JPS55133042A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS55133042A
JPS55133042A JP3972679A JP3972679A JPS55133042A JP S55133042 A JPS55133042 A JP S55133042A JP 3972679 A JP3972679 A JP 3972679A JP 3972679 A JP3972679 A JP 3972679A JP S55133042 A JPS55133042 A JP S55133042A
Authority
JP
Japan
Prior art keywords
pattern
film
cyclohexyl methacrylate
monomer
90mol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3972679A
Other languages
English (en)
Other versions
JPS574893B2 (ja
Inventor
Tateo Kitamura
Yasuhiro Yoneda
Jiro Naito
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3972679A priority Critical patent/JPS55133042A/ja
Publication of JPS55133042A publication Critical patent/JPS55133042A/ja
Publication of JPS574893B2 publication Critical patent/JPS574893B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
JP3972679A 1979-04-04 1979-04-04 Pattern forming method Granted JPS55133042A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3972679A JPS55133042A (en) 1979-04-04 1979-04-04 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3972679A JPS55133042A (en) 1979-04-04 1979-04-04 Pattern forming method

Publications (2)

Publication Number Publication Date
JPS55133042A true JPS55133042A (en) 1980-10-16
JPS574893B2 JPS574893B2 (ja) 1982-01-28

Family

ID=12560977

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3972679A Granted JPS55133042A (en) 1979-04-04 1979-04-04 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS55133042A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58116532A (ja) * 1981-12-29 1983-07-11 Fujitsu Ltd パタ−ン形成方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0670395A (ja) * 1992-08-19 1994-03-11 Onkyo Corp スピーカ用リード線と端子金具との接続構造

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49103632A (ja) * 1972-12-21 1974-10-01 Philips Nv
JPS51105353A (ja) * 1975-03-07 1976-09-17 Hitachi Ltd Denshisenkannoseikobunshisoseibutsu
JPS51117577A (en) * 1975-03-20 1976-10-15 Philips Nv Positive operation type electron resist
JPS5332718A (en) * 1976-09-07 1978-03-28 Agency Of Ind Science & Technol Polymer material having positive type image formation ability
JPS5353314A (en) * 1976-10-26 1978-05-15 Agency Of Ind Science & Technol Sensitive high polymer composition and picture imae forming method usingsaid composition
JPS5466122A (en) * 1977-11-07 1979-05-28 Fujitsu Ltd Pattern formation material
JPS5466776A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Fine pattern forming method
JPS5466829A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Pattern formation materil

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49103632A (ja) * 1972-12-21 1974-10-01 Philips Nv
JPS51105353A (ja) * 1975-03-07 1976-09-17 Hitachi Ltd Denshisenkannoseikobunshisoseibutsu
JPS51117577A (en) * 1975-03-20 1976-10-15 Philips Nv Positive operation type electron resist
JPS5332718A (en) * 1976-09-07 1978-03-28 Agency Of Ind Science & Technol Polymer material having positive type image formation ability
JPS5353314A (en) * 1976-10-26 1978-05-15 Agency Of Ind Science & Technol Sensitive high polymer composition and picture imae forming method usingsaid composition
JPS5466122A (en) * 1977-11-07 1979-05-28 Fujitsu Ltd Pattern formation material
JPS5466776A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Fine pattern forming method
JPS5466829A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Pattern formation materil

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58116532A (ja) * 1981-12-29 1983-07-11 Fujitsu Ltd パタ−ン形成方法
JPH0262859B2 (ja) * 1981-12-29 1990-12-26 Fujitsu Ltd

Also Published As

Publication number Publication date
JPS574893B2 (ja) 1982-01-28

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