JPS5353314A - Sensitive high polymer composition and picture imae forming method usingsaid composition - Google Patents
Sensitive high polymer composition and picture imae forming method usingsaid compositionInfo
- Publication number
- JPS5353314A JPS5353314A JP12849776A JP12849776A JPS5353314A JP S5353314 A JPS5353314 A JP S5353314A JP 12849776 A JP12849776 A JP 12849776A JP 12849776 A JP12849776 A JP 12849776A JP S5353314 A JPS5353314 A JP S5353314A
- Authority
- JP
- Japan
- Prior art keywords
- composition
- usingsaid
- imae
- picture
- forming method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
PURPOSE:A postive image for resist of good contrast is formed performing development treatment after radiation of electron beams or ultraviolet rays by making combination use of a specific methacrylic ester copolymer and a tert-butyl methacrylate copolymer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12849776A JPS5353314A (en) | 1976-10-26 | 1976-10-26 | Sensitive high polymer composition and picture imae forming method usingsaid composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12849776A JPS5353314A (en) | 1976-10-26 | 1976-10-26 | Sensitive high polymer composition and picture imae forming method usingsaid composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5353314A true JPS5353314A (en) | 1978-05-15 |
JPS544255B2 JPS544255B2 (en) | 1979-03-05 |
Family
ID=14986195
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12849776A Granted JPS5353314A (en) | 1976-10-26 | 1976-10-26 | Sensitive high polymer composition and picture imae forming method usingsaid composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5353314A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5466776A (en) * | 1977-11-07 | 1979-05-29 | Fujitsu Ltd | Fine pattern forming method |
JPS55117239A (en) * | 1979-03-02 | 1980-09-09 | Fujitsu Ltd | Making method of microminiature pattern |
JPS55133042A (en) * | 1979-04-04 | 1980-10-16 | Fujitsu Ltd | Pattern forming method |
US7501220B2 (en) | 2003-01-31 | 2009-03-10 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition |
-
1976
- 1976-10-26 JP JP12849776A patent/JPS5353314A/en active Granted
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5466776A (en) * | 1977-11-07 | 1979-05-29 | Fujitsu Ltd | Fine pattern forming method |
JPS5713864B2 (en) * | 1977-11-07 | 1982-03-19 | ||
JPS55117239A (en) * | 1979-03-02 | 1980-09-09 | Fujitsu Ltd | Making method of microminiature pattern |
JPS5720615B2 (en) * | 1979-03-02 | 1982-04-30 | ||
JPS55133042A (en) * | 1979-04-04 | 1980-10-16 | Fujitsu Ltd | Pattern forming method |
JPS574893B2 (en) * | 1979-04-04 | 1982-01-28 | ||
US7501220B2 (en) | 2003-01-31 | 2009-03-10 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition |
US7527909B2 (en) | 2003-01-31 | 2009-05-05 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition |
US7541138B2 (en) | 2003-01-31 | 2009-06-02 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition |
US8198004B2 (en) | 2003-01-31 | 2012-06-12 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition |
Also Published As
Publication number | Publication date |
---|---|
JPS544255B2 (en) | 1979-03-05 |
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