JPS55133574A - Insulated gate field effect transistor - Google Patents

Insulated gate field effect transistor

Info

Publication number
JPS55133574A
JPS55133574A JP4141179A JP4141179A JPS55133574A JP S55133574 A JPS55133574 A JP S55133574A JP 4141179 A JP4141179 A JP 4141179A JP 4141179 A JP4141179 A JP 4141179A JP S55133574 A JPS55133574 A JP S55133574A
Authority
JP
Japan
Prior art keywords
region
type
insulated gate
impurity density
field effect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4141179A
Other languages
English (en)
Inventor
Tetsuo Ichikawa
Kenji Hideshima
Hideyoshi Sato
Yuki Shimada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Nippon Telegraph and Telephone Corp
Original Assignee
NEC Corp
Nippon Telegraph and Telephone Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Telegraph and Telephone Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP4141179A priority Critical patent/JPS55133574A/ja
Publication of JPS55133574A publication Critical patent/JPS55133574A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
    • H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
    • H01L29/7813—Vertical DMOS transistors, i.e. VDMOS transistors with trench gate electrode, e.g. UMOS transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0843—Source or drain regions of field-effect devices
    • H01L29/0847—Source or drain regions of field-effect devices of field-effect transistors with insulated gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312—Gate electrodes for field effect devices
    • H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42356—Disposition, e.g. buried gate electrode
    • H01L29/4236—Disposition, e.g. buried gate electrode within a trench, e.g. trench gate electrode, groove gate electrode
JP4141179A 1979-04-05 1979-04-05 Insulated gate field effect transistor Pending JPS55133574A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4141179A JPS55133574A (en) 1979-04-05 1979-04-05 Insulated gate field effect transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4141179A JPS55133574A (en) 1979-04-05 1979-04-05 Insulated gate field effect transistor

Publications (1)

Publication Number Publication Date
JPS55133574A true JPS55133574A (en) 1980-10-17

Family

ID=12607607

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4141179A Pending JPS55133574A (en) 1979-04-05 1979-04-05 Insulated gate field effect transistor

Country Status (1)

Country Link
JP (1) JPS55133574A (ja)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58141573A (ja) * 1982-02-18 1983-08-22 Semiconductor Energy Lab Co Ltd 集積回路及びその作製方法
JPS598374A (ja) * 1982-07-05 1984-01-17 Matsushita Electronics Corp 縦型構造電界効果トランジスタの製造方法
EP0164095A2 (en) * 1984-06-08 1985-12-11 Eaton Corporation Vertical bidirectional stacked power fet
US4636823A (en) * 1984-06-05 1987-01-13 California Institute Of Technology Vertical Schottky barrier gate field-effect transistor in GaAs/GaAlAs
US4641164A (en) * 1986-05-30 1987-02-03 Rca Corporation Bidirectional vertical power MOS device and fabrication method
US4830978A (en) * 1987-03-16 1989-05-16 Texas Instruments Incorporated Dram cell and method
JPH0250482A (ja) * 1988-06-20 1990-02-20 General Electric Co (Ge) 双方向性の電界効果半導体素子および回路
USRE33261E (en) * 1984-07-03 1990-07-10 Texas Instruments, Incorporated Trench capacitor for high density dynamic RAM
US4941030A (en) * 1985-02-05 1990-07-10 Mitsubishi Denki Kabushiki Kaisha Semiconductor device
US5102817A (en) * 1985-03-21 1992-04-07 Texas Instruments Incorporated Vertical DRAM cell and method
US5105245A (en) * 1988-06-28 1992-04-14 Texas Instruments Incorporated Trench capacitor DRAM cell with diffused bit lines adjacent to a trench
US5109259A (en) * 1987-09-22 1992-04-28 Texas Instruments Incorporated Multiple DRAM cells in a trench
US5115287A (en) * 1986-11-19 1992-05-19 Research Development Corporation Of Japan Step-cut insulated gate static induction transistors and method of manufacturing the same
US5134448A (en) * 1990-01-29 1992-07-28 Motorola, Inc. MOSFET with substrate source contact
US5208657A (en) * 1984-08-31 1993-05-04 Texas Instruments Incorporated DRAM Cell with trench capacitor and vertical channel in substrate
US5225363A (en) * 1988-06-28 1993-07-06 Texas Instruments Incorporated Trench capacitor DRAM cell and method of manufacture
JP2001189456A (ja) * 1999-10-18 2001-07-10 Seiko Instruments Inc 縦形ｍｏｓトランジスタ及びその製造方法
DE10026742A1 (de) * 2000-05-30 2001-12-13 Infineon Technologies Ag In beide Richtungen sperrendes Halbleiterschaltelement
JP2003008018A (ja) * 2001-06-20 2003-01-10 Denso Corp 半導体装置及びその製造方法
WO2004055904A1 (en) * 2002-12-14 2004-07-01 Koninklijke Philips Electronics N.V. Vertical insulated gate transistor and manufacturing method
KR100450652B1 (ko) * 1997-08-22 2004-12-17 페어차일드코리아반도체 주식회사 트렌치형파워모스펫및그제조방법
JP2008053378A (ja) * 2006-08-23 2008-03-06 Sanyo Electric Co Ltd 絶縁ゲート型半導体装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52122481A (en) * 1976-04-07 1977-10-14 Matsushita Electric Ind Co Ltd Mos type semiconductor device and its production

