1979-08-29 Infrared interference type film thickness measuring method and instrument therefor
FR7921872A FR2435019A1 (fr) 1978-09-04 1979-08-31 Procede et instrument de mesure de l'epaisseur d'une pellicule mince par interferences en infrarouge
DE19792935716 DE2935716A1 (de) 1978-09-04 1979-09-04 Verfahren und vorrichtung zum messen der dicke eines films durch ausnutzung von infrarot-interferenzerscheinungen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10754778A JPS5535214A (en) 1978-09-04 1978-09-04 Method and device for film-thickness measurement making use of infrared-ray interference

Publications (1)

Publication Number Publication Date
JPS5535214A true JPS5535214A (en) 1980-03-12

Family

ID=14461940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10754778A Pending JPS5535214A (en) 1978-09-04 1978-09-04 Method and device for film-thickness measurement making use of infrared-ray interference

Country Status (5)

Country Link
US (1) US4254337A (en, 2012)
JP (1) JPS5535214A (en, 2012)
DE (1) DE2935716A1 (en, 2012)
FR (1) FR2435019A1 (en, 2012)
GB (1) GB2033079B (en, 2012)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57131321U (en, 2012) * 1981-02-12 1982-08-16
JPS57150001U (en, 2012) * 1981-03-17 1982-09-20
JPS57157105A (en) * 1981-03-24 1982-09-28 Kokusai Electric Co Ltd Device for measuring thickness of thin film
JPS5879401U (ja) * 1981-11-25 1983-05-28 本田技研工業株式会社 車両用ホイ−ル
JPS6037226A (ja) * 1983-08-10 1985-02-26 Hitachi Ltd 二部材の結合方法
JPS60127403A (ja) * 1983-12-13 1985-07-08 Anritsu Corp 厚み測定装置
US4676647A (en) * 1985-03-22 1987-06-30 Dainippon Screen Mfg. Co., Ltd. Film thickness measuring device and method
JPH03285106A (ja) * 1990-03-31 1991-12-16 Photonics:Kk 表面検査装置
JP2009025181A (ja) * 2007-07-20 2009-02-05 Fujinon Corp 厚み測定用光干渉測定装置
CN108050947A (zh) * 2018-01-02 2018-05-18 京东方科技集团股份有限公司 一种膜层厚度的检测方法

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3135443A1 (de) * 1981-09-08 1983-03-24 Leybold-Heraeus GmbH, 5000 Köln Verfahren und fotometrische anordnung zur dickenmessung und -steuerung optisch wirksamer schichten
JPS58115306A (ja) * 1981-12-29 1983-07-09 Chugai Ro Kogyo Kaisha Ltd 塗膜厚連続測定装置
US4522510A (en) * 1982-07-26 1985-06-11 Therma-Wave, Inc. Thin film thickness measurement with thermal waves
DE3373341D1 (en) * 1983-12-27 1987-10-08 Ibm Deutschland White-light interferometer
US4958930A (en) * 1985-12-11 1990-09-25 E. I. Du Pont De Nemours And Company Apparatus for monitoring thickness variations in a film web
JPH0617774B2 (ja) * 1987-06-22 1994-03-09 大日本スクリ−ン製造株式会社 微小高低差測定装置
DE3728705A1 (de) * 1987-08-28 1989-03-09 Agfa Gevaert Ag Vorrichtung zur ueberpruefung von beschichteten und unbeschichteten folien
DE3728704A1 (de) * 1987-08-28 1989-03-09 Agfa Gevaert Ag Vorrichtung zur bestimmung der dicke von schichttraegern
DE3939877A1 (de) * 1989-12-01 1991-06-06 Siemens Ag Messanordnung zur beruehrungslosen bestimmung der dicke und/oder thermischen eigenschaften von folien und duennen oberflaechenbeschichtungen
DE3939876A1 (de) * 1989-12-01 1991-06-06 Siemens Ag Messanordnung zur beruehrungslosen bestimmung der dicke und/oder thermischen eigenschaften von folien und duennen oberflaechenbeschichtungen
US5333049A (en) * 1991-12-06 1994-07-26 Hughes Aircraft Company Apparatus and method for interferometrically measuring the thickness of thin films using full aperture irradiation
US5293214A (en) * 1991-12-06 1994-03-08 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology by deforming a thin film layer into a reflective condenser
US5291269A (en) * 1991-12-06 1994-03-01 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology on a thin film layer having shape deformations and local slope variations
US5290586A (en) * 1992-09-10 1994-03-01 International Business Machines Corporation Method to monitor Meta-Paete cure on metallized substrates
US5406090A (en) * 1993-02-22 1995-04-11 Mattson Instruments, Inc. Spectrometer and IR source therefor
US5452953A (en) * 1993-10-12 1995-09-26 Hughes Aircraft Company Film thickness measurement of structures containing a scattering surface
FR2716531B1 (fr) * 1994-02-18 1996-05-03 Saint Gobain Cinematique Contr Procédé de mesure d'épaisseur d'un matériau transparent.
DE19601923C1 (de) * 1996-01-12 1997-07-24 Inst Chemo Biosensorik Verfahren und Vorrichtung zum Erkennen organischer Substanzen
US5752607A (en) * 1996-03-18 1998-05-19 Moen Incorporated Process for distinguishing plumbing parts by the coatings applied thereto
US5909282A (en) * 1996-05-31 1999-06-01 Tropel Corporation Interferometer for measuring thickness variations of semiconductor wafers
US6034774A (en) * 1998-06-26 2000-03-07 Eastman Kodak Company Method for determining the retardation of a material using non-coherent light interferometery
FR2780778B3 (fr) 1998-07-03 2000-08-11 Saint Gobain Vitrage Procede et dispositif pour la mesure de l'epaisseur d'un materiau transparent
US6470294B1 (en) * 1999-04-13 2002-10-22 Qualitek-Vib, Inc. System and method for the on-line measurement of glue application rate on a corrugator
GB0611156D0 (en) * 2006-06-07 2006-07-19 Qinetiq Ltd Optical inspection
US9581433B2 (en) 2013-12-11 2017-02-28 Honeywell Asca Inc. Caliper sensor and method using mid-infrared interferometry
DE102015007054A1 (de) 2015-06-02 2016-12-08 Thomas Huth-Fehre Verfahren und Vorrichtung zur Bestimmung der Dicke von dünnen organischen Schichten
DE102015118069B4 (de) * 2015-10-22 2017-08-31 Precitec Optronik Gmbh Messvorrichtung und Verfahren zur Messung der Dicke einer flächigen Probe
WO2020128593A1 (en) * 2018-12-20 2020-06-25 Arcelormittal Measure of the degree of crystallinity of a polymer coating on a metal substrate
JP7230540B2 (ja) * 2019-01-31 2023-03-01 セイコーエプソン株式会社 分光システム

