JPS5720615B2 - - Google Patents

Info

Publication number
JPS5720615B2
JPS5720615B2 JP2428579A JP2428579A JPS5720615B2 JP S5720615 B2 JPS5720615 B2 JP S5720615B2 JP 2428579 A JP2428579 A JP 2428579A JP 2428579 A JP2428579 A JP 2428579A JP S5720615 B2 JPS5720615 B2 JP S5720615B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2428579A
Other languages
Japanese (ja)
Other versions
JPS55117239A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2428579A priority Critical patent/JPS55117239A/en
Publication of JPS55117239A publication Critical patent/JPS55117239A/en
Publication of JPS5720615B2 publication Critical patent/JPS5720615B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP2428579A 1979-03-02 1979-03-02 Making method of microminiature pattern Granted JPS55117239A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2428579A JPS55117239A (en) 1979-03-02 1979-03-02 Making method of microminiature pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2428579A JPS55117239A (en) 1979-03-02 1979-03-02 Making method of microminiature pattern

Publications (2)

Publication Number Publication Date
JPS55117239A JPS55117239A (en) 1980-09-09
JPS5720615B2 true JPS5720615B2 (en) 1982-04-30

Family

ID=12133903

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2428579A Granted JPS55117239A (en) 1979-03-02 1979-03-02 Making method of microminiature pattern

Country Status (1)

Country Link
JP (1) JPS55117239A (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49103632A (en) * 1972-12-21 1974-10-01 Philips Nv
JPS51105353A (en) * 1975-03-07 1976-09-17 Hitachi Ltd DENSHISENKANNOSEIKOBUNSHISOSEIBUTSU
JPS52153672A (en) * 1976-06-16 1977-12-20 Matsushita Electric Ind Co Ltd Electron beam resist and its usage
JPS5344441A (en) * 1976-10-04 1978-04-21 Ibm Material for resist
JPS5353314A (en) * 1976-10-26 1978-05-15 Agency Of Ind Science & Technol Sensitive high polymer composition and picture imae forming method usingsaid composition
JPS5466122A (en) * 1977-11-07 1979-05-28 Fujitsu Ltd Pattern formation material
JPS5466776A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Fine pattern forming method
JPS5466829A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Pattern formation materil

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49103632A (en) * 1972-12-21 1974-10-01 Philips Nv
JPS51105353A (en) * 1975-03-07 1976-09-17 Hitachi Ltd DENSHISENKANNOSEIKOBUNSHISOSEIBUTSU
JPS52153672A (en) * 1976-06-16 1977-12-20 Matsushita Electric Ind Co Ltd Electron beam resist and its usage
JPS5344441A (en) * 1976-10-04 1978-04-21 Ibm Material for resist
JPS5353314A (en) * 1976-10-26 1978-05-15 Agency Of Ind Science & Technol Sensitive high polymer composition and picture imae forming method usingsaid composition
JPS5466122A (en) * 1977-11-07 1979-05-28 Fujitsu Ltd Pattern formation material
JPS5466776A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Fine pattern forming method
JPS5466829A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Pattern formation materil

Also Published As

Publication number Publication date
JPS55117239A (en) 1980-09-09

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