JPS51105353A - DENSHISENKANNOSEIKOBUNSHISOSEIBUTSU - Google Patents
DENSHISENKANNOSEIKOBUNSHISOSEIBUTSUInfo
- Publication number
- JPS51105353A JPS51105353A JP2711875A JP2711875A JPS51105353A JP S51105353 A JPS51105353 A JP S51105353A JP 2711875 A JP2711875 A JP 2711875A JP 2711875 A JP2711875 A JP 2711875A JP S51105353 A JPS51105353 A JP S51105353A
- Authority
- JP
- Japan
- Prior art keywords
- denshisenkannoseikobunshisoseibutsu
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2711875A JPS51105353A (en) | 1975-03-07 | 1975-03-07 | DENSHISENKANNOSEIKOBUNSHISOSEIBUTSU |
DE19762609218 DE2609218A1 (en) | 1975-03-07 | 1976-03-05 | Masks for mfr of sub-micro integrated circuits - using copolymers of alkyl-and glycidyl-methacrylates exposed by electron beams |
NL7602429A NL7602429A (en) | 1975-03-07 | 1976-03-08 | PROCESS FOR PREPARING CATHODE RAY SENSITIVE POLYMERS. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2711875A JPS51105353A (en) | 1975-03-07 | 1975-03-07 | DENSHISENKANNOSEIKOBUNSHISOSEIBUTSU |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51105353A true JPS51105353A (en) | 1976-09-17 |
JPS5513340B2 JPS5513340B2 (en) | 1980-04-08 |
Family
ID=12212138
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2711875A Granted JPS51105353A (en) | 1975-03-07 | 1975-03-07 | DENSHISENKANNOSEIKOBUNSHISOSEIBUTSU |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS51105353A (en) |
DE (1) | DE2609218A1 (en) |
NL (1) | NL7602429A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5359367A (en) * | 1976-11-10 | 1978-05-29 | Hitachi Ltd | Formation of electron beam resist image |
JPS5466776A (en) * | 1977-11-07 | 1979-05-29 | Fujitsu Ltd | Fine pattern forming method |
JPS54118776A (en) * | 1978-03-08 | 1979-09-14 | Fujitsu Ltd | Pattern forming method |
JPS55117239A (en) * | 1979-03-02 | 1980-09-09 | Fujitsu Ltd | Making method of microminiature pattern |
JPS55133042A (en) * | 1979-04-04 | 1980-10-16 | Fujitsu Ltd | Pattern forming method |
WO1990003987A1 (en) * | 1988-10-12 | 1990-04-19 | Tosoh Corporation | Polyalicyclic polyacrylic ester derivatives |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0090089B1 (en) * | 1981-12-19 | 1988-10-05 | Daikin Kogyo Co., Ltd. | Resist material and process for forming fine resist pattern |
GB2163435B (en) * | 1984-07-11 | 1987-07-22 | Asahi Chemical Ind | Image-forming materials sensitive to high-energy beam |
JP3202792B2 (en) * | 1992-06-19 | 2001-08-27 | 日本ペイント株式会社 | Resist composition |
US5587274A (en) * | 1992-06-19 | 1996-12-24 | Nippon Paint Co., Ltd. | Resist composition |
-
1975
- 1975-03-07 JP JP2711875A patent/JPS51105353A/en active Granted
-
1976
- 1976-03-05 DE DE19762609218 patent/DE2609218A1/en active Pending
- 1976-03-08 NL NL7602429A patent/NL7602429A/en unknown
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5359367A (en) * | 1976-11-10 | 1978-05-29 | Hitachi Ltd | Formation of electron beam resist image |
JPS5521334B2 (en) * | 1976-11-10 | 1980-06-09 | ||
JPS5466776A (en) * | 1977-11-07 | 1979-05-29 | Fujitsu Ltd | Fine pattern forming method |
JPS5713864B2 (en) * | 1977-11-07 | 1982-03-19 | ||
JPS54118776A (en) * | 1978-03-08 | 1979-09-14 | Fujitsu Ltd | Pattern forming method |
JPS5731125B2 (en) * | 1978-03-08 | 1982-07-02 | ||
JPS55117239A (en) * | 1979-03-02 | 1980-09-09 | Fujitsu Ltd | Making method of microminiature pattern |
JPS5720615B2 (en) * | 1979-03-02 | 1982-04-30 | ||
JPS55133042A (en) * | 1979-04-04 | 1980-10-16 | Fujitsu Ltd | Pattern forming method |
JPS574893B2 (en) * | 1979-04-04 | 1982-01-28 | ||
WO1990003987A1 (en) * | 1988-10-12 | 1990-04-19 | Tosoh Corporation | Polyalicyclic polyacrylic ester derivatives |
Also Published As
Publication number | Publication date |
---|---|
JPS5513340B2 (en) | 1980-04-08 |
DE2609218A1 (en) | 1976-09-09 |
NL7602429A (en) | 1976-09-09 |
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