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1147406B (de) * 1956-02-10 1963-04-18 Siemens Ag Verfahren und Einrichtung zur Messung von Dicke und Brechungsindex duenner, schwach absorbierender Schichten
US3238839A (en) * 1962-03-29 1966-03-08 Gen Electric Optical thickness gauge
US3601492A (en) * 1967-11-20 1971-08-24 Monsanto Co Apparatus for measuring film thickness
US3631526A (en) * 1969-11-05 1971-12-28 Brun Sensor Systems Inc Apparatus and methods for eliminating interference effect errors in dual-beam infrared measurements
US3693025A (en) * 1969-11-28 1972-09-19 Brun Sensor Systems Inc Apparatus and method for eliminating interference errors in dual-beam infrared reflection measurements on a diffusely reflecting surface by geometrical elimination of interference-producing specularly-reflected radiation components
GB1382081A (en) * 1972-03-14 1975-01-29 Ici Ltd Transmission spectra
US3824017A (en) * 1973-03-26 1974-07-16 Ibm Method of determining the thickness of contiguous thin films on a substrate
US3973122A (en) * 1974-06-17 1976-08-03 Ixcon Inc. Measuring apparatus
US4027161A (en) * 1976-04-05 1977-05-31 Industrial Nucleonics Corporation Minimizing wave interference effects on the measurement of thin films having specular surfaces using infrared radiation

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57131321U (en, 2012) * 1981-02-12 1982-08-16
JPS57150001U (en, 2012) * 1981-03-17 1982-09-20
JPS57157105A (en) * 1981-03-24 1982-09-28 Kokusai Electric Co Ltd Device for measuring thickness of thin film
JPS5879401U (ja) * 1981-11-25 1983-05-28 本田技研工業株式会社 車両用ホイ−ル
JPS6037226A (ja) * 1983-08-10 1985-02-26 Hitachi Ltd 二部材の結合方法
JPS60127403A (ja) * 1983-12-13 1985-07-08 Anritsu Corp 厚み測定装置
US4676647A (en) * 1985-03-22 1987-06-30 Dainippon Screen Mfg. Co., Ltd. Film thickness measuring device and method
JPH03285106A (ja) * 1990-03-31 1991-12-16 Photonics:Kk 表面検査装置
JP2009025181A (ja) * 2007-07-20 2009-02-05 Fujinon Corp 厚み測定用光干渉測定装置
CN108050947A (zh) * 2018-01-02 2018-05-18 京东方科技集团股份有限公司 一种膜层厚度的检测方法

Also Published As

Publication number Publication date
US4254337A (en) 1981-03-03
FR2435019B1 (en, 2012) 1984-02-24
DE2935716A1 (de) 1980-03-06
DE2935716C2 (en, 2012) 1987-07-09
GB2033079A (en) 1980-05-14
GB2033079B (en) 1983-05-18
FR2435019A1 (fr) 1980-03-28

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