JPS55113048A - Image forming method - Google Patents

Image forming method

Info

Publication number
JPS55113048A
JPS55113048A JP2154079A JP2154079A JPS55113048A JP S55113048 A JPS55113048 A JP S55113048A JP 2154079 A JP2154079 A JP 2154079A JP 2154079 A JP2154079 A JP 2154079A JP S55113048 A JPS55113048 A JP S55113048A
Authority
JP
Japan
Prior art keywords
resist
image
development
temp
irradiated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2154079A
Other languages
Japanese (ja)
Inventor
Takama Mizoguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP2154079A priority Critical patent/JPS55113048A/en
Publication of JPS55113048A publication Critical patent/JPS55113048A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Abstract

PURPOSE:To form a fog-free resist image of high accuracy by heat treating a negative type resist with an insolubilized image formed by electron beam irradiation prior to development to improve the thickness of a resist film and raise the gamma value after development. CONSTITUTION:An electron beam-sensitive negative type resist such as a glycidyl methacrylate (co)polymer or polystyrene (derivative) coated on a substrate is irradiated with electron beams in such a dose amt. that no crosslinking reaction is induced at the periphery of the irradiated region, forming an insolubilized image. The resist with the image formed is then heat treated at a temp. from about 30 deg.C above the glass transition temp. (Tg) of the resist to about 30 deg.C below the temp. prior to development. By this treatment the crosslinking degree of the irradiated portion of the resist film can be enhanced without deteriorating the solubility of the unirradiated portion to a developer, and a resist image of high accuracy can be formed.
JP2154079A 1979-02-26 1979-02-26 Image forming method Pending JPS55113048A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2154079A JPS55113048A (en) 1979-02-26 1979-02-26 Image forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2154079A JPS55113048A (en) 1979-02-26 1979-02-26 Image forming method

Publications (1)

Publication Number Publication Date
JPS55113048A true JPS55113048A (en) 1980-09-01

Family

ID=12057796

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2154079A Pending JPS55113048A (en) 1979-02-26 1979-02-26 Image forming method

Country Status (1)

Country Link
JP (1) JPS55113048A (en)

Similar Documents

Publication Publication Date Title
DE3486187D1 (en) METHOD AND DEVICE FOR PRODUCING PROTECTIVE LACQUER IMAGES.
SE7610739L (en) PROCEDURE FOR MANUFACTURE OF PLANT PRINTING MATERIALS BY LASER RAY
ATE11186T1 (en) METHOD OF MAKING RELIEF COPIES.
JPS55113048A (en) Image forming method
JPS5639539A (en) Pattern forming method
JPS5676530A (en) Exposure of resist
JPS57124436A (en) Correction of pattern defect
JPS5636648A (en) Photosensitive material and pattern forming method using it
JPS5646530A (en) Preparation of resist pattern
JPS5726170A (en) Formation of al or al alloy pattern
JPS56114942A (en) High energy beam sensitive resist material and its using method
JPS5655943A (en) Pattern forming method
JPS561941A (en) Image forming method
JPS5652751A (en) Photomask correcting method
JPS55138232A (en) Drawing device
JPS55163841A (en) Method for electron beam exposure
JPS5712522A (en) Forming method of pattern
JPS56114943A (en) Negative type resist material for electron beam
JPS5353314A (en) Sensitive high polymer composition and picture imae forming method usingsaid composition
JPS5669625A (en) Minute pattern forming method
JPS5740929A (en) Processing method of resist
JPS55117239A (en) Making method of microminiature pattern
JPS5541785A (en) Pattern exposing method
JPS5357974A (en) Electron beam exposure method
JPS612326A (en) Formation of resist pattern