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52122481A (en) * 1976-04-07 1977-10-14 Matsushita Electric Ind Co Ltd Mos type semiconductor device and its production

Cited By (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58141573A (ja) * 1982-02-18 1983-08-22 Semiconductor Energy Lab Co Ltd 集積回路及びその作製方法
JPH0512865B2 (ja) * 1982-02-18 1993-02-19 Handotai Energy Kenkyusho
JPS598374A (ja) * 1982-07-05 1984-01-17 Matsushita Electronics Corp 縦型構造電界効果トランジスタの製造方法
JPH0481345B2 (ja) * 1982-07-05 1992-12-22 Matsushita Electronics Corp
US4636823A (en) * 1984-06-05 1987-01-13 California Institute Of Technology Vertical Schottky barrier gate field-effect transistor in GaAs/GaAlAs
EP0164095A2 (en) * 1984-06-08 1985-12-11 Eaton Corporation Vertical bidirectional stacked power fet
EP0164095A3 (en) * 1984-06-08 1987-01-07 Eaton Corporation Vertical bidirectional stacked power fet
USRE33261E (en) * 1984-07-03 1990-07-10 Texas Instruments, Incorporated Trench capacitor for high density dynamic RAM
US5208657A (en) * 1984-08-31 1993-05-04 Texas Instruments Incorporated DRAM Cell with trench capacitor and vertical channel in substrate
US4941030A (en) * 1985-02-05 1990-07-10 Mitsubishi Denki Kabushiki Kaisha Semiconductor device
US5102817A (en) * 1985-03-21 1992-04-07 Texas Instruments Incorporated Vertical DRAM cell and method
US4641164A (en) * 1986-05-30 1987-02-03 Rca Corporation Bidirectional vertical power MOS device and fabrication method
US5115287A (en) * 1986-11-19 1992-05-19 Research Development Corporation Of Japan Step-cut insulated gate static induction transistors and method of manufacturing the same
US4830978A (en) * 1987-03-16 1989-05-16 Texas Instruments Incorporated Dram cell and method
US5109259A (en) * 1987-09-22 1992-04-28 Texas Instruments Incorporated Multiple DRAM cells in a trench
JPH0250482A (ja) * 1988-06-20 1990-02-20 General Electric Co (Ge) 双方向性の電界効果半導体素子および回路
US5225363A (en) * 1988-06-28 1993-07-06 Texas Instruments Incorporated Trench capacitor DRAM cell and method of manufacture
US5105245A (en) * 1988-06-28 1992-04-14 Texas Instruments Incorporated Trench capacitor DRAM cell with diffused bit lines adjacent to a trench
US5134448A (en) * 1990-01-29 1992-07-28 Motorola, Inc. MOSFET with substrate source contact
KR100450652B1 (ko) * 1997-08-22 2004-12-17 페어차일드코리아반도체 주식회사 트렌치형파워모스펫및그제조방법
JP2001189456A (ja) * 1999-10-18 2001-07-10 Seiko Instruments Inc 縦形ｍｏｓトランジスタ及びその製造方法
DE10026742A1 (de) * 2000-05-30 2001-12-13 Infineon Technologies Ag In beide Richtungen sperrendes Halbleiterschaltelement
US6512251B2 (en) 2000-05-30 2003-01-28 Infineon Technologies Ag Semiconductor switching element that blocks in both directions
DE10026742B4 (de) * 2000-05-30 2007-11-22 Infineon Technologies Ag In beide Richtungen sperrendes Halbleiterschaltelement
JP2003008018A (ja) * 2001-06-20 2003-01-10 Denso Corp 半導体装置及びその製造方法
WO2004055904A1 (en) * 2002-12-14 2004-07-01 Koninklijke Philips Electronics N.V. Vertical insulated gate transistor and manufacturing method
US7262460B2 (en) 2002-12-14 2007-08-28 Nxp B.V. Vertical insulated gate transistor and manufacturing method
CN100459155C (zh) * 2002-12-14 2009-02-04 Nxp股份有限公司 垂直绝缘栅晶体管及其制作方法
JP2008053378A (ja) * 2006-08-23 2008-03-06 Sanyo Electric Co Ltd 絶縁ゲート型半導体装置

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