JPS54110938A - Method and apparatus for controlling film thickness - Google Patents

Method and apparatus for controlling film thickness

Info

Publication number
JPS54110938A
JPS54110938A JP1895878A JP1895878A JPS54110938A JP S54110938 A JPS54110938 A JP S54110938A JP 1895878 A JP1895878 A JP 1895878A JP 1895878 A JP1895878 A JP 1895878A JP S54110938 A JPS54110938 A JP S54110938A
Authority
JP
Japan
Prior art keywords
light
wave
signal light
base plate
length
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1895878A
Other languages
Japanese (ja)
Other versions
JPS627266B2 (en
Inventor
Eiichiro Tanaka
Shinji Fujiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP1895878A priority Critical patent/JPS54110938A/en
Publication of JPS54110938A publication Critical patent/JPS54110938A/en
Publication of JPS627266B2 publication Critical patent/JPS627266B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Optical Filters (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Insulating Materials (AREA)

Abstract

PURPOSE:To raise the accuracy and stability of film thickness control by the procedure in which spectral permeability or spectral reflection factor on base plate is measured by at least more than 3 wave-length lights, and than a wave-length light with it max. value or min. value is obtained by mathmatical treatment for controlling the thickness of film. CONSTITUTION:The deposition base plate 13 is set on a holder fastened to the base 11 inside the bell jar 11. The signal light A is modulated to the chopper 32 by the light source 31 and parallel light is put in by the lens 33. On the other hand, the reference light B or a modulated light with phase 180 deg. different from the signal light A, is taken out of the lens 34 alternately with the signal light A. The signal light A reflected from the base plate 13 passes through the reference glass 20, and the reference light B is reflected at the reference glass 20. They alternately go into the high speed scanning spectrometer 40, where 9 points of the spectra of wave length 31 are selected by the spectral element 41 and the high frequency oscillator 52 to measure spectral reflection factor. They then enter the electronic computer 20 through the both digital and alalog signals treatment devices 51 and 60 and the photoelectronic amplifier 42, where a wave length with max. or min. value is obtained by a N-point comparison method for controlling the thickness of film, thus making the accuracy and stability of film thickness control higher.
JP1895878A 1978-02-20 1978-02-20 Method and apparatus for controlling film thickness Granted JPS54110938A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1895878A JPS54110938A (en) 1978-02-20 1978-02-20 Method and apparatus for controlling film thickness

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1895878A JPS54110938A (en) 1978-02-20 1978-02-20 Method and apparatus for controlling film thickness

Publications (2)

Publication Number Publication Date
JPS54110938A true JPS54110938A (en) 1979-08-30
JPS627266B2 JPS627266B2 (en) 1987-02-16

Family

ID=11986145

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1895878A Granted JPS54110938A (en) 1978-02-20 1978-02-20 Method and apparatus for controlling film thickness

Country Status (1)

Country Link
JP (1) JPS54110938A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59166689A (en) * 1982-12-17 1984-09-20 ソルベイ・アンド・コンパニ−（ソシエテ・アノニム） Cathode for electrolytic production of hydrogen
WO2008048136A1 (en) * 2006-10-18 2008-04-24 Federalnoe Gosudarstvennoe Obrazovatelnoe Uchrezhdenie Vyschego Professionalnogo Obrazovaniya 'rossysky Gosudarstvenny Universitet Im. I. Kanta' Method for checking a film thickness during the application thereof by evaporating in a vacuum chamber

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH026989U (en) * 1988-06-27 1990-01-17

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59166689A (en) * 1982-12-17 1984-09-20 ソルベイ・アンド・コンパニ−（ソシエテ・アノニム） Cathode for electrolytic production of hydrogen
WO2008048136A1 (en) * 2006-10-18 2008-04-24 Federalnoe Gosudarstvennoe Obrazovatelnoe Uchrezhdenie Vyschego Professionalnogo Obrazovaniya 'rossysky Gosudarstvenny Universitet Im. I. Kanta' Method for checking a film thickness during the application thereof by evaporating in a vacuum chamber

Also Published As

Publication number Publication date
JPS627266B2 (en) 1987-02-16

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