JPS5691470A - Semiconductor - Google Patents
SemiconductorInfo
- Publication number
- JPS5691470A JPS5691470A JP16852979A JP16852979A JPS5691470A JP S5691470 A JPS5691470 A JP S5691470A JP 16852979 A JP16852979 A JP 16852979A JP 16852979 A JP16852979 A JP 16852979A JP S5691470 A JPS5691470 A JP S5691470A
- Authority
- JP
- Japan
- Prior art keywords
- film
- type
- regions
- region
- junction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 2
- 229910052814 silicon oxide Inorganic materials 0.000 abstract 2
- 230000010354 integration Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Memories (AREA)
Abstract
PURPOSE:To attain high steric integration by forming a gate electrode of a conductive film provided on a semiconductive substrate formed using an oridinary type of process with an insulating film placed therebetween and a semiconductor device on the conductive film so that the device may intersect with the electrode. CONSTITUTION:An ordinary n channel MOS type FET is formed by providing an n<+> type source region and a drain region 4 in the region surrounded with an field oxide film 2 of a substrate 1 and a gate electrode made of a silicon oxide film on the portion between the both regions 3 and 4 on the surface of the substrate 1. A silicon oxide film 7 is provided on the regions 3 and 4 and a P-N junction is formed by providing a P type polycrystalline silicon film 8 thereon so that the film 8 may contact and intersect with a polycrystalline silicon film 6. A P type junction FET is formed with the upper portion of the junction surface used as channel region and the both sides thereof used as source and drain regions.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16852979A JPS5691470A (en) | 1979-12-25 | 1979-12-25 | Semiconductor |
JP2055080A JPH02263475A (en) | 1979-12-25 | 1990-03-08 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16852979A JPS5691470A (en) | 1979-12-25 | 1979-12-25 | Semiconductor |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2055080A Division JPH02263475A (en) | 1979-12-25 | 1990-03-08 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5691470A true JPS5691470A (en) | 1981-07-24 |
JPH0232791B2 JPH0232791B2 (en) | 1990-07-23 |
Family
ID=15869704
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16852979A Granted JPS5691470A (en) | 1979-12-25 | 1979-12-25 | Semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5691470A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5760868A (en) * | 1980-09-29 | 1982-04-13 | Seiko Epson Corp | Cmos memory cell |
JPS6135565A (en) * | 1984-07-27 | 1986-02-20 | Hitachi Ltd | Thin film transistor |
JPS62131573A (en) * | 1985-12-04 | 1987-06-13 | Hitachi Ltd | Semiconductor device |
JPH0199261A (en) * | 1987-10-12 | 1989-04-18 | Nec Corp | Semiconductor device and manufacture thereof |
JPH0230186A (en) * | 1988-07-19 | 1990-01-31 | Agency Of Ind Science & Technol | Thin-film field-effect transistor and manufacture thereof |
JPH02263475A (en) * | 1979-12-25 | 1990-10-26 | Toshiba Corp | Semiconductor device |
JPH08213482A (en) * | 1995-11-24 | 1996-08-20 | Seiko Epson Corp | Production of thin-film transistor |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53105389A (en) * | 1977-02-25 | 1978-09-13 | Oki Electric Ind Co Ltd | Manufacture for insulating gate type semiconductor integrated circuit |
JPS5457969A (en) * | 1977-10-18 | 1979-05-10 | Sony Corp | Electric field effect transistor |
-
1979
- 1979-12-25 JP JP16852979A patent/JPS5691470A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53105389A (en) * | 1977-02-25 | 1978-09-13 | Oki Electric Ind Co Ltd | Manufacture for insulating gate type semiconductor integrated circuit |
JPS5457969A (en) * | 1977-10-18 | 1979-05-10 | Sony Corp | Electric field effect transistor |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02263475A (en) * | 1979-12-25 | 1990-10-26 | Toshiba Corp | Semiconductor device |
JPS5760868A (en) * | 1980-09-29 | 1982-04-13 | Seiko Epson Corp | Cmos memory cell |
JPH0435903B2 (en) * | 1980-09-29 | 1992-06-12 | Seiko Epson Corp | |
JPS6135565A (en) * | 1984-07-27 | 1986-02-20 | Hitachi Ltd | Thin film transistor |
JPS62131573A (en) * | 1985-12-04 | 1987-06-13 | Hitachi Ltd | Semiconductor device |
JPH0199261A (en) * | 1987-10-12 | 1989-04-18 | Nec Corp | Semiconductor device and manufacture thereof |
JPH0230186A (en) * | 1988-07-19 | 1990-01-31 | Agency Of Ind Science & Technol | Thin-film field-effect transistor and manufacture thereof |
JPH08213482A (en) * | 1995-11-24 | 1996-08-20 | Seiko Epson Corp | Production of thin-film transistor |
Also Published As
Publication number | Publication date |
---|---|
JPH0232791B2 (en) | 1990-07-23 |
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